Abstract: A method and a device for preparing specimens for a cryo-electron microscope are described. A carrier is fixed to a holder, sample liquid is applied to the carrier, and a blotting device for removing excess sample liquid from the carrier by means of the absorbing medium is applied. The absorbing medium is illuminated with light and a change in the optical properties of the absorbing medium is detected by means of an optical sensor device. A control moves the blotting away from the carrier depending on a change in the detected optical properties.

Abstract: One embodiment of this fastening apparatus comprises a body with a passage through its length, a threaded member, a locking member, and a bowed ring. The threaded member is retained by the locking member in the passage. The bowed ring is disposed on the body and is configured to be flexible. This body may be fabricated of graphite in one instance.

Abstract: According to an aspect of the present invention, there are provided an ion trap mass spectrometry method and an ion trap mass spectrometry device using a mass spectrometer, the mass spectrometer including: an ion source part for ionizing a sample; an ion trap part for trapping ions generated in the ion source; a main high frequency power source for applying a main high frequency voltage to the ion trap part, and an auxiliary high frequency power source for applying an auxiliary high frequency voltage thereto; and a detector for detecting the ions ejected from the ion trap. The ion trap mass spectrometry method and the ion trap mass spectrometry device includes the steps of: accumulating desired ions into the ion trap part by ejecting undesired ions while accumulating ions into the ion trap part; and ejecting undesired ions that remain in the ion trap part and leaving the desired ions in the ion trap part are repeated alternately.

Abstract: A crystal thin film is adopted as a specimen for measurement. A change in the contrast of crystal lattice fringes is measured under a condition that a diffracted wave and other wave are caused to interfere with each other. Thus, an information transfer limit of a transmission electron microscope can be measured quantitatively. Since the measurement is performed with a condition for interference restricted, the information transfer limit of the transmission electron microscope can be quantitatively assessed.

Abstract: An improved ion source and means for collecting and focusing dispersed gas-phase ions from a remote reagent chemical ionization source (R2CIS) at atmospheric or intermediate pressure is described. The R2CIS is under electronic control and can produce positive, negative, or positive and negative reagent ions simultaneously. This remote source of reagent ions is separated from a low-field sample ionization region by a stratified array of elements, each element populated with a plurality of openings, wherein DC potentials are applied to each element necessary for transferring reagent ions from the R2CIS into the low-field sample ionization region where the reagent ions react with neutral and/or ionic sample forming sample ionic species. The resulting sample ionic species are then introduced into a mass spectrometer, ion mobility spectrometer or other sensor capable of detecting the sample ions.

Abstract: The present invention relates to a charged particle device with improved detection scheme. The device has a charged particle source providing a beam of primary charged particles; a first unit for providing a potential; a second unit for providing a potential; and a center unit positioned between the first unit and the second unit. The center unit is capable of providing a potential different from the potential of the first and the second unit for decelerating the primary charged particles to a first low energy and for accelerating the primary charged particles to a second high energy. Therein, the first unit and/or the second unit is a detector for detecting secondary electrons released at a specimen.

Abstract: An in-spray glow discharge ionization method and apparatus are provided The in-spray glow discharge ionization apparatus has a supply port supplying a fluid containing a compound to be measured, a gas blowing port which surrounds the supply port and which blows a gas exhibiting Penning effect to nebulize the fluid supplied from the supply port, a ground-side discharge electrode provided at a generation port at which the nebulized flow is generated, and a voltage application-side discharge electrode which is disposed in the traveling direction of the nebulized flow and opposed to the ground-side discharge electrode. In this in-spray glow discharge ionization method, while the fluid is nebulized by a spray gas (1), components of the compound to be measured which constitutes the fluid are ionized by the excited spray gas (1) exhibiting Penning effect, so that measurement is performed by a mass spectrometer.

Abstract: The invention provides an apparatus for producing an image of a global surface of an ion source sample plate that is exterior to an ion source. In general terms, the apparatus contains a sample plate for an ion source, an imaging device (e.g., a CCD or CMOS camera) and an illumination device that is configured to produce a light beam that contacts the sample plate surface to define a grazing angle between the light beam and the sample plate surface. The apparatus may be present at a location that is remote to the ion source.

Abstract: The present invention provides a probe for a scanning magnetic force microscope having a resolution sufficient to allow observation of a magnetic storage medium with 1200 kFCI or higher recording densities, a method for producing the probe, and a method for forming a ferromagnetic alloy film on a carbon nanotube. In the context of the present invention, the probe for a scanning magnetic force microscope comprises a carbon nanotube whose surface is at least in part coated with a ferromagnetic alloy film consisting of any one of a Co—Fe alloy and a Co—Ni alloy, wherein the arithmetic mean roughness (Ra 10 ?m) of the surface of the ferromagnetic alloy film is controlled to 1.15 nm or less. A method for producing such probes for a scanning magnetic force microscope and a method for forming such a ferromagnetic alloy film on a carbon nanotube, so as to achieve such mean surface roughness by controlling the growth rate of the ferromagnetic alloy film within the range of 1.0 to 2.5 nm/min, is also disclosed.

Abstract: A writing apparatus including a selector unit responsive to receipt of input data of a pattern to be written by shots of irradiation of an electron beam, configured to select a current density of the electron beam being shot and a maximal shot size thereof based on the input data of the pattern to be written; and a writing unit configured to create an electron beam with the current density selected by said selector unit, shape the created electron beam into a shot size less than or equal to said maximal shot size in units of the shots, and shoot the shaped electron beam onto a workpiece to thereby write said pattern.

Abstract: A sampling device, for example a sampling valve, is disclosed for introduction of samples into an analysis system. The sampling device comprises a turning element provided with a sampling area. The sampling area is configured to retain samples to be analysed. The turning element is arranged for movement between a first position where the sampling area is exposed to material to be sampled for collection of samples and a second position where samples are released for use by the analysis system.

Abstract: A shaped particle beam writing strategy can be used to write a pattern with a particle beam onto a substrate. The pattern comprises a circuit design that is fractured into a plurality of arbitrary polygons. The writing strategy comprises transforming and fracturing the arbitrary polygons into a plurality of restricted polygons, each restricted polygon being represented by a location coordinate, at least two dimension coordinates, and at least one external edge indicator. Thereafter, the restricted polygons are tiled into a set of tiles comprising interior tiles and external edge tiles. Flash data is assigned for each tile such that the interior tiles are assigned a first flash area and the external edge tiles are assigned a second flash area that is smaller than the first flash area. The flash data is arranged in a selected order to write the pattern with a modulated particle beam, such as an electron beam, on a substrate.

Abstract: There is provided an illumination system that includes (a) a light source that emits light having a wavelength ?193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

Abstract: A laser spray method exhibiting a high detection sensitivity when applied to mass analysis has its sensitivity raised further. In a laser spray method of ionizing a liquid sample by irradiating, with a laser beam, the end of a capillary into which the sample has been introduced, use is made of an infrared laser as the laser beam, at least the end of the capillary is formed of a substance that does not readily absorb the laser beam used, and either the capillary is formed of a conductor and a high voltage is applied thereto, or the capillary is formed of an insulator, a conductive wire is placed inside a small cavity of the capillary and a high voltage is applied to the conductive wire.

Abstract: An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and/or Indium.

Abstract: The present invention relates to a method of testing, in the manufacturing process of an LSI (large scale integration) device, a result apparatus therefor, and a cross-sectional microstructure of the LSI device. The method includes thinning a semiconductor chip such that the semiconductor chip includes a substrate crystal and a portion added by the manufacturing process, irradiating an electron beam to the semiconductor chip, detecting an electron beam transmitted through the semiconductor chip to thereby obtain an electron beam diffraction image, removing an electron beam diffracted due to the substrate crystal, and comparing, in the electron beam diffraction image, the thickness of grating stripes obtained from the substrate crystal with the thickness of the portion added by the manufacturing process.

Abstract: This invention discloses an ion implantation apparatus with multiple operating modes. It has an ion source and an ion extraction means for extracting a ribbon-shaped ion beam therefrom. The ion implantation apparatus includes a magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. Multipole lenses are provided to control beam uniformity and collimation. The invention further discloses a two-path beamline in which a second path incorporates a deceleration system incorporating energy filtering. The invention discloses methods of ion implantation in which the mode of implantation may be switched from one-dimensional scanning of the target to two-dimensional scanning, and from a simple path to an s-shaped path with deceleration.

Abstract: The invention relates to a UV-C sterilizing lamp for the treatment of a medium with UV-C radiation in order to kill the microorganisms contained therein by means of at least one UV-C emitter (2). The emitter has an elongated emitter foundation (3) and at least one electrical connection (4), and a base (5) holding the UV-C emitter (2). The at least the emitter foundation (3) of the UV-C emitter (2) is surrounded by a flexible protective cover (6), which is radiolucent to UV-C radiation. The invention furthermore relates to a sterilizing system with at least one UV-C sterilizing lamp of the invention.

Abstract: A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.

Abstract: An electrostatic deflection circuit and method of an electronic beam measuring apparatus which can achieve the high precision of the electronic beam measuring and contribute to the simplification of the structure of the apparatus is provided. In an analog arithmetic circuit included in an analog operation part constituting an electrostatic deflection circuit, output voltages of multipliers are added and output by an adder. When the magnification is low, as the side of an ordinarily closed contact is closed driven by a relay driving circuit, the output of the adder is amplified by a high gain amplifier with a high amplification factor and applied to an electrostatic deflecting board. When the magnification is high, the side of an ordinarily open contact is closed and it is amplified by a low gain amplifier with a low amplification factor and applied to the electrostatic deflecting board in the same way.