Patents Examined by Jack P. Brammer
  • Patent number: 5426020
    Abstract: This invention describes the use of surfactants of the following types:Type A--Surfactant comprising 6 to 22 carbon atom hydrophobic tail with one or more attached hydrophilic chains comprising at least 8 oxyethylene and/or glycidyl ether groups that may or may not be terminated with a negative charge such as a sulfate group,Type B--Block oligomeric surfactants comprising hydrophobic polyoxypropylene blocks (A) and hydrophilic polyoxyethylene blocks (B) joined in the manner of A--B--A, B--A--B, A--B, (A--B.sub.n .tbd.G.tbd.(B--A).sub.n, or (B--A).sub.n .tbd.G(A--B).sub.n, where G is a connective organic moiety and n is between 1 and 3,Type C--Sugar surfactants, comprising between one to three 6 to 22 carbon atom hydrophobic tail with one or more attached hydrophilic mono or oligosaccharidic chains that may or may not be terminated by a negatively charged group such as a sulfate group.
    Type: Grant
    Filed: August 31, 1993
    Date of Patent: June 20, 1995
    Assignee: Eastman Kodak Company
    Inventors: Pranab Bagchi, Melvin M. Kestner
  • Patent number: 5411837
    Abstract: A waterborne photoimageable composition or photoresist comprises a latex binder polymer having acid acid functionality to render it developable in alkaline aqueous solution, at least about 50 mole percent of the acid functionality being sulfonic acid moieties, a photopolymerizeable monomer fraction, and a photoinitiator chemical system.
    Type: Grant
    Filed: May 12, 1994
    Date of Patent: May 2, 1995
    Assignee: Morton International, Inc.
    Inventors: Stephen E. Bottomley, Daniel E. Lundy, Betsy Dadah, Robert K. Barr
  • Patent number: 5397690
    Abstract: An improved dye class and preparation procedure therefore is provided. The dyes can be prepared from a Stenhouse salt which is economical and can be prepared from readily available reagents. The improved dye is particularly suited for use as an antihalation dye in photographic elements and does not impart deleterious properties thereto. These and other properties are provided in a dye represented by: ##STR1## wherein the constituents have defined values.
    Type: Grant
    Filed: March 16, 1994
    Date of Patent: March 14, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Dietrich M. Fabricius, Thomas Schelhorn
  • Patent number: 5393650
    Abstract: This invention describes the use of surfactants of the following types:Type A--Surfactant comprising 6 to 22 carbon atom hydrophobic tail with one or more attached hydrophilic chains comprising at least 8 oxyethylene and/or glycidyl ether groups that may or may not be terminated with a negative charge such as a sulfate group.Type B--Block oligomeric surfactants comprising hydrophobic polyoxypropylene blocks (A) and hydrophilic polyoxyethylene blocks (B) joined in the manner of A--B--A, B--A--B, A--B, (A--B.sub.n .tbd.G.tbd.(B--A).sub.n, or (B--A).sub.n .tbd.G(A--B).sub.n, where G is a connective organic moiety and n is between 1 and 3.Type C--Sugar surfactants, comprising between one to three 6 to 22 carbon atom hydrophobic tail with one or more attached hydrophilic mono or oligosaccharidic chains that may or may not be terminated by a negatively charged group such as a sulfate group.
    Type: Grant
    Filed: June 27, 1994
    Date of Patent: February 28, 1995
    Assignee: Eastman Kodak Company
    Inventors: Pranab Bagchi, Melvin M. Kestner
  • Patent number: 5393648
    Abstract: There is disclosed a silver halide photographic material containing a dispersion of a hydrophobic compound and a water-insoluble and organic solvent-soluble polymer as defined herein. The hydrophobic compound may be a dye which is photochemically inactive during storage but readily decolored and eluted in photographic processing.
    Type: Grant
    Filed: August 11, 1993
    Date of Patent: February 28, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Satoru Toda, Tomokazu Yasuda, Koji Tamoto
  • Patent number: 5393643
    Abstract: A waterborne photoimageable composition or photoresist comprises a latex binder polymer having acid functionality to render it developable in alkaline aqueous solution, which acid functionality is neutralized to at least about 1 mole percent with an amino acrylate, a photopolymerizeable monomer fraction, and a photoinitiator chemical system.
    Type: Grant
    Filed: May 4, 1994
    Date of Patent: February 28, 1995
    Assignee: Morton International, Inc.
    Inventors: Daniel E. Lundy, Robert K. Barr, Thanh N. Tran
  • Patent number: 5393651
    Abstract: A silver halide light-sensitive material is disclosed. The light-sensitive material comprises an aluminum support, an anodic oxide layer and a light-sensitive polymerizable layer in the order. The light-sensitive polymerizable layer contains silver halide, a reducing agent and an ethylenically unsaturated polymerizable compound or a cross-linkable polymer. According to the present invention, an intervening layer is further provided between the anodic oxide layer and the light-sensitive polymerizable layer. The intervening layer contains a compound having a metal cation or a metal oxide anion. The metal cation or the metal oxide anion has a standard electrode potential of 0 V or more.
    Type: Grant
    Filed: July 8, 1994
    Date of Patent: February 28, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Satoshi Hoshi
  • Patent number: 5391473
    Abstract: The invention provides photographic paper having increased image stability. The invention is generally accomplished by forming a paper sheet, drying said paper in a first stage to below about 10 percent water, then applying a polyvinyl alcohol solution to both sides of said paper sheet, drying said paper in a second stage to below about 5 percent water, and then applying further polyvinyl alcohol solution to said paper and drying in a third stage. The paper then may be coated to form a silver halide photosensitive color paper. The paper contains between about 4 and about 6 weight percent of polyvinyl alcohol that is concentrated near the surface of said paper. Further, the paper has a oxygen leak rate of less than about 25 cc/m.sup.2 / day and an oxygen GTR rate of less than about 1 cc/m.sup.2 /day.
    Type: Grant
    Filed: April 16, 1993
    Date of Patent: February 21, 1995
    Assignee: Eastman Kodak Company
    Inventors: David J. Lacz, Todd R. Skochdopole, Larry D. Hagemeier, Anita M. Fees, Brian Thomas, Gary J. McSweeney
  • Patent number: 5389495
    Abstract: A waterborne photoimageable composition or photoresist comprises a latex binder polymer having sufficient carboxylic acid functionality to render it developable in alkaline aqueous solution, a photopolymerizeable monomer fraction, a photoinitiator chemical system and surfactant which is a fluoroaliphatic oxyethylene adduct.
    Type: Grant
    Filed: April 6, 1994
    Date of Patent: February 14, 1995
    Assignee: Morton International, Inc.
    Inventor: Robert K. Barr
  • Patent number: 5387501
    Abstract: Disclosed is a support for a photographic material which comprises a multilayer film in which a layer of a copolymerized polyester is laminated on at least one surface of a polyester layer, wherein the copolymerized polyester contains an aromatic dicarboxylic acid having a metal sulfonate group as a copolymer component in an amount of 2 to 7 mole % based on all ester bond units and further a polyalkylene glycol as a copolymer component in an amount of 3 to 10% by weight based on the total weight of a polyester which is a reaction product.
    Type: Grant
    Filed: April 7, 1994
    Date of Patent: February 7, 1995
    Assignee: Konica Corporation
    Inventors: Takatoshi Yajima, Kenji Nakanishi, Hiromitsu Araki, Hideyuki Kobayashi, Yoshioki Okubo, Tetsutaro Hashimura, Hiroshi Naito
  • Patent number: 5387494
    Abstract: A waterborne photoimageable composition or photoresist comprises a latex binder polymer having sufficient carboxylic acid functionality to render it developable in alkaline aqueous solution, a photopolymerizeable monomer fraction, a photoinitiator chemical system and a poly(siloxane(s)).
    Type: Grant
    Filed: March 30, 1994
    Date of Patent: February 7, 1995
    Assignee: Morton International, Inc.
    Inventors: Robert K. Barr, Gene A. Derrico
  • Patent number: 5385815
    Abstract: A photographic element comprising a UV absorbing polymer latex which is loaded with a non-polymeric UV absorbing compound. The polymer is a homopolymer or heteropolymer comprising monomeric units containing a 2-hydroxybenzotriazole. The benzotriazole preferably is of the formula I: ##STR1## wherein: the phenyl ring and benzo ring are optionally additionally substituted; and one of m and n is 1, and M and N have the formula: ##STR2## wherein R3 is H or an alkyl group; L is a bivalent linking group; and p is 0 or 1. The elements may additionally have a polmer present (which is preferably different from the UV absorbing polymer) which has a glass transition temperature (T.sub.g) of less than 5.degree. C.
    Type: Grant
    Filed: December 29, 1993
    Date of Patent: January 31, 1995
    Assignee: Eastman Kodak Company
    Inventors: Edward Schofield, Richard P. Szajewski
  • Patent number: 5384235
    Abstract: A photographic element with particular polymeric ultraviolet absorbers. The ultraviolet absorbers have repeating units of the formula: ##STR1## wherein: X is O or NH;Y is H or halogen;R.sub.1 is selected from the group consisting of H, halogen, alkoxy , straight chain or branched alkyl group of 1 to 8 carbons;R.sub.2 is C.sub.2 -C.sub.10 alkylene which may be straight chain or branched; andR.sub.3 is H or CH.sub.3.Elements of the invention have good fresh Dmin and image dye stability, and the ultraviolet absorbers therein are highly light stable.
    Type: Grant
    Filed: July 1, 1992
    Date of Patent: January 24, 1995
    Assignee: Eastman Kodak Company
    Inventors: Tien-Teh Chen, Edward Schofield, Hwei-Ling Yau, Lal C. Vishwakarma
  • Patent number: 5382497
    Abstract: An optical recording medium comprising a substrate and a thin organic film containing at least one kind of dye selected from polymethine family dyes, perylium family dyes, and cyanine family dyes, and a recording process comprising scanning the optical recording medium with a high intensity light beam such as a laser beam to form optically detectable pits on the recording medium.
    Type: Grant
    Filed: April 1, 1994
    Date of Patent: January 17, 1995
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuharu Katagiri, Yoshihiro Oguchi, Yoshio Takasu
  • Patent number: 5380635
    Abstract: Dihydroperimidine squarylium dyes have been found to be particularly effective when used in acutance and antihalation systems for photothermographic and photographic articles.
    Type: Grant
    Filed: February 28, 1994
    Date of Patent: January 10, 1995
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Charles W. Gomez, Lori S. Harring, Randall H. Helland, William D. Ramsden, Tran Van Thien
  • Patent number: 5378592
    Abstract: A photographic material comprises a support of a polyester film, a first subbing layer provided thereon, a second subbing layer comprising gelatin provided on the first subbing layer and a photographic layer provided on the second subbing layer. The first subbing layer is a layer of polyurethane latex cured with an epoxy compound or a dichloro-s-triazine derivative, otherwise the first subbing layer comprises a polymer which has breaking elongation of not more than 300% or stress at 100% elongation of not less than 130 kg/cm.sup.2.
    Type: Grant
    Filed: February 2, 1994
    Date of Patent: January 3, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Ken Nakanishi, Tadashi Takehana, Hiroyuki Tamaki, Sumio Nishikawa
  • Patent number: 5378583
    Abstract: In the formation of microstructures, a preformed sheet of photoresist, such as polymethylmethacrylate (PMMA), which is strain free, may be milled down before or after adherence to a substrate to a desired thickness. The photoresist is patterned by exposure through a mask to radiation, such as X-rays, and developed using a developer to remove the photoresist material which has been rendered susceptible to the developer. Micrometal structures may be formed by electroplating metal into the areas from which the photoresist has been removed. The photoresist itself may form useful microstructures, and can be removed from the substrate by utilizing a release layer between the substrate and the preformed sheet which can be removed by a remover which does not affect the photoresist. Multiple layers of patterned photoresist can be built up to allow complex three dimensional microstructures to be formed.
    Type: Grant
    Filed: May 24, 1993
    Date of Patent: January 3, 1995
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Henry Guckel, Todd R. Christenson, Kenneth Skrobis
  • Patent number: 5376503
    Abstract: A lithographic coating and method of framing a lithographic image are disclosed. The method comprises coating at least a portion of a surface of an article with a radiation-crosslinkable polymer, and exposing the coated surface to a pattern of radiation to crosslink the polymer in a lithographic image. The functionalized polymer is a copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene, wherein the para-alkylstyrene is functionalized with a radiation reactive group at the para-alkyl group of the para-alkylstyrene.
    Type: Grant
    Filed: November 24, 1992
    Date of Patent: December 27, 1994
    Assignee: Exxon Chemical Patents Inc.
    Inventors: Jay D. Audett, Kenneth O. McElrath
  • Patent number: 5374496
    Abstract: An image forming method is conducted by subjecting a dry silver salt image forming medium to imagewise exposure and heating to form a light-absorbing organic compound. Thereafter, the medium is subjected to polymerization exposure to imagewise polymerize the medium based on the formation pattern of the light-absorbing compound. The light-absorbing organic compound has specific sensitivities to light in order to maximize contrast.
    Type: Grant
    Filed: September 10, 1993
    Date of Patent: December 20, 1994
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kenji Kagami, Akihiro Mouri, Masato Katayama, Kazuo Isaka, Tetsuro Fukui, Susumu Nakamura, Masao Suzuki
  • Patent number: RE37693
    Abstract: A color photographic light-sensitive material comprising a reflective support having thereon a plurality of silver halide emulsion layers of which the emulsion layer located farthest from said support has, on each of both the support side thereof and the uppermost side at least one nonlight-sensitive layer containing an effective amount of an ultraviolet absorbing agent, said ultraviolet absorbing agent being used in said nonlight-sensitive layer on the uppermost side of said emulsion layer being a 2-(2′-hydroxyphenyl)benzotriazole-type compound which is in the liquid form at normal room temperature.
    Type: Grant
    Filed: March 30, 1989
    Date of Patent: May 7, 2002
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Masao Sasaki, Kaoru Onodera