Abstract: Provided herein are systems and methods for generating a plurality of different monoenergetic neutron energies using a plurality of interchangeable ion beam targets. In certain embodiments, each of the plurality of ion beam targets is configured to generate a monoenergetic energy value that is at least 100 kiloelectron volts (keV) different from the other ion beam targets. In some embodiments, the ion beam targets are composed of LiF, TiD1.5-1.8, TiT1-2, ErD1.5, ErT, or Li.

Abstract: Aspects of the present disclosure may include a method and/or a system for selecting a first ion of the plurality of ions in the ion chain, selecting a second ion of the plurality of ions in the ion chain, applying a first carrier ?/2 pulse to the first ion, applying a first red sideband ? pulse to the first ion, applying a second red sideband ? pulse to the second ion, applying a second carrier ?/2 pulse to the second ion, and scanning a phase of the second carrier ?/2 pulse.

Abstract: Quadrupole ion optical devices configured to arrange paths of each of a plurality of ion beams exiting from a mass analyser towards detector elements of a mass spectrometer. Example quadrupole ion optical device comprise a plurality of electrodes arranged around a central axis and configured to generate a quadrupole potential through which the path of each of the plurality of ion beams can be passed, and electrical circuitry configured to supply at least a first set of voltages or a second set of voltages to the plurality of electrodes. The application of the second set of voltages generates a quadrupole potential having a saddle point at a position in a plane normal to the central axis that is displaced compared to a position in a plane normal to the central axis for a saddle point of a quadrupole potential generated upon application of the first set of voltages.

Abstract: An ion beam extraction apparatus (100), being configured for creating an ion beam (1), in particular adapted for a neutral beam injection apparatus of a fusion plasma plant, comprises an ion source device (10) being arranged for creating ions, and a grid device (20) comprising at least two grids (21, 22) being arranged adjacent to the ion source device (10) and having a mutual grid distance d along a beam axis z, wherein the grids (21, 22) are electrically insulated relative to each other, the grids (21, 22) are arranged for applying different electrical potentials for creating an ion extraction and acceleration field (3) along the beam axis z, and the ion source device (10) and the grid device (20) are arranged in an evacuable ion beam space (30) extending along the beam axis z, wherein at least one of the grids is a movable grid (21), which can be shifted along the beam axis z, and the grid device (20) is coupled with a grid drive device (40) having a drive motor (41), which is arranged for moving the movab

Abstract: A method includes providing a proton computed tomography (CT) scanner, and measuring sigma with a scintillator screen at an exit beam for each pencil beam scanned across an object for each gantry angle necessary to determine a total energy loss as the beam traverses an object of unknown thickness or material.

Abstract: An optical probe system and a microscope system. The optical probe system includes an optical probe with an optical probe shaft configured to extend at least partially into a vacuum chamber of a charged particle beam microscope. A first and second optical channel can extend through the optical probe shaft. The first optical channel accommodates a portion of a segmented optical axis, and the second optical channel accommodates an unsegmented optical axis. The segmented optical axis includes at least a first segment that substantially parallel to the unsegmented optical axis and at least a second segment that is not substantially parallel to the unsegmented optical axis, and the first segment of the segmented optical axis and the unsegmented optical axis are positioned within the optical probe shaft to permit the first optical channel and the second optical channel to simultaneously address a sample within the vacuum chamber.

Abstract: A gas chromatograph mass spectrometer includes a gas chromatograph part including a separation column, a mass spectrometer part, and a controller configured to control at least an ionization part of the mass spectrometer part. The ionization part includes an ion source box having a space for ionizing the components flowing out from an outlet of the separation column in the inside, a heater for adjusting a temperature of an ion source box, and a filament that is arranged outside of the ion source box and generates an electron for ionizing the components flowing out from the outlet of the separation column. The controller is configured to, after applying voltage to the filament, adjust a temperature of the ion source box affected by heat emitted from the filament to a predetermined temperature by controlling output of the heater in relation to magnitude of heat generation of the filament.

Abstract: Provided is a charged particle beam source having an emitter that can be replaced easily. The charged particle beam source includes an electron gun chamber; a first unit including both a supportive insulative member mechanically supporting a cable and a first set of terminals electrically connected to the cable; and a second unit including both the emitter that releases charged particles and a second set of terminals electrically connected to the emitter. The chamber has a side wall provided with a through-hole in which the first unit is secured. The second unit can be detachably mounted to the first unit. Within the chamber, the emitter is placed on an optical axis, so that the first and second sets of terminals are brought into contact with each other.

Abstract: A pattern writing method for charged-particle lithography apparatuses using an improved correction for thermal distortion of the substrate includes determining an exposure position where the beam impinges on the substrate and the power of the beam at the exposure position; calculating heating of the substrate at the exposure position, and calculating, for a plurality of locations over the substrate, and the thermal diffusion and radiative cooling; calculating, for the same or a reduced plurality of locations on the substrate, the positional change of the substrate due to thermal expansion; determining a displacement distance which compensates the positional change at the exposure position, updating the structure to be written by shifting the exposure position of the beam by said displacement distance, and writing the updated structures on the substrate with the beam. These steps are repeated as a function of time and/or varying exposure position of the beam substrate position.

Abstract: An amount of charge of a substrate is promptly and accurately calculated. A charged particle beam writing method includes a step for virtually dividing a writing region of the writing target substrate in a mesh-like manner and calculating a pattern density representing an arrangement ratio of the pattern for each mesh region, a step for calculating a dose for each mesh region using the pattern density, a step for calculating a charge amount based on a film thickness of the resist film formed on the substrate and the calculated dose by using a predetermined function for charge amount calculation, the function using, as variables, the film thickness of the resist film and the dose, a step for calculating a position shift amount of a writing position from the calculated charge amount, and a step for correcting an irradiation position of the charged particle beam using the position shift amount.

Abstract: An electrode apparatus for an ion implantation system has a base plate having a base plate aperture and at least one securement region. A securement apparatus is associated with each securement region, and a plurality of electrode rods are selectively coupled to the base plate by the securement apparatus. The plurality of electrode rods have a predetermined shape to define an optical region that is associated with the base plate aperture. An electrical coupling electrically connects to the plurality of electrode rods and is configured to electrically connect to an electrical potential. The plurality of electrode rods have a predetermined shape configured to define a path of a charged particle passing between the plurality of electrode rods based on the electrical potential. The plurality of electrode rods can define a suppressor or ground electrode downstream of an extraction aperture of an ion source.

Abstract: An inactivating device includes: an ultraviolet light source to emit ultraviolet light, a main light-emission wavelength band of the ultraviolet light being at least partly included in a range from 200 nm to 230 nm inclusive; and an optical filter including a multilayer dielectric film, wherein with respect to the ultraviolet light incident at an incidence angle of 0 degrees, the optical filter has a band in which the ultraviolet light in a range of wavelengths from 190 nm to 235 nm inclusive is transmitted, and a wavelength ?5 at which transmittance of the optical filter indicates 5% is longer than or equal to 236 nm and shorter than 245 nm.

Abstract: The mark position is measured with a multi-beam with high accuracy. A multi charged particle beam writing method includes forming a multi-beam in which charged particle beams are arranged with a predetermined pitch, irradiating a mark with beams in an on-beam region while shifting irradiation positions of the charged particle beams by sequentially changing the on-beam region in which beams in a partial region of the multi-beam are set to ON, the mark being provided at a predetermined position and having a width greater than the predetermined pitch, detecting a reflected charged particle signal from the mark, and calculating a position of the mark, and adjusting the irradiation positions of the multi-beam based on the calculated position of the mark, and writing a pattern.

Abstract: In one embodiment, a multi charged particle beam writing method includes forming a multi charged particle beam with which a substrate serving as a writing target is irradiated, deflecting the multi charged particle beam to a position with a predetermined deflection offset added so that deflection voltages respectively applied to a plurality of electrodes of an electrostatic positioning deflector does not include a state where all the deflection voltages are zero, and irradiating the substrate with the multi charged particle beam. A positive common voltage is added to the deflection voltages which are applied to the respective electrodes of the electrostatic positioning deflector.

Abstract: Certain improvements of multi-beam raster units such as multi-beam generating units and multi-beam deflector units of a multi-beam charged particle microscopes are provided. The improvements include design, fabrication and adjustment of multi-beam raster units including apertures of specific shape and dimensions. The improvements can enable multi-beam generation and multi-beam deflection or stigmation with higher precision. The improvements can be relevant for routine applications of multi-beam charged particle microscopes, for example in semiconductor inspection and review, where high reliability and high reproducibility and low machine-to-machine deviations are desirable.

Abstract: Ions ejected from a collision cell are detected by a detector. An evaluation unit generates a temporary calibration curve based on an intensity of a detection signal and evaluates an ion accumulation time of the collision cell based on the temporary calibration curve. When the evaluation unit determines signal saturation, the ion accumulation time of the collision cell is reduced. When the evaluation unit determines sensitivity insufficiency, the ion accumulation time of the collision cell is increased.

Abstract: The present disclosure relates to an inspection tool having a charged particle source to provide a charged particle beam, a sample holder to hold a sample, and a scanning system configured to scan the charged particle beam over an area of the sample in a scanning pattern. The scanning system may comprise a microwave or RF wave supporting structure to provide a first oscillating electromagnetic field to periodically deflect the charged particle beam in order to scan the charged particle beam over the area of the sample. The charged particle beam may be an electron beam, so that the inspection tool may be a scanning electron microscope. The scanning system may be configured to continuously scan the charged particle beam over the area of the sample.

Abstract: Example ion trap chips and quantum computing methods are described. One example ion trap chip includes a plurality of first ion traps and a plurality of second ion traps. Each first ion trap is configured to store an operation ion, where two adjacent first ion traps form one ion trap group. Each second ion trap corresponds to one ion trap group. Each second ion trap is configured to perform quantum operations of operation ions stored in a corresponding ion trap group, and each second ion trap is located between two first ion traps in a corresponding ion trap group. Operation ions stored in first ion traps in an ion trap group are transported to a corresponding second ion trap along a straight line.

Abstract: The present disclosure provides a D?7Li neutron generator system and methods for producing a large amount of 225Ac. High flux 10 and 13 MeV neutrons generated by the (D?7Li) reaction are used to irradiate 226Ra forming 225Ra/225Ac via the 226Ra(n,2n)225Ra reaction. The generator consists of three main components: (1) a surface-production type negative ion source; (2) an extraction and acceleration column; and (3) a beam target Lithium electrode to irradiate 226Ra resulting in the formation of 225Ac. The methods enable the negative deuterium ion-base compact neutron generation system to generate reliably high yield of neutron flux in the absence of back-streaming electrons for producing 225Ac in large quantities but with a very small percentage of 227Ac (˜1%).

Abstract: The invention relates generally to a sanitizing device that may comprise of an enclosure, a conveyor module, a plurality of sanitizing light sources, and possibly a sealing module. Objects that need to be sanitized may be transported or placed inside the enclosure and can be exposed to sanitizing lights from a plurality of sanitizing light sources. After the exposure to the sanitizing lights, the objects may convey out of the apparatus or go through a sealing module before exiting the enclosure. The conveyor module of the sanitizing device may be driven by torque created by an exterior conveyor belt or a motorized mechanism integrated within the apparatus.