Patents Examined by James J. Leyabourne
  • Ion implanting apparatus and ion implanting method using the same
    Patent number: 7112810
    Abstract: In an ion implanting apparatus and an ion implanting method using the same, the ion implanting apparatus includes a disk chamber containing a rotatable disk, a wafer mounted on the rotatable disk, and a charge sensor for monitoring a charged state of the wafer, the charge sensor being fixed to the disk chamber to be adjacent to and facing a surface of the wafer. An output of the charge sensor may be used as feedback to control the charged state of the wafer.
    Type: Grant
    Filed: October 15, 2004
    Date of Patent: September 26, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Gyeong-Su Keum, Seung-Ki Chae, Hyung-Sik Hong, Sang-Yeob Cha, Jae-Hyun Han, Tae-Sub Im, Hyun-Kyu Kang, Gil-Jung Yun, Doo-Guen Song