Abstract: A method and an apparatus for matching data related to an integrated metrology tool and a standalone metrology tool. At least one semiconductor wafer is processed. An integrated metrology tool and/or a standalone metrology tool is matched based upon a difference between metrology data relating to a processed semiconductor wafer acquired by the integrated metrology tool and metrology data acquired by the standalone metrology tool, using a controller.
Type:
Grant
Filed:
May 28, 2002
Date of Patent:
December 20, 2005
Inventors:
Christopher A. Bode, Matthew A. Purdy, Alexander J. Pasadyn