Abstract: There is provided a trap apparatus, which is inserted in a vacuum exhaust system sucking and discharging an exhaust gas from a process apparatus by a vacuum pump, for trapping a tramp material contained in the exhaust gas, said trap apparatus comprising, a trapping passage container inserted in the exhaust passage, at the upstream side of the vacuum pump, and a heating trap, housed in the trapping passage container, for heating the exhaust gas to a predetermined temperature while the heating trap is brought into contact with the exhaust gas flowing, thereby subjecting the tramp material in the exhaust gas to pyrolysis. Thus, the unaffected process gas circulated through the exhaust passage is touched by the heating trap and pyrolytically decomposed, and separated metal adheres to the heating trap so as to be trapped thereby.

Abstract: An integrated module with a heated reservoir to vaporize liquid for semiconductor processes with liquid sources is presented. Shut-off valves and a proportioning pressure valve for controlling the flow of the vapor from the reservoir are mounted on the module for simple conduction heating of the valves. A capacitance manometer also mounted to the module also has its own heating elements. Condensation of the vapor is avoided and consistence performance and reliability is obtained.