Abstract: A method for hard-material coating or heat treatment of the blade airfoils of blisks for gas turbines provides for partial heat-insulation and cooling of the other blisk parts during the respective process to prevent their properties from being changed by the high temperatures. The apparatus required for this method comprises two or more cooling plates (5 to 7) which are thermally insulated on their outer surfaces and include supporting flanges (20) which heat-conductively locate the blade platforms (3) of the blisks (1). Radially extending cooling medium channels (16) are provided in the cooling plates connected to a cooling medium source to continually apply cooling medium to the inner surfaces of the supporting flanges and the blade platforms.

Abstract: A method and apparatus for cleaning apertures within an input manifold of a semiconductor fabrication deposition tool is presented. Vapor phase chemicals that contain the required constituents are introduced into the tool through the input manifold. The apertures of the input manifold direct the gas flow towards the surface of the wafer where they are absorbed and react to form thin films. Film accumulates on the wafers but also in other places inside the chamber of the reactor. Those places include the sidewall surfaces of the gas delivery apertures. Apertures deposits can source contaminants thereby causing defects on the wafers. The presented cleaning mechanism is operably sealed to the input manifold on one end and to a vacuum pump at the other end. The vacuum cleaner comprises a rotating plate with a radial slot. Air flows from the input manifold, through the apertures, through the slot, and to the vacuum pump.

Abstract: A low profile, compact atomic layer deposition reactor (LP-CAR) has a low-profile body with a substrate processing region adapted to serve a single substrate or a planar array of substrates, and a valved load and unload port for substrate loading and unloading to and from the LP-CAR. The body has an inlet adapted for injecting a gas or vapor at the first end, and an exhaust exit adapted for evacuating gas and vapor at the second end. The LP-CAR has an external height no greater than any horizontal dimension, and more preferably no more than two-thirds any horizontal dimension, facilitating a unique system architecture. An internal processing region is distinguished by having a vertical extent no greater than one fourth the horizontal extent, facilitating fast gas switching. In some embodiments one substrate at a time is processed, and in other embodiments there may be multiple substrates arranged in the processing region in a planar array.