Patents Examined by Jerome Massie
  • Patent number: 4481062
    Abstract: An electron-bombardment ion source includes means defining a chamber for containing an ionizable gas together with means for introducing such gas into that chamber. Disposed therein is an anode and an electron-emissive cathode. The potential impressed between the anode and the cathode to effect electron emission at a sufficient velocity to ionize the gas. Also included are means for accelerating ions out of the chamber together with means for establishing a magnetic field within the chamber that increases the efficiency of ionization of the gas by the electrons. Mounted within the chamber is an anode of non-magnetic material that defines an essentially continuous and smooth surface which encloses substantially all of the volume within which the ionization occurs except the exit for the accelerated ions out of the chamber. The entire design is such as to ensure ready removability of the different components for quick and easy cleaning.
    Type: Grant
    Filed: February 7, 1984
    Date of Patent: November 6, 1984
    Inventors: Harold R. Kaufman, Raymond S. Robinson, William E. Hughes
  • Patent number: 4477302
    Abstract: A method of making an energy-absorbing shock cell for mounting bumper devices on legs of offshore oil rig structures having inner and outer metal tubes connected by an intervening vulcanized rubber sleeve maintained under compression adhesively bonded to the inner and outer metal tubes. The shock cell is made by a series of operations in which portions of the metal tubes are coated with adhesive material, and the rubber sleeve is bonded to the adhesive coated areas by vulcanization and post-vulcanized heating.
    Type: Grant
    Filed: June 16, 1983
    Date of Patent: October 16, 1984
    Assignee: Teledyne Industries, Inc.
    Inventors: Raymond F. Leblanc, William T. Cummins
  • Patent number: 4472237
    Abstract: A method for fabricating a device which includes a tantalum silicide structure, and which is essentially free of conductive etch residues, is disclosed. The method includes the steps of depositing tantalum and silicon onto a substrate, patterning the tantalum and silicon, and then sintering the patterned tantalum and silicon to form a patterned layer of tantalum silicide.
    Type: Grant
    Filed: December 13, 1982
    Date of Patent: September 18, 1984
    Assignee: AT&T Bell Laboratories
    Inventors: Jean S. Deslauriers, Hyman J. Levinstein
  • Patent number: 3960634
    Abstract: A master sheet bears on its face permanent indicia identifying a doctor and a patient, and an extension sheet has provision for recording service performed by a doctor for a patient. This extension sheet is adhesively united to said master sheet below said permanent indicia, and when additional service is performed for a patient, another extension sheet is used to record said service and said other extension sheet is adhesively united to said master sheet directly over the first-mentioned sheet. As each service is recorded a copy is made and kept by the doctor, or some one else.
    Type: Grant
    Filed: June 19, 1975
    Date of Patent: June 1, 1976
    Inventor: George A. Kempster
  • Patent number: 3959045
    Abstract: A very thin high quality active layer of a III-V material such as GaAs is formed on a temporary substrate on which an etch-resistant stopping layer of a material such as AlGaAs has been previously formed. Passivating layers are formed on the active layer, and the active layer is interfaced with a material which forms a permanent substrate. The temporary substrate is etched away with an etchant which is stopped by the stopping layer, following which the stopping layer is removed by etching with HF. The material in the active layer acts as a chemical stop for the HF, and consequently the etching process stops automaticaly at the boundary of the active layer, leaving that layer in the thin high-quality form in which it is grown. The etching rate of the stopping layer can be controlled by the proportion of Al in that layer.
    Type: Grant
    Filed: November 18, 1974
    Date of Patent: May 25, 1976
    Assignee: Varian Associates
    Inventor: George A. Antypas
  • Patent number: 3951659
    Abstract: A method for preparing the surface of a glass substrate so that resist maial may be directly applied to the surface and adhere thereto. The invention is particularly useful in the fabrication of relief masks used for pattern generation in planar thin film overlays, which masks are used to provide intimate contact between a photoresist surface and a masking pattern during exposure of the photoresist surface. The present method comprises cleaning of the glass substrate, boiling the substrate in trichloroethylene, and heating the substrate to between 160.degree. and 200.degree.C. Resist material may then be applied directly to the glass substrate.
    Type: Grant
    Filed: December 9, 1974
    Date of Patent: April 20, 1976
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Joseph L. Abita, Jack G. Bebee
  • Patent number: 3951714
    Abstract: A floor covering is made with a backing and a wear layer construction which has areas either transparent or translucent. The wear layer is formed by laying up a pattern by way of stenciling apparatus. The backing layer has printed thereon a decorative pattern. Registration exists between the decorative pattern on the backing sheet and the stencil pattern of the wear layer so that the decorative pattern on the backing will give a three-dimensional effect to the stencil pattern of the wear layer.
    Type: Grant
    Filed: June 10, 1974
    Date of Patent: April 20, 1976
    Assignee: Armstrong Cork Company
    Inventor: Alfredo A. Franco
  • Patent number: 3935005
    Abstract: A dry powder composition for stripping gold and silver contains 78.0-95.0 percent of a soluble cyanide compound, 0.01-5.0 percent of a soluble lithium compound, 0.01-0.5 percent of a soluble lead or bismuth compound as an auxiliary agent, and 5.0-22.0 percent of a water soluble ring-substituted nitrobenzene acid compound. The nitrobenzene acid compounds are selected from the group consisting of the alkali metal and ammonium salts of methyl-nitrobenzoic acid, chloro-nitrobenzoic acid and amino nitrobenzoic acid and of chloro-nitrobenzenesulfonamides. In using the composition, 7.5-60.0 grams per liter of the dry powder composition is dissolved inwater and the resultant aqueous solution is maintained at a temperature of 18.degree.-55.degree. Centigrade. The solution may be replenished as the stripping rate decreases by addition of further amounts of the dry powder composition.
    Type: Grant
    Filed: September 19, 1974
    Date of Patent: January 27, 1976
    Assignee: American Chemical & Refining Company, Incorporated
    Inventors: Hamilton M. Solidum, Robert G. Zobbi