Patents Examined by Jessica E Whiteley
  • Patent number: 9429681
    Abstract: To provide a light conversion element which has solved the problems of the reduced intensity of upconverted light, etc., due to the flammability, volatility or high viscosity of a medium used in the conventional photon upconversion elements. A light conversion element is provided which has solved the above problems by using a visually homogeneous and transparent light conversion element, wherein organic photosensitizing molecules and organic light-emitting molecules, which are a combination that exhibits a triplet-triplet annihilation process, are dissolved and/or dispersed in an ionic liquid.
    Type: Grant
    Filed: October 12, 2011
    Date of Patent: August 30, 2016
    Assignee: TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Yoichi Murakami, Isao Satoh
  • Patent number: 9422436
    Abstract: Ink compositions are prepared by processes that include acoustically mixing a plurality of components at a resonance frequency. This encourages mixing of the components over a large range of viscosities with a minimal temperature rise and also shortens mixing time.
    Type: Grant
    Filed: January 13, 2014
    Date of Patent: August 23, 2016
    Assignee: XEROX CORPORATION
    Inventors: Mihaela Maria Birau, C. Geoffrey Allen, Aurelian Valeriu Magdalinis, Kurt Ira Halfyard, Biby Esther Abraham, James D. Mayo
  • Patent number: 9422449
    Abstract: The present invention relates to a varnish which is for covering the surface of a substrate and deposited by inkjet, to a process for preparing said varnish and to the use thereof as a laminable and/or overprintable ink or varnish.
    Type: Grant
    Filed: April 24, 2013
    Date of Patent: August 23, 2016
    Assignee: MGI FRANCE
    Inventors: Edmond Abergel, Pierre Allais
  • Patent number: 9422446
    Abstract: The present invention relates to a photosensitive resin composition, a protective film and an element having the same. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B) and a solvent (C). The alkali-soluble resin (A) is copolymerized by an unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a1), a fluorene derivative having a double-bond group (a2) and an unsaturated compound having an acid-decomposable group (a3).
    Type: Grant
    Filed: June 9, 2015
    Date of Patent: August 23, 2016
    Assignee: CHI MEI CORPORATION
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Patent number: 9416208
    Abstract: Provided are a method for producing an EVOH resin having sufficient long-run workability in melt molding and enabling prevention of coloring such as yellowing, an EVOH resin obtained by this method for production, and a laminate obtained from this resin. Additionally, a method for producing an ethylene-vinyl alcohol copolymer resin capable of efficiently drying while inhibiting deterioration of qualities is provided. The method for producing an ethylene-vinyl alcohol copolymer resin of the present invention includes a step of irradiation with an infrared ray for irradiating with an infrared ray an ethylene-vinyl alcohol copolymer or an ethylene-vinyl ester copolymer that is a precursor of the ethylene-vinyl alcohol copolymer.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: August 16, 2016
    Assignee: Kuraray Co., Ltd.
    Inventors: Kenji Nakano, Kazutaka Ikeda
  • Patent number: 9410017
    Abstract: The present invention relates to a novel polyamic acid introduced with an imidazolyl group in the polymer chain, a photosensitive resin composition including the polyamic acid and that is capable of providing a photosensitive material that satisfies the characteristics of an excellent bending property and low stiffness and also exhibits excellent heat resistance and coating resistance, a dry film obtained from the photosensitive resin composition, and a circuit board including the dry film.
    Type: Grant
    Filed: May 3, 2013
    Date of Patent: August 9, 2016
    Assignee: LG CHEM, LTD.
    Inventors: Jung-Hak Kim, You-Jin Kyung, Hee-Jung Kim, Kwang-Joo Lee
  • Patent number: 9409932
    Abstract: Compounds useful as a photoinitiator and/or photosensitizer represented by the following formula (I): wherein R1 and R2 each independently designates an alkyl group of 1 to 12 carbon atoms or a cycloalkyl group of 5 or 6 carbon atoms or R1 and R2 form together with the carbon atom to which they are attached a cycloaliphatic ring of 5 or 6 carbon atoms, Si* represents an organopolysiloxane residue bonded via a silicon atom of this residue to the oxygen shown in formula (I), or a silane group SiR4R5R6, wherein R4, R5 and R6 each independently designates an alkyl group of 1 to 12 carbon atoms, a cycloalkyl group of 5 or 6 carbon atoms or an aryl group of 6 to 10 carbon atoms, and R3 designates a hydrogen atom or a group represented by the following formula (II) wherein R7 and R8 each independently designates an alkyl group of 1 to 12 carbon atoms or a cycloalkyl group of 5 or 6 carbon atoms or R7 and R8 form together with the carbon atom to which they are attached a cycloaliphatic ring of 5 or
    Type: Grant
    Filed: June 3, 2015
    Date of Patent: August 9, 2016
    Assignees: Henkel IP & Holding GmbH, Henkel AG & Co. KGaA
    Inventors: Zhiming Pasing Li, Yong Zhang, Jinyou Li, Zhixiang Lu, Zheng Lu
  • Patent number: 9403977
    Abstract: The present invention relates to a positive-type photosensitive resin composition comprising (A) a modified novolac-type phenol resin having an unsaturated hydrocarbon group, (B) a novolac-type phenol resin obtained from metacresol and paracresol, (C) a novolac-type phenol resin obtained from orthocresol, (D) a compound generating an acid by light, and (E) a polybasic acid or a polybasic acid anhydride, wherein the content of the (E) component is lower than 40 parts by mass per 100 parts by mass of the total amount of the (A) component, the (B) component, the (C) component and the (D) component.
    Type: Grant
    Filed: December 5, 2013
    Date of Patent: August 2, 2016
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Satoko Ueda, Ken Sawabe
  • Patent number: 9403991
    Abstract: The present invention relates to a hard coating composition, and, more particularly, to a hard coating composition used in forming a hard coating film exhibiting high hardness and excellent properties. The hard coating composition can be used to form a high-hardness hard coating film that is not easily curled.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: August 2, 2016
    Assignee: LG CHEM, LTD.
    Inventors: Joon Koo Kang, Yeong Rae Chang, Jae Hoon Shim, Sung Don Hong, Seung Jung Lee
  • Patent number: 9403960
    Abstract: The invention relates to fluoropolymer articles that have been irradiated with at least 5 Kilo Gray of radiation, where the resulting articles have low levels of leachable or extractable fluoride ion. The low fluoride ion migration from the irradiated article is due to the presence of low levels of metallic salts or oxides in the fluoropolymer composition. The invention is especially useful for fluoropolymer articles in which the fluoropolymer layer contacts a biological or pharmaceutical fluid, and that are subjected to sterilization by irradiation.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: August 2, 2016
    Assignee: Arkema Inc.
    Inventor: Saeid Zerafati
  • Patent number: 9394410
    Abstract: Processing methods are described for improving the physical properties of elastomeric materials including elastomeric tubing. The methods include heating tubing in a post-cured step for a specified time and at a specified temperature. The methods also include irradiating the tubing with a desired dose of radiation. Embodiments can include treatment of silicon-based elastomers and/or non-silicon-based elastomers. The improved elastomers can be utilized in pumps.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: July 19, 2016
    Assignee: CareFusion 303, Inc.
    Inventor: Vincent Bavaro
  • Patent number: 9394244
    Abstract: Disclosed are functional polyallophanate oligomers comprising ethylenically unsaturated groups and polymer stabilizer groups selected from hindered amine light stabilizers, ultraviolet light absorbers, antioxidants and dihydrocarbylhydroxylamines. The ethylenically unsaturated groups and the polymer stabilizer groups are bound to the polyallophanate oligomers through allophanate and/or carbamate groups. The polyallophanate oligomers are useful in curable coatings, inks and varnishes. The present polyallophanate oligomers are derived from a) organic polyisocyanates, b) compounds containing at least one isocyanate reactive group and at least one ethylenically unsaturated group and c) polymer stabilizers containing at least one isocyanate reactive group.
    Type: Grant
    Filed: October 22, 2013
    Date of Patent: July 19, 2016
    Assignee: BASF SE
    Inventors: Eugene Valentine Sitzmann, David Trumbo, Mervin Wood
  • Patent number: 9394391
    Abstract: Provided are: surface modification method for imparting slidability to surface of elastic body such as vulcanized rubber or thermoplastic elastomer without using expensive self-lubricating resin; surface-modified elastic body with polymer brush formed on its surface; and gasket for injector and injector formed of surface-modified elastic body. The surface modification method applies to surface of thermoplastic elastomer or vulcanized rubber.
    Type: Grant
    Filed: June 3, 2015
    Date of Patent: July 19, 2016
    Assignees: SUMITOMO RUBBER INDUSTRIES, LTD., KYUSHU UNIVERSITY
    Inventors: Yasuhisa Minagawa, Yasuhiko Kondo, Tetsuo Mizoguchi, Atsushi Takahara, Motoyasu Kobayashi
  • Patent number: 9394461
    Abstract: Radiation curable composition for preparing a hybrid sol-gel layer on a surface of a substrate, wherein said composition comprises at least one radically radiation curable material; at least one non-reactive organofunctional silane; at least one reactive organofunctional silane; at least one cationic photoinitiator; and at least one radical photoinitiator. Method for preparing a hybrid sol-gel layer on a surface of a substrate using said composition and hybrid sol-gel layer so prepared. Substrate comprising at least one surface coated with said hybrid sol-gel layer.
    Type: Grant
    Filed: May 16, 2013
    Date of Patent: July 19, 2016
    Assignees: UNIVERSITE DE HAUTE-ALSACE, SOCOMORE
    Inventors: Céline Croutxe-Barghorn, Abraham Chemtob, Lingli Ni, Nadia Moreau, Thierry Bouder
  • Patent number: 9394386
    Abstract: Disclosed are polymerizable mixtures comprising a functionalized ionic gemini surfactant and a thiol-ene crosslinking agent. The polymerizable mixtures that further comprise a polar solvent may be used to form the surfactant into a triply periodic multiply continuous lyotropic phase in the presence of the crosslinking agent. Upon crosslinking, the lyotropic phase morphology is substantially retained.
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: July 19, 2016
    Assignees: WISCONSIN ALUMNI RESEARCH FOUNDATION, NATIONAL SCIENCE FOUNDATION
    Inventors: Mahesh Kalyana Mahanthappa, James Jennings
  • Patent number: 9388267
    Abstract: A photocurable elastomer composition comprising: (A) a liquid polymer having a number average molecular weight of 5,000 or more, and mainly containing —[CH2C(CH3)2]— units; (B) a (meth)acrylate monomer; and (C) a photo polymerization initiator, the mass ratio ((A):(B)) between the component (A) and the component (B) being 10:90 to 39:61.
    Type: Grant
    Filed: February 4, 2014
    Date of Patent: July 12, 2016
    Assignee: BRIDGESTONE CORPORATION
    Inventors: Toshihiko Kurata, Takehiro Sano
  • Patent number: 9381140
    Abstract: The invention relates to a polymerizable dental material containing a) at least one curable aliphatic and/or cycloaliphatic monomer system having a refractive index that is measured at 23° C. and a wavelength of 589 nm of less than or equal to 1.50 that contains at least one aliphatic and/or cycloaliphatic bis(meth)acrylate and/or at least one aliphatic and/or cycloaliphatic bis(meth)acrylamide; and b) 15 to 80% by weight relative to the total mass of the dental material of at least one filler selected from the group of fused silica having a refractive index that is measured at 23° C. and a wavelength of 589 nm of 1.45 to 1.47, or cristobalite with a refractive index that is measured at 23° C. and a wavelength of 589 nm of 1.48 to 1.49, or combinations thereof. The radically polymerizable dental material has excellent storage properties and is formulated, in particular, as a two-component mixture containing components A and B.
    Type: Grant
    Filed: August 30, 2013
    Date of Patent: July 5, 2016
    Assignee: Kettenbach GmbH & Co. KG
    Inventors: Alexander Bublewitz, Jens-Peter Reber, Alexander Theis
  • Patent number: 9383480
    Abstract: A photocurable acrylate composition, containing a compound of formula (I) as a photoinitiator and the components adapted to the photoinitiator. The photocurable composition has very good storage stability and very high light sensitivity, can be cross-linked and cured at a very low exposure dose, and has a very good curing effect; a film made from the composition has a smooth edge, no defect and scum, and good integrity throughout the whole pattern, and is a high-hardness resist film, and an optical filter made therefrom has high optical transparency and no light leakage.
    Type: Grant
    Filed: January 26, 2014
    Date of Patent: July 5, 2016
    Assignee: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.
    Inventor: Xiaochun Qian
  • Patent number: 9382433
    Abstract: A series of novel ketocoumarin photoinitiators are disclosed for use in radiation curing.
    Type: Grant
    Filed: July 26, 2013
    Date of Patent: July 5, 2016
    Assignee: SUN CHEMICAL CORPORATION
    Inventors: Brian Rowatt, Shaun Herlihy, Robert Davidson
  • Patent number: 9382457
    Abstract: An adhesive film, an adhesive composition for the same, and an optical member including the same, the adhesive film having an index of refraction of about 1.48 or more and a dielectric constant variation of about 30% or less, as expressed by Equation 1: Dielectric ? ? constant ? ? variation ? ? ( % ) = ( A - B ) A × 100 , [ Equation ? ? 1 ] wherein A is the dielectric constant of the adhesive film measured at a frequency of 103 Hz, and B is the dielectric constant of the adhesive film measured at a frequency of 106 Hz, and/or the adhesive film including a (meth)acrylate copolymer having carbonate groups and an aromatic groups.
    Type: Grant
    Filed: June 26, 2013
    Date of Patent: July 5, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Lee June Kim, Ik Hwan Cho, Ki Yong Kim, Sung Hyun Mun, In Cheon Han