Patents Examined by Jessica Treidl
  • Patent number: 7517918
    Abstract: The present invention relates generally to a UV curable paint composition, a method for using the same and a coating composition made from the same. According to one embodiment, the paint composition includes a silicone modified aliphatic acrylated oligomer having fluorine substituted side chains in an amount by weight from 5% to 25%, an alkyl acrylate monomer in an amount by weight from 5% to 25%; a photoinitiator in an amount by weight from 0.1% to 5%; a plurality of pigment particles in an amount by weight from 0.1% to 5%; a nano-silver solution in a amount by weight from 0.1% to 5%; with remainder being solvent.
    Type: Grant
    Filed: August 18, 2006
    Date of Patent: April 14, 2009
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventors: Chi-Chuang Ho, Chuan-De Huang
  • Patent number: 7462650
    Abstract: The Invention relates to novel ketones of formulae (I) and (II) wherein R1, R2, R3 and R4 are, for example, C1-C8alkyl, R5 is, for example, hydrogen, A is CI, Br, -0-R7, —NR8R9 or —S—R16, A? is —O—, —NH— or —NR8—, X and Y are each independently of the other —O—R10 or —N(R11)(R12), n is an integer from 1 to 10, R6 is, for example, an n-valent radical of linear or branched C2-C20alkyl the carbon chain of which may be interrupted by cyclohexanediyl, phenylene, —CH(OH)—, —C(C2H5)(CH2—CH2—OH)—, —C(CH3)(CH2—CH2—OH)—, —C(CH2—CH2—OH)2—, —N(CH3)—, —N(C2H5)—, —N(CH2—CH2—OH)—, —CO—O—, —O—CO—, —P(CH2—CH2—OH)—, —P(O)(CH2—CH2—OH)—, -0-P(O—CH2—CH2—OH)—O—, -0-P(O)(0-CH2—CH2—OH)—O—, —O-cyclohexanediyl-C(CH3)2-Cyclohexanediyl-O—, —O-phenylene-C(CH3)2-phenylene-O—, —O-phenylene-CH2-phenylene-O—, —Si(CH3)2—, -0-Si(CH3)2—O—, —O—Si(CH3)(0-CH3)—O—, —Si(CH3)(R17)—O—Si(CH3)(R18)—, 5-(2-hydroxyethyl)-[1,3,5]triazinane-2,4,6-trione-1,3-diyl and/or by from one to nine oxygen atoms.
    Type: Grant
    Filed: May 4, 2004
    Date of Patent: December 9, 2008
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Reinhard H. Sommerlade, Rinaldo Hüsler, Stephan Ilg, André Fuchs, Souâd Boulmaâz, Jean-Luc Birbaum
  • Patent number: 7452673
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: January 16, 2007
    Date of Patent: November 18, 2008
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cupoletti