Abstract: An adhesive application apparatus for applying a liquid adhesive to an object includes a regular application stage against which the object is placed for a regular application of the liquid adhesive to the object, a trial application stage to which a trial application of the liquid adhesive is carried out, an application unit relatively movable with respect to the regular application stage and trial application stage to carry out the regular application and trial application of the liquid adhesive, and a suction unit carrying out a suction operation of the liquid adhesive used in the trial application. The adhesive application apparatus smoothly carries out the trial application of the liquid adhesive without bothering the operation of an adhesive application line.

Abstract: A mask assembly includes a frame including an opening part; and unit masks that are disposed on the opening part and having both ends of each of the unit masks supported by the frame in the state where tensile force is applied in one direction, each of the unit masks including: pattern opening parts disposed in the one direction; and a first groove disposed adjacent to the pattern opening parts and between the pattern opening parts and an edge of the unit mask, and formed to be depressed from a surface of the unit mask.

Abstract: An image forming apparatus includes a generating mechanism to generate foam from a liquid or gel which may take a foam state, a coating roller having a peripheral surface supplied with the foam to coat the foam on the peripheral surface onto a surface of a recording medium, and a transport passage to transport the foam from the generating mechanism to the coating roller by an accumulation force of the foam.

Abstract: A method and apparatus for applying sealant. The apparatus may comprise a sealant flow control system. The sealant flow control system may be configured to engage a nozzle of a sealant container to reduce a flow of sealant from the nozzle.

Abstract: A deposition mask capable of forming layers with different thicknesses and a method of fabricating the same are disclosed. In one embodiment, the deposition mask includes i) a plurality of regions spaced apart from each other, wherein the plurality of regions comprise at least a first region and a second region and ii) first and second surfaces opposing each other, wherein the first surface is configured to receive a deposition material. Also, a through-hole is defined in each of the plurality of regions, and wherein at least one of the through-holes in the first surface of the mask is divided into a plurality of sub-regions. Further, the number of a sub-region or sub-regions of the first region is different from that of the second region.

Abstract: An apparatus for internally lining an elongate member, the apparatus including an outer barrel portion and an inner mold head, an annular mold cavity defined between the outer barrel portion and the inner mold body, and means for providing a settable material to the mold cavity wherein the settable material is injected into the mold cavity as the elongate member is forced past the cavity, internally lining the elongate member.

Abstract: Systems and relative methods for regulating the loading capacity of a coating sleeve affixed to an outer surface of an implantable medical device to control an amount of antimicrobial agent delivered with the implantable medical device. A coating sleeve defines fibril void spaces into which therapeutic agents are loaded. A clamp is positioned on the coating sleeve to adjust the volume of the fibril void spaces so as to regulate the loading capacity of the coating sleeve.

Abstract: Provided is an apparatus for processing a substrate. The apparatus includes a chamber, a process unit, and an exhaust member. The chamber has an inner space. The process unit is disposed at the inner space of the chamber and is movable outward from the chamber through a side of the chamber. The process unit includes an exhaust line. The exhaust member is disposed at the chamber. The exhaust member is connected to the exhaust line, and the exhaust member includes a movable exhaust port configured to be moved according to a movement of the process unit.

Abstract: A vapor deposition device (50) includes a mask (60) having periodic patterns, and only a region of the mask (60) where a one-period pattern is formed is exposed. A length of the mask base material along a direction perpendicular to a long-side direction of the mask base material is shorter than a length of a film formation substrate (200) along a direction of scanning of the film formation substrate (200). The mask (60) is provided so that the long-side direction of the mask base material is perpendicular to the direction of scanning and that the exposed region is allowed to move in a direction perpendicular to the direction of scanning by rotation of a wind-off roll (91) and a wind-up roll (92).

Abstract: A device for marking a ball includes a stencil ring and a housing. The housing includes a base and a top. The base includes a base quick connecting element. The top includes a top quick connecting element. The base and said top quick connecting elements are for connecting and disconnecting the base to the top. The housing encloses the stencil ring when the base and the top quick connecting elements are connected. The stencil ring includes stencil symbols. The base and the top are sized to hold the ball for marking with the stencil symbols when the base and top quick connecting elements are connected.

Abstract: An apparatus for coating a stent comprises a coating solution reservoir, a stent support for carrying a stent adjacent the reservoir, transducers for generating waves through the coating solution, and a controller that controls timing at which the transducers are powered in order to eject a droplet of the coating solution.

Abstract: An atomic layer deposition apparatus includes: a first chamber which is surrounded by walls including a supply hole for the reactive gas formed thereon; a second chamber which is surrounded by walls including a supply hole for a source gas formed thereon; an antenna array which is provided in the first chamber, the antenna array having a plurality of rod-shaped antenna elements provided in parallel respectively to produce the plasma using the reactive gas; a substrate stage which is provided in the second chamber, the substrate being placed on the substrate stage; and a connecting member which connects the first chamber and the second chamber to supply gas containing reactive gas radical from the first chamber to the second chamber, the reactive gas radical being produced using the antenna array.

Abstract: An apparatus for depositing a ta-C thin film for a magnetic recording medium includes a film deposition chamber; a plasma beam formation portion for supplying a plasma beam to the film deposition chamber to form the ta-C thin film on a substrate with a magnetic recording layer thereon; a substrate holder rotatably arranged in the film deposition chamber; a tilting member for continuously changing an inclination angle of the plasma beam to a surface of the magnetic recording layer; and a rotating member for rotating the substrate about a rotation axis of the substrate holder. A control member rotates the substrate holder with the substrate thereon and operates the tilting member to continuously change the inclination angle from a minimum inclination angle to a maximum inclination angle according to an increase in film thickness of the ta-C thin film being formed by the plasma beam formation portion.

Abstract: The invention relates to a method of generating a multicomponent particle comprising: and a multicomponent particle generating system comprising a movable support constructed to accelerate particles supplied on the movable support; a particle supply system for supplying the particles to the movable support; at least one nozzle arranged to generate a generally uninterrupted fluid jet along at least part of a circumference of the movable support without breaking up; to have said accelerated particles collide with the fluid jet so as to combine said particles with fluid of the fluid jet, for providing a multicomponent particle; and a collector arranged in the trajectory of said particles, by which said particles can be captured after collision with the fluid jet.

Abstract: Shaped metal deposition apparatus comprises a mounting head for mounting a shaped metal deposition device, an inert gas shield for providing an inert atmosphere around shaped metal deposited in use by the shaped metal deposition device, and a rotatable coupling between the mounting head and the inert gas shield to permit relative rotation therebetween.

Abstract: A film coating holder includes a top cover, a plurality of annular parts, and a plurality of connecting pieces. The top cover defines a plurality of first holes for receiving workpieces therein. The plurality of annular parts is stacked on each other with progressively increasing radiuses. Each of the plurality of annular parts defines a plurality of second holes for receiving the workpieces, and the top cover is positioned on the annular part with a minimum radius. The plurality of connecting pieces connects the annular part with the minimum radius to the top cover and connects each two adjacent annular parts together.

Abstract: An apparatus for applying adhesive to the surface of expanded resin panels by means of a gluing roller, comprising a conveyor for feeding a panel, which is arranged upstream of the gluing roller, and a conveyor for receiving the panel, which is arranged downstream of the gluing roller, the conveyors being mutually aligned on a supporting framework so as to have adjacent ends, and means for moving the conveyors between a lowered position and a raised position, the means being controlled by an element for detecting a panel conveyed by the feeding conveyor so as to lift or lower the conveyors to a level at which the surface of the gluing roller is substantially in tangent contact with the panel in order to apply thereon a layer of adhesive.

Abstract: An installation for the hardened galvanization of a continuously-moving rolled steel strip, includes a coating tank receiving a liquid metal mixture containing, for example, zinc and aluminum to be deposited on the strip which is immersed in the mixture. The liquid mixture is permanently circulated between the coating tank and a preparation device, in which the temperature of the liquid mixture is deliberately lowered in order to reduce an iron solubility threshold and is sufficiently high for initiating fusion of at least one ingot containing a zinc-aluminum Zn—Al alloy in a so-called fusion zone of the preparation device, in an amount necessary to compensate for the liquid mixture used for deposition on the strip. The installation includes a loop for circulating the liquid mixture that is thermally optimized.

Abstract: A coating powder feed method, coating powder feeding device, electrostatic powder spraycoating apparatus containing such a coating powder feeding device. The invention includes a dense phase powder pump fitted with at least one feed chamber. A control signal to create a partial vacuum in the feed chamber is generated no earlier than simultaneously with, preferably by a predetermined delay time after, a control signal opening a powder intake valve of the feed chamber, as a result of which the beginning of partial vacuum buildup in the feed chamber shall take place no earlier than simultaneously with the initial opening of the powder intake valve or by a defined time delay after the opening of the powder intake valve.

Abstract: A liquid application apparatus includes a guide roll for guiding a sheet for application, and a slit die for applying a liquid to a surface of the sheet for application from an opening. The slit die has an upper layer flow path and a lower layer flow path spaced in the rotational direction of the guide roll and joining at the opening. In a cross section perpendicular to the axis of the guide roll, an angle ? formed by the center line of the upper layer flow path and the center line of the lower layer flow path is 0.