Patents Examined by John C. Bleutde
  • Patent number: 5466529
    Abstract: A method is provided to impart stain resistance to a polyamide substrate, which method comprises contacting the substrate with an anionic polysiloxane selected from the group consisting of (A) a polysiloxane having at least one carboxy group, (B) a polysiloxane having at least one phosphonic acid group or a phosphonic salt group, (C) a polysiloxane having at least one carboxy group and at least one sulfonate group, and (D) a mixture of at least two of polysiloxanes (A), (B) and (C).
    Type: Grant
    Filed: June 2, 1993
    Date of Patent: November 14, 1995
    Assignee: OSi Specialties, Inc.
    Inventor: Anna M. Czech