Abstract: A method is provided to impart stain resistance to a polyamide substrate, which method comprises contacting the substrate with an anionic polysiloxane selected from the group consisting of (A) a polysiloxane having at least one carboxy group, (B) a polysiloxane having at least one phosphonic acid group or a phosphonic salt group, (C) a polysiloxane having at least one carboxy group and at least one sulfonate group, and (D) a mixture of at least two of polysiloxanes (A), (B) and (C).