Patents Examined by John P. Lee
  • Patent number: 6917046
    Abstract: A positioning apparatus includes a first stage, capable of moving in a first direction and a second direction which is orthogonal to the first direction, a second stage, arranged on the first stage and moved with the first stage, and capable of moving in the first direction and the second direction and capable of mounting an object to be adjusted in a position and a rotation, and a driving mechanism, arranged on the first stage, and for moving the second stage relative to the first stage. The driving mechanism includes a first electromagnet which generates first suction power, a second electromagnet, provided opposite to and away from the first electromagnet, which generates second suction power, and a core member, which is held movable between the first and second electromagnets, and moves by being pulled in accordance with the first and/or second suction power.
    Type: Grant
    Filed: August 12, 2003
    Date of Patent: July 12, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Nobushige Korenaga
  • Patent number: 6900434
    Abstract: A hollow exciting current pathway in the form of a conductor is arranged outside of an ion deflection casing with a curved contour and having an inlet and an outlet. The conductor is composed of a widthwise spiral formation of conductors running through the inlet and outlet and along the curved contour with a result that a magnetic field which is uniform widthwise is formed in the ion deflection casing. An ion beam is introduced through between the conductors at the inlet into the hollow exciting current pathway. By the action of the magnetic field through the hollow exciting current pathway, the ion beam is bent depending upon mass of ions. The ion beam with desired mass is taken out through between the conductors at the outlet with a result that an ion beam greater in size can be ion mass separated uniformly.
    Type: Grant
    Filed: December 27, 2001
    Date of Patent: May 31, 2005
    Assignee: Ishikawajima-Harima Jukogyo Kabushiki Kaisha
    Inventor: Hajime Kuwabara
  • Patent number: 6862392
    Abstract: The present invention provides materials suitable for use as secondary coatings of optical fibers. According to one embodiment of the invention, a curable composition includes an oligomer and at least one monomer, which when cured forms a cured polymeric material having a Young's modulus of at least about 1200 MPa, and a fracture toughness of at least about 0.7 MPa·m1/2. According to another embodiment of the invention, a coated optical fiber includes an optical fiber; a primary coating encapsulating the optical fiber; and a secondary coating encapsulating the primary coating, the secondary coating having a Young's modulus of at least about 1200 MPa, and a fracture toughness of at least about 0.7 MPa·m1/2.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: March 1, 2005
    Assignee: Corning Incorporated
    Inventors: Michelle D. Fabian, Gregory S. Glaeseman, David N. Schissel
  • Patent number: 6822233
    Abstract: A scanning transmission electron microscope (STEM) has an electron source for generating a primary electron beam and an electron illuminating lens system for converging the primary electron beam from the electron source onto a specimen for illumination. An electron deflecting system is provided for scanning the specimen with the primary electron beam. The STEM also has a scattered electron detector for detecting scattered electrons transmitted through the specimen. A projection lens system projects the scattered electrons onto a detection surface of the scattered electron detector. An image displaying device displays the scanning transmission electron microscope image of the specimen using a detection signal from the scattered electron detector. A detection angle changing device for establishes the range of the scattering angle of the scattered electrons detected by the scattered electron detector.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: November 23, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Kuniyasu Nakamura, Hiroshi Kakibayashi, Mikio Ichihashi, Shigeto Isakozawa, Yuji Sato, Takahito Hashimoto
  • Patent number: 6781117
    Abstract: An improved collison or reaction cell for collecting and focusing gas-phase ions in a mixture from an ion source or a mass analyzer into a gas-filled collision cell, inducing fragmentation or reaction of the ions by interaction with neutral or ionic gas-phase species, passing the resultant ionic products into another mass analyzer, determining the mass spectrum of the collision fragment ions to confirm the identity of the components in a mixture. The collision cell simultaneously provides collision gas confinements, precursor and product ion confinement, variability of collision energy, and variability of the DC drift field in the collision cell. Embodiments of this invention are methods and devices for improving the information content of chemical ionic species when coupled in tandem with mass analyzers.
    Type: Grant
    Filed: May 29, 2003
    Date of Patent: August 24, 2004
    Inventors: Ross C Willoughby, Edward W Sheehan
  • Patent number: 6744054
    Abstract: An evacuation use sample chamber is constituted by a top table 21 which is provided with a recessed portion disposed in a sample chamber main body 10 and for mounting a sample 8 and a groove portion surrounding the recessed portion; a stage 20 which holds the top table 21 and is displaceable in front and back, right and left and up and down directions together with the top table 21; a sample chamber cover 11 which covers above the sample chamber main body 10 including the top table 21; and an evacuation use pipe 21C which communicates with the groove portion and evacuates gas between the bottom face of the sample chamber cover 11 and the top face of the top table 21 including the sample 8. Thereby, an evacuation use sample chamber which performs a stable evacuation and keeps around a sample at a predetermined high vacuum and a circuit pattern forming apparatus which permits a highly accurate pattern drawing over the entire region of the sample are provided.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: June 1, 2004
    Assignees: Hitachi, Ltd., Canon Inc.
    Inventors: Masaki Mizuochi, Yoshimasa Fukushima, Mitsuru Inoue
  • Patent number: 6452197
    Abstract: In ion implantation processes, secondary electrons are emitted from a substrate in an ion implanter during ion implantation and have the effect of producing excessive negative charge build up on the substrate damaging the substrate. An apparatus and a method is provided in which the negative charge build up on the substrate is restricted by extending a magnetic filter across the ion beam between a substrate holder and a plasma flood source of the ion implanter to deflect the secondary electrons with higher energies above about 15 eV out of the ion beam to be absorbed by a conductive element, preventing re-attachment of the high energy secondary electrons to the substrate and allowing lower energy electrons below about 15 eV, which are necessary for neutralising positive charge build up on the substrate caused by the ion beam, to diffuse across the magnetic filter without being deflected out of the ion beam.
    Type: Grant
    Filed: August 18, 2000
    Date of Patent: September 17, 2002
    Assignee: Applied Materials, Inc.
    Inventor: Hiroyuki Ito