Patents Examined by John R Nailing
  • Mechanically scanned wet chemical processing
    Patent number: 6794300
    Abstract: A substrate such as a semiconductor wafer is move across the top of an open trough while a liquid is maintained in the trough at a level just above the walls of the trough, as by supplying the liquid to the trough so that the liquid gently overflows the trough. The downwardly-facing surface of the substrate contacts the liquid. The substrate is moved at a constant rate so that the duration of contact is the same for all portions of the surface.
    Type: Grant
    Filed: August 7, 2002
    Date of Patent: September 21, 2004
    Assignee: Creative Design Corp.
    Inventor: Gary Hillman