Patents Examined by John S. Cho
  • Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same
    Patent number: 6087065
    Abstract: A photoresist film superior in etch resistance and PED stability, as well as transmittance to deep UV, having a backbone of polymethylmethacrylate grafted with piperidine moiety of which the nitrogen atom acts as a base.
    Type: Grant
    Filed: December 29, 1998
    Date of Patent: July 11, 2000
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Cha Won Koh, Cheol Kyu Bok