Patents Examined by Jonathan Johnson
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Patent number: 12763410Abstract: A battery module includes a housing assembly, a cell assembly, a circuit board, and a first connecting member. The housing assembly includes a first side wall and a second side wall. The first side wall is provided with a first through hole. The second side wall is provided with a second through hole. The cell assembly is accommodated in the housing assembly. The cell assembly includes cells. Each cell includes an electrode terminal. The circuit board connects to the electrode terminal. The first connecting member connects to the circuit board. The first connecting member is disposed in the first through hole and the second through hole. The first connecting member is provided with a first channel. The first channel communicates with the first through hole and the second through hole.Type: GrantFiled: November 21, 2022Date of Patent: October 13, 2026Assignee: NINGDE AMPEREX TECHNOLOGY LIMITEDInventors: Fanggui Peng, Pengcheng Yang
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Patent number: 12763437Abstract: A battery module and a battery pack including the same are provided. The battery module includes a battery cell stack in which a plurality of battery cells including protruded electrode leads are stacked, the battery cell including protruding portions respectively formed at both ends of a lower edge of the battery cell, a module frame that houses the battery cell stack, and busbar frames disposed to a front and a rear of the battery cell stack where the electrode leads are protruded, at least one of the busbar frames including a guide portion extending to a lower surface of the battery cell stack, the guide portion comprising a guide groove into which the protruding portion is inserted, and the guide groove including an adjusting portion of which a width becomes narrower from where the battery cell is positioned to where the busbar frame is positioned.Type: GrantFiled: January 19, 2022Date of Patent: October 13, 2026Assignee: LG ENERGY SOLUTION, LTD.Inventor: Kye Yeon Ryu
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Patent number: 12756011Abstract: An electrolyte, an electrochemical device containing same, and an electronic device. Specifically, an electrolyte, including dimethyl carbonate, ethyl methyl carbonate, and lithium bis(oxalato)borate. The ethyl methyl carbonate and the lithium bis(oxalato)borate each account for a specified weight percent in the electrolyte, and the weight percent of the dimethyl carbonate and the weight percent of the ethyl methyl carbonate in the electrolyte meet a specified relationship. The electrolyte provides with balanced rate performance, the low-temperature discharge performance, and the high-temperature storage and cycle performance of the electrochemical device, and helps to achieve excellent comprehensive performance of the electrochemical device.Type: GrantFiled: September 30, 2022Date of Patent: October 6, 2026Assignee: NINGDE AMPEREX TECHNOLOGY LIMITEDInventors: Shaoyun Zhou, Chao Tang
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Patent number: 12749620Abstract: The present invention provides a permeating treatment method for radially oriented sintered magnet, a magnet, and a composition for magnet permeation, wherein in permeating treatment, the magnet and a target permeation source maintain relative movement therebetween all the time, thus internal defects of the oriented sintered magnet are overcome, and the coercivity and thermal stability of the sintered oriented magnet can be stably improved. Moreover, the present invention, having a controllable permeation amount and uniform permeation, is suitable for permeation reaction of a target permeation source with high viscosity or a low melting point, has a wide range of choice for raw materials, and high utilization ratio of permeation elements substantially with no loss, and low cost, thus being suitable for industrialized popularization and use.Type: GrantFiled: November 3, 2023Date of Patent: September 29, 2026Assignee: China Rare Earth Radimag (Shenzhen) Technology Co., Ltd.Inventors: Wenhao Cheng, Fangyun Wei, Yan Wang, Zoucheng Cheng
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Patent number: 12744241Abstract: The present invention relates to an electrochemical cell comprising an anode, a polymer electrolyte and high-potential NMC type cathode active material. The polymer electrolyte comprises an electrolyte composition, preferably comprising a deep eutectic solvent (DES), and a polymer network having a polyacrylamide backbone.Type: GrantFiled: September 19, 2022Date of Patent: September 22, 2026Assignee: UmicoreInventors: An-Sofie Kelchtermans, Bjorn Joos, An Hardy, Marlies Van Bael
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Patent number: 12742224Abstract: Described is a method of recovering a metal from a substrate having a metal sulphide, metal oxide, or combination thereof, by contacting the substrate with an aqueous oxidant to oxidize the metal sulphide to elemental sulphur and oxidized metal or convert the complex metal oxide to a metal salt, contacting the oxidized metal or simple metal oxide with ammonium hydroxide to form soluble a ammine complex of the metal to obtain a leachate and residual solids; separating the leachate from the residual solids; and recovering the metal.Type: GrantFiled: November 26, 2019Date of Patent: September 22, 2026Assignee: Yava International Inc.Inventor: Madhav Dahal
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Patent number: 12738506Abstract: An electrode body in which a battery sheet is wound around a first end thereof as an axis. The battery sheet includes: a current collector which includes a first layer and first and second metal layers; a first active material layer laminated on the first metal layer; a second active material layer laminated on the second metal layer; and a separator which comes into contact with the first or the second active material layer. The first and second metal layers are not laminated in at least a portion on the first and second surfaces of the first layer at the first end of the current collector, or the first or second metal layer is not laminated on a surface of either of the first surface or the second surface of the first layer which is on an outward side of a roll at a second end of the current collector.Type: GrantFiled: March 27, 2020Date of Patent: September 15, 2026Assignee: TDK CORPORATIONInventor: Akinobu Nojima
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Patent number: 12734581Abstract: An additive manufacturing paste composition for manufacturing a three-dimensional shaped article of a material of interest, said paste composition including 70-99.8 wt. % with respect to the weight of the composition of particles of the material of interest, the material of interest being one or more compounds selected from the group of metals and metal alloys and mixtures thereof, at least one binder component, at least one additive component, which is a lubricant, one or more solvents which are miscible with each other, wherein the sum of the concentration of the at least one additive component and the at least one binder is between 0.06 wt. % and 10.0 wt. %, with respect to the weight of the paste composition, and wherein at least one of the additive component and the binder component or the mixture thereof are shear-thinning.Type: GrantFiled: July 20, 2020Date of Patent: September 15, 2026Assignee: VITO NVInventors: Steven Mullens, Ivo Thijs, Bart Michielsen, Marleen Rombouts, Jo Verwimp, Marijn Gysen, Jasper Lefevere
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Patent number: 12736873Abstract: Methods for fabricating an optical waveguide and a display device and a photomask used therein is provided. Firstly, a photomask is provided, wherein the photomask has light blocking structures regularly distributed. A first light curing resin layer is formed on a first transparent substrate. Next, the photomask is placed on the first light curing resin layer. The first light curing resin layer is irradiated and cured with incident light through the photomask and the light blocking structures to have a first curing level and a first refractive index. The first curing level and the first refractive index, corresponding to each other, are periodically distributed. Finally, the photomask is removed from the first light curing resin layer to form an optical waveguide with the first light curing resin layer having the first curing level that is periodically distributed and the first transparent substrate.Type: GrantFiled: January 6, 2022Date of Patent: September 15, 2026Assignees: Interface Technology (ChengDu) Co., Ltd., Interface Optoelectronics (Shenzhen) Co., Ltd., General Interface Solution LimitedInventor: Hung-Hsin Shih
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Patent number: 12735761Abstract: The present invention relates to pressure vessel steel having excellent hydrogen-induced cracking resistance, and a manufacturing method therefor. One embodiment of the present invention provides a pressure vessel steel having excellent hydrogen-induced cracking resistance, and a manufacturing method therefor, the steel comprising, by wt %, 0.2-0.3% of carbon (C), 0.05-0.50% of silicon (Si), 0.03% or less of manganese (Mn), 0.005-0.1% of aluminum (Al), 0.010% or less of phosphorus (P), 0.0015% or less of sulfur (S), 0.001-0.03% of niobium (Nb), 0.001-0.03% of vanadium (V), 0.001-0.03% of titanium (Ti), 0.01-0.20% of chromium (Cr), 0.01-0.15% of molybdenum (Mo), 0.01-0.50% of copper (Cu), 0.05-0.50% of nickel (Ni), 0.0005-0.0040% of calcium (Ca), and the balance of Fe and other inevitable impurities, wherein the average grain size of ferrite is 5-15 ?m.Type: GrantFiled: November 5, 2019Date of Patent: September 15, 2026Assignee: POSCO CO., LTDInventor: Dae-Woo Kim
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Patent number: 12730378Abstract: A method of manufacturing a semiconductor device includes forming a photoresist underlayer including a photoresist underlayer composition over a semiconductor substrate and forming a photoresist layer comprising a photoresist composition over the photoresist underlayer. The photoresist layer is selectively exposed to actinic radiation, and the photoresist layer is developed to form a pattern in the photoresist layer. The photoresist underlayer composition includes: a first polymer having one or more of pendant acid-labile groups and pendant epoxy groups, a second polymer having one or more crosslinking groups, an acid generator, a quencher or photodecomposable base, and a solvent. The photoresist underlayer composition includes 0 wt. % to 10 wt. % of the quencher or photodecomposable base based on a total weight of the first and second polymers.Type: GrantFiled: August 8, 2023Date of Patent: September 8, 2026Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: An-Ren Zi, Ching-Yu Chang
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Patent number: 12724199Abstract: There is provided a method for fabricating a vertically tapered spot-size converter on a substrate, comprising: growing a waveguide core on the substrate; coating the waveguide core with a photoresist layer; placing a photomask having patterns at a negative focus offset point with respect to the photoresist layer, the patterns being defined by openings in the photomask, each opening having a cross-section comprising a region of constant width and at least one region of non-constant width, the non-constant width reducing in a direction extending away from the region of constant width; transferring the patterns of the photomask to the photoresist layer; providing the waveguide core with a vertically tapered profile, the vertically tapered profile being provided by the patterns of the photomask; growing a cladding layer over the waveguide core; and patterning and etching the cladding layer and the waveguide core, thereby defining the vertically tapered spot-size converter.Type: GrantFiled: December 11, 2020Date of Patent: September 1, 2026Assignee: NATIONAL RESEARCH COUNCIL OF CANADAInventors: Omid Salehzadeh Einabad, Christina Elliott, Brian Rioux, Nicaulas Sabourin, Martin Vachon
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Patent number: 12717233Abstract: An aspect of the present disclosure relates to a photosensitive resin composition containing a binder polymer, a photopolymerizable compound, and a photopolymerization initiator, in which the binder polymer includes a structural unit derived from a (meth)acrylate compound having a dicyclopentanyl group, and a weight molecular weight of the binder polymer is 7500 to 23000.Type: GrantFiled: April 27, 2021Date of Patent: August 25, 2026Assignee: RESONAC CORPORATIONInventors: Tetsuya Kato, Akiko Takeda, Yutaka Kawakami
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Patent number: 12699315Abstract: A method for manufacturing a pellicle according to the technical idea of the present invention includes preparing a support substrate, forming a catalyst layer including nickel (Ni) in which one selected from a (110) plane and a (100) plane is a dominant crystal plane, on the support substrate, and performing a chemical vapor deposition process on the catalyst layer at about 1050° C. or less to form a membrane having a graphite layer.Type: GrantFiled: April 3, 2022Date of Patent: August 4, 2026Inventors: Mun Ja Kim, Ji-Beom Yoo, Qicheng Hu, Changyoung Jeong, Ki-Bong Nam, Jin-Ho Yeo
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Patent number: 12699314Abstract: A multilayered-reflective-film-provided substrate includes: a substrate; a multilayered reflective film provided on the substrate; and a protective film provided on the multilayered reflective film, in which the protective film includes ruthenium (Ru) and at least one additive material selected from aluminum (Al), yttrium (Y), zirconium (Zr), rhodium (Rh), and hafnium (Hf), and a content of the additive material is 5% or more by atom and less than 50% by atom.Type: GrantFiled: September 23, 2020Date of Patent: August 4, 2026Assignee: HOYA CORPORATIONInventors: Kota Suzuki, Takahiro Onoue
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Patent number: 12693597Abstract: A method of forming patterned features on a substrate is provided. The method includes: positioning a first mask over a first portion of a substrate; directing radiation through the patterned area of the first mask at the first portion of the substrate to form a first patterned region on the substrate; positioning a second mask over a second portion of the substrate, the second mask including a first patterned area and a second patterned area, the first patterned area spaced apart from the second patterned area by an unpatterned area; directing radiation through the first patterned area of the second mask at a first part of the second portion of the substrate to form a second patterned region on the substrate; and directing radiation through the second patterned area of the second mask at a second part of the second portion of the substrate to form a third patterned region.Type: GrantFiled: April 6, 2023Date of Patent: July 28, 2026Assignee: Applied Materials, Inc.Inventors: Yongan Xu, William Wilkinson, Jing Guo
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Patent number: 12693598Abstract: There are provided an apparatus and a method for providing a substrate, which can suppress any additional reaction between a developing solution and a photoresist (PR) film and prevent any PR remnants from being generated from such additional reaction. The method includes: supplying an organic developing solution onto a substrate while rotating the substrate at a first revolutions per minute (rpm); substituting the organic developing solution with a nonpolar rinse solution by supplying the nonpolar rinse solution onto the substrate while rotating the substrate at a second rpm, which is lower than the first rpm; continuing to supply the nonpolar rinse solution while rotating the substrate at a third rpm, which is higher than the second rpm; and continuing to supply the nonpolar rinse solution while rotating the substrate at a fourth rpm, which is between the second rpm and the third rpm.Type: GrantFiled: April 29, 2022Date of Patent: July 28, 2026Assignee: SEMES CO., LTD.Inventors: Hae Won Choi, Joon Ho Won, Koriakin Anton, Ki Hoon Choi, Eung Su Kim, Pil Kyun Heo, Min Woo Kim, Jin Yeong Sung, Hyo Soo Kim
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Patent number: 12693593Abstract: In pattern formation method, a photomask is loaded into a lithography apparatus, an exposure light is applied to a photo resist layer formed over a substrate through or via the photomask, and the photo resist layer is developed. The photomask includes a plurality of octagonal shape patterns periodically arranged in a first direction and a second direction crossing the first direction. A width Lx of horizontal sides extending in the first direction of each of the plurality octagonal shape patterns is different from a width Ly of vertical sides extending in the second direction of each of the plurality octagonal shape patterns.Type: GrantFiled: March 30, 2022Date of Patent: July 28, 2026Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Wei-De Ho, Han-Wei Wu, Yuan-Hsiang Lung, Hua-Tai Lin
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Patent number: 12692402Abstract: One aspect of the ink jet ink set according to the present disclosure is an ink jet ink set including an anionic ink containing an anionic resin, a pigment, and water, and a cationic ink containing a cationic resin, a pigment, and water, in which the anionic ink and the cationic ink are similar colors to each other, the pigment in the anionic ink is coated with the anionic resin, the pigment in the cationic ink is coated with the cationic resin, and the anionic resin or the cationic resin, or both have a urethane-based skeleton or a polyester-based skeleton.Type: GrantFiled: September 29, 2021Date of Patent: July 28, 2026Assignee: SEIKO EPSON CORPORATIONInventors: Kenji Kitada, Takeshi Yano, Shinichi Naito, Kenta Kikuchi, Hirofumi Hokari
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Patent number: 12692583Abstract: Provided are stainless steel for a polymer fuel cell separator and a method of manufacturing the stainless steel, in which a surface modification technique based on wet processing is applied to a surface of stainless steel used for parts such as an anode and a cathode, etc., of a stack that generates electricity, thereby improving corrosion resistance and electric conductivity, and preventing moisture from being formed.Type: GrantFiled: December 26, 2019Date of Patent: July 28, 2026Assignees: HYUNDAI BNG STEEL CO., LTD., HYUNDAI STEEL COMPANYInventors: Sang Kyu Choi, Sang Heon Cho, Jun Hee Lim, Sung Moon Kim, Kyung Soo Choi, Yeon Soo Jeong, Jae Ho Lee, Hyun Uk Im