Abstract: A method and a device are provided for estimating at least one component placement position on a substrate at which a component is to be placed. The component placement position is estimated on the basis of the position of at least one mark on the substrate. The statistical measurement inaccuracies of the marks are determined. Subsequently, the positional accuracy of the component placement position on the substrate is estimated on the basis of the measurement inaccuracies of the marks. Subsequently, the estimated positional accuracy of the component placement position is compared with a desired positional accuracy. Subsequently, a determination is made regarding whether the component is to be placed on the substrate with the estimated positional accuracy of the component placement position.

Abstract: A structure formed on a semiconductor wafer is examined by obtaining a first diffraction signal measured from the structure using an optical metrology device. A first profile is obtained from a first machine learning system using the first diffraction signal obtained as an input to the first machine learning system. The first machine learning system is configured to generate a profile as an output for a diffraction signal received as an input. A second profile is obtained from a second machine learning system using the first profile obtained from the first machine learning system as an input to the second machine learning system. The second machine learning system is configured to generate a diffraction signal as an output for a profile received as an input. The first and second profiles include one or more parameters that characterize one or more features of the structure.

Abstract: An apparatus for image elastic scattering spectroscopy is disclosed that is comprised of a light source for generating polarized light. Means are provided to convey the polarized light to a target. A collector receives light reflected from the target. A detector is responsive to the collector for generating images at both parallel and perpendicular polarizations for each of a plurality of wavelengths. A range finder detects a distance to the target. Control electronics control the image generation and the range finder. The apparatus may be configured to image areas on the surface of the body or configured so as to be inserted into various body cavities. Typically, the apparatus will be used in conjunction with an analyzer for analyzing the images for evidence of abnormal cells. Methods of gathering data and of screening for abnormal cells are also disclosed.

Abstract: An imaging-type interferometric optical profiler splits a beam reflected from a sample into two beam portions. One portion is a reference beam and the other a sample beam. The reference and sample beams are combined to create interference patterns which are used to obtain a surface profile of the sample. Since vibration of the sample causes the same optical path change, and no reference mirror is used, the interferometric optical profiler is relatively vibration-insensitive and has a fast measurement speed.

Abstract: Methods for grading gemstones, apparatus for grading gemstones, and systems that utilize such methods and apparatus are disclosed.

Abstract: A wavefront measurement system has a source of electromagnetic radiation. An imaging system focuses the electromagnetic radiation at an object plane. A first grating is positioned in the object plane and has a plurality of rulings with randomized height. A stage moves the first grating parallel to the rulings. A projection optical system projects an image of the first grating onto an image plane. A second grating is at the image plane. A detector behind the second grating receives a fringe pattern produced by the second grating.

Abstract: A method and apparatus are disclosed for measuring a characteristic, e.g. spectral bandwidth, of a light beam. The apparatus may comprise an etalon for generating an interference pattern having at least one light cone, an arrangement of detector elements, the arrangement receiving a portion of the light cone and producing a signal indicative of the characteristic; and an auxiliary detector positioned to receive a portion of the light cone and produce a signal indicative of an alignment between the etalon and the linear arrangement.

Abstract: An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium.

Abstract: An apparatus (100) for measuring a thickness of a thin article according to an embodiment of the present apparatus is provided. The apparatus includes an optical fiber interferometer (101), a signal processor module (102) and a measuring module (103). The optical fiber interferometer is configured for obtaining an optical distance difference. This optical distance difference is a result of the thickness of the thin article between a first optical path in which the thin article is measured and a second optical path. The signal processor module is configured for converting an optical distance difference into a phase difference and processing the optical distance difference to obtain a linear signal. That linear signal is convertible into a thickness value of the thin article.

Abstract: A method for inspecting a reticle, that includes the following stages: providing a reticle designed to be exposed by light of a first wavelength during a photolithography process; defining optical characteristics of an inspection system, whereas the optical characteristics include a second wavelength that differs from the first wavelength; and configuring an inspection system in response to the defined optical characteristics. An inspection system that includes: an illumination path adapted to direct light of a second wavelength towards a reticle designed to be exposed by light of a first wavelength during a photolithography process; a collection path adapted to collect light transmitted through the reticle; whereas at least one of the illumination path and collection path is configurable such that the inspection system emulates the photolithographic process while utilizing light of the second wavelength.

Abstract: The displacement detector includes: a light source 140; a beam splitter 170 for dividing the light, which is sent from the light source 140, into two beams of light; reflection mirrors 181, 182 provided for the two beams of light sent from the beam splitter 170, for reflecting these two beams of light and making them incident upon a scale 110; and corner cubes 191, 192 provided for the beams of diffracted light, which are generated when two beams of light incident upon the scale 110 are diffracted by the diffraction grating 111, wherein the corner cubes 191, 192 retroreflect the diffracted light and make the light incident upon the scale as retroreflected light. The incident angle to grating groove formed between the incident light and the normal line vector of the scale is larger than the diffraction angle formed between the retroreflected light and the normal line vector of the scale.

Abstract: Detecting the presence of a target material in a scene by using a multi-aperture interferometer system having a plurality of apertures at least one of which has an adjustable optical path length, by adjusting the aperture(s) to obtain a predetermined optical path length difference among the apertures, the predetermined optical path length difference being based on a source laser wavelength and a target material wavelength, illuminating the scene with the source laser, capturing a spectral data set corresponding to an interference pattern generated in the multi-aperture interferometer system for an illuminated point source in the scene, the spectral data set containing spatially distributed spectral data, and determining whether the target material is present at the illuminated point source based on a presence of spectral data in at least one side lobe of the spectral data set.

Abstract: An interferometer for measuring the flatness, variation of thickness and parallelism of large, thin transparent wafers held vertically and undistorted by gravitational forces. A sodium lamp provides monochromatic light that is diffusely reflected off a background screen towards the wafer. A reference flat surface is positioned sufficiently closely to the wafer that an interference fringe pattern is formed that is a measure of the air gap between the reference flat surface and the surface of the wafer being measured. The background screen is angled so that the fringe pattern, which is localized at the air gap can be viewed at an angle to a normal to the wafer. The background screen has trapezoidal markings that, when viewed at the angle required to see the fringes, appear as a grid. This allows counting of the number of fringes visible within a fixed distance to characterize the surface flatness.

Abstract: Devices, systems, and methods for enhancing Raman spectroscopy and hyper-Raman are disclosed. A molecular analysis device for performing Raman spectroscopy comprises a substrate and a laser source disposed on the substrate. The laser source may be configured for emanating a laser radiation, which may irradiate an analyte disposed on a Raman enhancement structure. The Raman enhancement structure may be disposed on the substrate or apart from the substrate. The molecular analysis device also include a radiation receiver disposed on the substrate and configured for receiving a Raman scattered radiation, which may be generated by the irradiation of the analyte and Raman enhancement structure.

Abstract: A plurality of cassettes, each having a plurality of wafers respectively having a first defect information, is selected. Each of the cassettes is then assigned to a corresponding tool having at least one reaction chamber, and the wafers are substantially equally assigned to the reaction chambers. A first process is then performed on each of the wafers in the reaction chamber. Finally, a first defect inspection process is performed on each of the wafers.

Abstract: A light source system includes a beam source generating a first input beam of light. An anisotropic acousto-optic modulator (AOM) is positioned to receive the first input beam. The AOM includes a plurality of transducers for receiving control signals and generating corresponding acoustic waves that operate on the first input beam to generate first and second output beams with different frequencies and orthogonal linear polarizations. The first and second output beams have a combined optical power that is substantially the same as an optical power of the first input beam for a first input beam with one polarization and for a first input beam with two polarizations.

Abstract: A method and system for visualizing deviations on an actual surface 10, 30 from a nominal, or designed, surface 28 utilizes a system and method for mapping the spatial (e.g. x, y and z) coordinates of the actual surface 10, 30 into a computer 13, comparing the mapped actual surface to the nominal surface 28 to produce a three-dimensional distribution of deviation values (D), processing this distribution into a topographical pattern 34 of multiple contours or areas 34a . . . 34n, each contour or area having the same, or generally the same, deviation value (D), and optically projecting this topographical pattern 34 onto the actual surface 10, 30 in registry with the initial surface mapping to provide a display of the surface deviations (D) directly on the actual surface 10, 30. The deviations are measured along a direction D normal to the actual surface so that the three-dimensional distribution is given in x, y, D coordinates. The optical projection is preferably a laser projection 38.

Abstract: The invention relates to a method of performing an optical measurement on a sample, such as an ellipticity measurement. The sample is irradiated with a polarized irradiation beam and a return beam is linearly polarized. The irradiation or return beam is modulated with a birefringence modulator, such as a photoelastic modulator, in accordance with a primary modulation signal. The return beam is directed onto a multichannel detector. Typically the detector is a slow detector, such as a CCD, having a response time greater than a period of the primary modulation signal. Detection values are generated simultaneously at each detection element and processed to determine a plurality of measurements. Various measurement techniques are described, including detector signal averaging over gated intervals; a design employing coherent modulation of the gain of an ICCD , and a modulator-coherent flash lamp design.

Abstract: A material includes various encrypted information such as product type information, product history information and authentication judging information by using an information presenting substance exhibiting line spectrums and associated with certain encrypted information corresponding to the line spectrums. Line spectrum of the information presenting substance is detected by irradiating electromagnetic waves to the material. Since the line spectrum is narrow in half-width and strong in light emitting intensity, the distinctiveness is high and therefore the encrypted information included in the material can be specified assuredly, enabling the simple and assured identification of the material.

Abstract: Methods and systems for expanding the dynamic range of a system are provided. One method includes splitting fluorescent light emitted by a particle into multiple light paths having different intensities, detecting the fluorescent light in the multiple light paths with different channels to generate multiple signals, and determining which of the channels is operating in a linear range based on the multiple signals. The method also includes altering the signal generated by the channel operating in the linear range to compensate for the different intensities. Another method includes illuminating a particle in multiple illumination zones with light having different intensities and separately detecting fluorescent light emitted by the particle while located in the multiple illumination zones to generate multiple signals. The method also includes determining which of the signals is located in a linear range and altering the signal located in the linear range to compensate for the different intensities.