Abstract: A Metal Insulator Semiconductor (MIS) field effect device has an oxygen-doped polycrystalline silicon layer on the field portion in order to prevent an unwanted parasitic inversion layer. The oxygen-doped polycrystalline silicon layer contains oxygen in the range of 2 to 40 atomic percent.

Abstract: A floating base transistor connected within an integrated circuit to provide a high temperature high voltage low current bypass device having the same type of temperature dependence as the leakage current shunted therethrough. The bypass device is connected to provide its I.sub.CEO current as a current source through which a parasitic leakage current is diverted which would otherwise produce a base current of an output transistor which is supposed to be in the off condition. The parasitic leakage current includes the I.sub.CEO current of an opposite polarity driving transistor in the off condition having its emitter connected to a power supply and its base connected to an input circuit and its collector connected to the base of the output transistor. In one embodiment the floating base transistor is a PNP substrate transistor having its collector connected to ground, its emitter connected to the base of an NPN output transistor, and its base floating.

Abstract: The charge known as "fat zero", employed to reduce charge transfer losses in charge coupled device (CCD) registers is introduced at a fixed ratio to the binary one charge level. This is accomplished by employing two CCD channels having different widths, one for signals, the other for fat zeros, which channels converge into a common channel. The same voltages are employed for the introduction of both charges so that only the geometry of the channels determines the binary one to fat zero charge signal ratio.