Abstract: Embodiments described herein relate to magnetic and electromagnetic systems and a method for controlling the density profile of plasma generated in a process volume of a PECVD chamber to affect deposition profile of a film on a substrate and/or facilitate chamber cleaning after processing. In one embodiment, a system is disclosed that includes a rotational magnetic housing disposed about an exterior sidewall of a chamber. The rotational magnetic housing includes a plurality of magnets coupled to a sleeve that are configured to travel in a circular path when the rotational magnetic housing is rotated around the chamber, and a plurality of shunt doors movably disposed between the chamber and the sleeve, wherein each of the shunt doors are configured to move relative to the magnets.
Type:
Grant
Filed:
December 22, 2020
Date of Patent:
April 16, 2024
Assignee:
Applied Materials, Inc.
Inventors:
Kallol Bera, Sathya Swaroop Ganta, Timothy Joseph Franklin, Kaushik Alayavalli, Akshay Dhanakshirur, Stephen C. Garner, Bhaskar Kumar