Abstract: A double cup pomade assembly for improving pomade retention is adaptable for use with both bottom filling and Lop filling machinery. A pomade retention cup having at least one pomade retention finger has a snap-fit geometry for anchoring it within an elevator cup. The elevator cup is provided with lugs for interaction with conventional extend-and-retract mechanism. One embodiment of the pomade retention cup is symmetrical, avoiding “improper” insertion into a mold. Another embodiment of the pomade retention cup includes a flange at one end for preventing formula leakage during molding and providing an enlarged surface area to offset the forces generated when the elevator cup is pressed into engagement with the pomade retention cup.

Abstract: A process for creating self-aligned vertically arrayed planar transistors. The preferred embodiment relates to the simultaneous fabrication of both NPN and PNP planar vertically arrayed transistors in a conventional monolithic, epitaxial, PN junction isolated, integrated circuit. A field oxide is employed to surface isolate the devices and assist in the self-alignment improvement.