Patents Examined by Kalimah Fernandez
  • Patent number: 7105810
    Abstract: An electrospray ionization device incorporates a shaped thin film with a microfluidic channel. The device may be interfaced to a time-of-flight mass spectrometer (TFOMS). In one embodiment, the shaped thin film has a polygonal-shaped or triangle-shaped thin polymer tip formed by lithography and etching. The microfluidic channel is approximately 20 micrometer wide and 10 micrometers deep, and embossed in a substrate using a silicon master. The shaped thin film is aligned with the channel and bonded between the channel substrate and a flat plate to create a microfluidic channel with a wicking tip protruding from the end of the channel. Application of a high voltage at one end of the channel creates an electrospray from the tip, which is provided to the TFOMS.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: September 12, 2006
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Jun Kameoka, Harold G. Craighead
  • Patent number: 7078679
    Abstract: The invention provides devices, device configurations and methods for improved sensitivity, resolution and efficiency in mass spectrometry, particularly as applied to biological molecules, including biological polymers, such as proteins and nucleic acids. More particularly, the invention provides methods and devices for analyzing and detecting electrically charged particles, especially suitable for gas phase ions generated from high molecular weight compounds. In one aspect, the invention provides devices and methods for determining the velocity, charged state or both of electrically charged particles and packets of electrically charged particles. In another aspect, the invention provides methods and devices for the time-of-flight analysis of electrically charged particles comprising spatially collimated sources. In another aspect, the invention relates to multiple detection using inductive detectors, improved methods of signal averaging and charged particle detection in coincidence.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: July 18, 2006
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Michael S. Westphall, Lloyd M. Smith
  • Patent number: 7064341
    Abstract: The coated nanotube surface signal probe constructed from a nanotube, a holder which holds the nanotube, a coating film fastening a base end portion of the nanotube to a surface of the holder by way of adhering the base end portion on the surface of holder in a range of a base end portion length with an electric contact state and covering a specified region including the base end portion with the coating film maintaining the electric contact state between the nanotube and the holder, a tip end portion of the nanotube being caused to protrude from the holder; and the tip end portion is used as a probe needle so as to scan surface signals. The coated nanotube surface signal probe can be used as a probe in AFM (Atomic Force Microscope), STM (Scanning Tunneling Microscope) other SPM (Scanning Probe Microscope).
    Type: Grant
    Filed: March 4, 2004
    Date of Patent: June 20, 2006
    Assignees: Daiken Chemical Co., Ltd.
    Inventors: Yoshikazu Nakayama, Akio Harada, Seiji Akita
  • Patent number: 7049589
    Abstract: The present invention may include a pattern inspection method of extracting a pattern edge shape from an image obtained by a scanning microscope and inspecting the pattern. A control section and a computer of the scanning microscope process the intensity distribution of reflected electrons or secondary electrons, find the distribution of gate lengths in a single gate from data about edge positions, estimate the transistor performance by assuming a finally fabricated transistor to be a parallel connection of a plurality of transistors having various gate lengths, and determine the pattern quality and grade based on an estimated result. In this manner, it is possible to highly, accurately and quickly estimate an effect of edge roughness on the device performance and highly accurately and efficiently inspect patterns in accordance with device specifications.
    Type: Grant
    Filed: January 8, 2004
    Date of Patent: May 23, 2006
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Atsuko Yamaguchi, Hiroshi Fukuda, Ryuta Tsuchiya, Hiroki Kawada, Shozo Yoneda
  • Patent number: 7049592
    Abstract: A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
    Type: Grant
    Filed: July 9, 2003
    Date of Patent: May 23, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Dominicus Jacobus Petrus Adrianus Franken, Erik Roelof Loopstra, Pertrus Rutgerus Bartray, Marc Wilhelmus Maria Van Der Wijst, Michael Jozefa Mathijs Renkens, Gerard Van Schothorst, Johan Juliana Dries
  • Patent number: 7049614
    Abstract: An electrode in an extreme ultraviolet (EUV) source of an EUV lithography tool. The extreme ultraviolet source may be operable to produce a plasma which emits extreme ultraviolet radiation.
    Type: Grant
    Filed: March 10, 2003
    Date of Patent: May 23, 2006
    Assignee: Intel Corporation
    Inventor: Bryan J. Rice
  • Patent number: 7049582
    Abstract: The present invention relates to a spray needle for use in electrospray ionization (ESI) for mass spectrometry. A spray needle is disclosed which is constructed to have an opening along its length such that a sample solution may be more readily introduced or loaded therein. Further, the design of the spray needle of the invention is more durable than the prior art spray needles and may be reusable. Because sample loading is more readily achieved, the spray needle of the invention is appropriate for use with a fully automated system for the analysis of samples.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: May 23, 2006
    Assignee: Bruker Daltonics, Inc.
    Inventor: Melvin A. Park
  • Patent number: 7049587
    Abstract: Conventionally, defect data outputted by an inspection system comprised only characteristic quantitative data, such as coordinate data, area, and projected length, and only the coordinate data for moving to a defect location could be utilized effectively. By contrast, by using image data in addition to characteristic quantitative data as the defect data for an inspection system, the retrieval of image data via an outside results confirmation system is made possible. Further, for defect data of a plurality of substrates, it is possible to display a defect image during inspection by the fact that similar defects are retrieved via images and retrieval results are displayed as trends, which makes it possible to display a defect image during inspection by searching similar defects on images and displaying them as a trend, and designating a substrate on the trend, thereby displaying the defect map thereof and designating a defect on the defect map.
    Type: Grant
    Filed: February 22, 2002
    Date of Patent: May 23, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Hiroi, Masahiro Watanabe, Asahiro Kuni, Maki Tanaka, Munenori Fukunishi, Hiroshi Miyai, Yasuhiko Nara, Mitsunobu Isobe
  • Patent number: 7034292
    Abstract: A mass spectrometer is configured with individual multipole ion guides, configured in an assembly in alignment along a common centerline wherein at least a portion of at least one multipole ion guide mounted in the assembly resides in a vacuum region with higher background pressure, and the other portion resides in a vacuum region with lower background pressure. Said multipole ion guides are operated in mass to charge selection and ion fragmentation modes, in either a high or low pressure region, said region being selected according to the optimum pressure or pressure gradient for the function performed. The diameter, lengths and applied frequencies and phases on these contiguous ion guides may be the same or may differ. A variety of MS and MS/MSn analysis functions can be achieved using a series of contiguous multipole ion guides operating in either higher background vacuum pressures, or along pressure gradients in the region where the pressure drops from high to low pressure, or in low pressure regions.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: April 25, 2006
    Assignee: Analytica of Branford, Inc.
    Inventors: Craig M. Whitehouse, David G. Welkie, Gholamreza Javahery, Lisa Cousins
  • Patent number: 7034296
    Abstract: An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed. In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: April 25, 2006
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mitsugu Sato, Atsushi Takane, Takashi Iizumi, Tadashi Otaka, Hideo Todokoro, Satoru Yamaguchi, Kazutaka Nimura
  • Patent number: 7030389
    Abstract: An electron beam apparatus having an electron analyzer is achieved which can control the illumination lens system by feedback without adversely affecting the imaging action even if a specimen is positioned within the magnetic field of the objective lens. The apparatus has an energy shift control module for controlling energy shift. On receiving instructions about setting of energy shift from the CPU, the control module issues an instruction for shifting the accelerating voltage to a specified value to an accelerating-voltage control module. The control module also sends information about the energy shift to an energy shift feedback control module, which calculates the feedback value and supplies information about corrections of lenses and deflection coils to a TEM optics control module. The feedback value is multiplied by a corrective coefficient that can be calibrated.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: April 18, 2006
    Assignee: JEOL Ltd.
    Inventor: Toshikatsu Kaneyama
  • Patent number: 7026607
    Abstract: A scanning probe microscope has a scanner and a mounting unit for supporting the scanner. An identifying mark is disposed on a part of the scanner for representing preselected information corresponding to the scanner. The mounting unit has an interpreting device for interpreting the preselected information represented by the identifying mark. A setting device sets in a controller, for controlling the scanning probe microscope, parameter information corresponding to the scanner probe microscope, parameter information corresponding interpreted by the interpreting device.
    Type: Grant
    Filed: April 20, 2004
    Date of Patent: April 11, 2006
    Assignee: SII NanoTechnology Inc.
    Inventors: Itaru Kitajima, Masatsugu Shigeno
  • Patent number: 7015482
    Abstract: An electron beam writing system, using discrete electron beams in which the interval of the beams is larger than the size of the beams, generates plural electron beams, on/off controls each of the electron beams according to pattern data to be written, and deflects the electron beams together, thereby performing writing on a wafer. One side of a unit writing area of the electon beams is larger than substantially twice the interval of the electron beams or substantially an integral multiple thereof.
    Type: Grant
    Filed: January 31, 2003
    Date of Patent: March 21, 2006
    Assignees: Hitachi, Ltd., Canon Kabushiki Kaisha, Advantest Corporation
    Inventors: Yasunari Sohda, Yoshinori Nakayama, Osamu Kamimura, Masato Muraki, Masaki Takakuwa
  • Patent number: 7012262
    Abstract: The invention is directed to a corrector for correcting energy-dependent first-order aberrations of the first degree as well as third-order spherical aberrations of electron-optical lens systems. The corrector includes at least one quadropole septuplet (S1) having seven quadrupoles (Q1 to Q7). The quadrupoles are mounted symmetrically to a center plane (ZS) so as to permit excitation along a linear axis. The corrector furthermore includes at least five octopoles (O1 to O7) which can be excited within the quadrupole septuplet. In an advantageous embodiment, two quadrupole septuplets are mounted in series one behind the other. The quadrupole fields of the two quadrupole septuplets are excited antisymmetrically to a center plane lying between the two quadrupole septuplets.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: March 14, 2006
    Assignee: LEO Elektronenmikroskopie GmbH
    Inventor: Harald Rose
  • Patent number: 7005641
    Abstract: An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.
    Type: Grant
    Filed: December 10, 2003
    Date of Patent: February 28, 2006
    Assignee: Ebara Corporation
    Inventors: Mamoru Nakasuji, Takao Kato, Nobuharu Noji, Tohru Satake, Takeshi Murakami, Kenji Watanabe
  • Patent number: 7005650
    Abstract: An apparatus for fabricating a semiconductor device, including an ultraviolet radiation source, a lamp house body surrounding the ultraviolet radiation source, the lamp house body carrying a mirror surface, an opening provided on the lamp house body, and a vacuum chuck provided on the lamp house body so as to cover the opening, the vacuum chuck being adapted for supporting a semiconductor substrate thereon in a state that the semiconductor substrate is covered by adhesive tape, wherein the vacuum chuck is formed of a material which is substantially transparent to ultraviolet radiation produced by the ultraviolet radiation source.
    Type: Grant
    Filed: April 18, 2002
    Date of Patent: February 28, 2006
    Assignee: Fujitsu Limited
    Inventor: Yutaka Yamada
  • Patent number: 6998608
    Abstract: Disclosed is a high field asymmetric waveform ion mobility spectrometer (FAIMS) with optical based detection of selectively transmitted ions. Light from a light source is directed through an optical port in an electrode of the FAIMS. A light detector is provided for receiving light that is one of transmitted and scattered by the selectively transmitted ions within the FAIMS.
    Type: Grant
    Filed: January 9, 2003
    Date of Patent: February 14, 2006
    Assignee: Ionalytics Corporation
    Inventors: Roger Guevremont, Randy Purves, David Barnett
  • Patent number: 6995365
    Abstract: An improved mass spectrometer is set forth. The mass spectrometer comprises an ion injector that is configured to provide a plurality of ions for analysis and an ion selection unit that is adapted to receive the plurality of ions from the ion injector and provide only those ions having a selected mass-to-charge ratio for detection/analysis. The ion selection unit includes an outer electrode and a plurality of inner electrodes. The plurality of ions provided by the ion injector are accepted into the interstitial region between the outer electrode and the plurality of inner electrodes. A power supply system is connected to the electrodes of the ion selection chamber. The power supply system is adapted to provide an oscillating voltage to at least one of the plurality of inner electrodes to facilitate separation of ions of the selected mass-to-charge ratio from ions of non-selected mass-to-charge ratios.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: February 7, 2006
    Assignee: Beckman Coulter, Inc.
    Inventor: Vincent R. Farnsworth
  • Patent number: 6992287
    Abstract: A system and method for identifying an optimal landing energy of a probe current in a scanning electron microscope system. A probe current having a known landing energy is directed at a sample for producing a signal electron beam. The current of the signal electron beam is measured by directing the beam to a current detector for calculating a current yield, which is the ratio of the signal current to the probe current. The landing energy can then be changed for subsequent measurements of the signal current to identify the landing energy which produces a desired current yield. Once identified, the landing energy value can be used to produce a signal electron beam directed towards an imaging detector to generate topographic images of samples.
    Type: Grant
    Filed: November 10, 2004
    Date of Patent: January 31, 2006
    Assignee: Soluris, Inc.
    Inventor: Neal T. Sullivan
  • Patent number: 6989543
    Abstract: An apparatus in one example comprises a radiation shielding container for one or more radioactive sources. One or more of the one or more radioactive sources are containable within one or more cartridges. The radiation shielding container comprises a support component that restrains movement within the radiation shielding container of one or more of the one or more cartridges. The radiation shielding container comprises one or more vents for movement of a sterilant therethrough.
    Type: Grant
    Filed: August 15, 2003
    Date of Patent: January 24, 2006
    Assignee: C.R. Bard, Inc.
    Inventors: Christopher D. Drobnik, Michael W. Drobnik, Breese Watson, Kevin Wineinger