Patents Examined by Kalimah Fernandez
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Patent number: 7105810Abstract: An electrospray ionization device incorporates a shaped thin film with a microfluidic channel. The device may be interfaced to a time-of-flight mass spectrometer (TFOMS). In one embodiment, the shaped thin film has a polygonal-shaped or triangle-shaped thin polymer tip formed by lithography and etching. The microfluidic channel is approximately 20 micrometer wide and 10 micrometers deep, and embossed in a substrate using a silicon master. The shaped thin film is aligned with the channel and bonded between the channel substrate and a flat plate to create a microfluidic channel with a wicking tip protruding from the end of the channel. Application of a high voltage at one end of the channel creates an electrospray from the tip, which is provided to the TFOMS.Type: GrantFiled: March 21, 2003Date of Patent: September 12, 2006Assignee: Cornell Research Foundation, Inc.Inventors: Jun Kameoka, Harold G. Craighead
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Patent number: 7078679Abstract: The invention provides devices, device configurations and methods for improved sensitivity, resolution and efficiency in mass spectrometry, particularly as applied to biological molecules, including biological polymers, such as proteins and nucleic acids. More particularly, the invention provides methods and devices for analyzing and detecting electrically charged particles, especially suitable for gas phase ions generated from high molecular weight compounds. In one aspect, the invention provides devices and methods for determining the velocity, charged state or both of electrically charged particles and packets of electrically charged particles. In another aspect, the invention provides methods and devices for the time-of-flight analysis of electrically charged particles comprising spatially collimated sources. In another aspect, the invention relates to multiple detection using inductive detectors, improved methods of signal averaging and charged particle detection in coincidence.Type: GrantFiled: November 26, 2003Date of Patent: July 18, 2006Assignee: Wisconsin Alumni Research FoundationInventors: Michael S. Westphall, Lloyd M. Smith
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Patent number: 7064341Abstract: The coated nanotube surface signal probe constructed from a nanotube, a holder which holds the nanotube, a coating film fastening a base end portion of the nanotube to a surface of the holder by way of adhering the base end portion on the surface of holder in a range of a base end portion length with an electric contact state and covering a specified region including the base end portion with the coating film maintaining the electric contact state between the nanotube and the holder, a tip end portion of the nanotube being caused to protrude from the holder; and the tip end portion is used as a probe needle so as to scan surface signals. The coated nanotube surface signal probe can be used as a probe in AFM (Atomic Force Microscope), STM (Scanning Tunneling Microscope) other SPM (Scanning Probe Microscope).Type: GrantFiled: March 4, 2004Date of Patent: June 20, 2006Assignees: Daiken Chemical Co., Ltd.Inventors: Yoshikazu Nakayama, Akio Harada, Seiji Akita
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Patent number: 7049589Abstract: The present invention may include a pattern inspection method of extracting a pattern edge shape from an image obtained by a scanning microscope and inspecting the pattern. A control section and a computer of the scanning microscope process the intensity distribution of reflected electrons or secondary electrons, find the distribution of gate lengths in a single gate from data about edge positions, estimate the transistor performance by assuming a finally fabricated transistor to be a parallel connection of a plurality of transistors having various gate lengths, and determine the pattern quality and grade based on an estimated result. In this manner, it is possible to highly, accurately and quickly estimate an effect of edge roughness on the device performance and highly accurately and efficiently inspect patterns in accordance with device specifications.Type: GrantFiled: January 8, 2004Date of Patent: May 23, 2006Assignees: Hitachi, Ltd., Hitachi High-Technologies CorporationInventors: Atsuko Yamaguchi, Hiroshi Fukuda, Ryuta Tsuchiya, Hiroki Kawada, Shozo Yoneda
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Patent number: 7049592Abstract: A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.Type: GrantFiled: July 9, 2003Date of Patent: May 23, 2006Assignee: ASML Netherlands B.V.Inventors: Dominicus Jacobus Petrus Adrianus Franken, Erik Roelof Loopstra, Pertrus Rutgerus Bartray, Marc Wilhelmus Maria Van Der Wijst, Michael Jozefa Mathijs Renkens, Gerard Van Schothorst, Johan Juliana Dries
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Patent number: 7049614Abstract: An electrode in an extreme ultraviolet (EUV) source of an EUV lithography tool. The extreme ultraviolet source may be operable to produce a plasma which emits extreme ultraviolet radiation.Type: GrantFiled: March 10, 2003Date of Patent: May 23, 2006Assignee: Intel CorporationInventor: Bryan J. Rice
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Patent number: 7049582Abstract: The present invention relates to a spray needle for use in electrospray ionization (ESI) for mass spectrometry. A spray needle is disclosed which is constructed to have an opening along its length such that a sample solution may be more readily introduced or loaded therein. Further, the design of the spray needle of the invention is more durable than the prior art spray needles and may be reusable. Because sample loading is more readily achieved, the spray needle of the invention is appropriate for use with a fully automated system for the analysis of samples.Type: GrantFiled: February 21, 2003Date of Patent: May 23, 2006Assignee: Bruker Daltonics, Inc.Inventor: Melvin A. Park
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Patent number: 7049587Abstract: Conventionally, defect data outputted by an inspection system comprised only characteristic quantitative data, such as coordinate data, area, and projected length, and only the coordinate data for moving to a defect location could be utilized effectively. By contrast, by using image data in addition to characteristic quantitative data as the defect data for an inspection system, the retrieval of image data via an outside results confirmation system is made possible. Further, for defect data of a plurality of substrates, it is possible to display a defect image during inspection by the fact that similar defects are retrieved via images and retrieval results are displayed as trends, which makes it possible to display a defect image during inspection by searching similar defects on images and displaying them as a trend, and designating a substrate on the trend, thereby displaying the defect map thereof and designating a defect on the defect map.Type: GrantFiled: February 22, 2002Date of Patent: May 23, 2006Assignee: Hitachi, Ltd.Inventors: Takashi Hiroi, Masahiro Watanabe, Asahiro Kuni, Maki Tanaka, Munenori Fukunishi, Hiroshi Miyai, Yasuhiko Nara, Mitsunobu Isobe
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Patent number: 7034292Abstract: A mass spectrometer is configured with individual multipole ion guides, configured in an assembly in alignment along a common centerline wherein at least a portion of at least one multipole ion guide mounted in the assembly resides in a vacuum region with higher background pressure, and the other portion resides in a vacuum region with lower background pressure. Said multipole ion guides are operated in mass to charge selection and ion fragmentation modes, in either a high or low pressure region, said region being selected according to the optimum pressure or pressure gradient for the function performed. The diameter, lengths and applied frequencies and phases on these contiguous ion guides may be the same or may differ. A variety of MS and MS/MSn analysis functions can be achieved using a series of contiguous multipole ion guides operating in either higher background vacuum pressures, or along pressure gradients in the region where the pressure drops from high to low pressure, or in low pressure regions.Type: GrantFiled: May 30, 2003Date of Patent: April 25, 2006Assignee: Analytica of Branford, Inc.Inventors: Craig M. Whitehouse, David G. Welkie, Gholamreza Javahery, Lisa Cousins
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Patent number: 7034296Abstract: An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed. In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.Type: GrantFiled: November 21, 2001Date of Patent: April 25, 2006Assignee: Hitachi High-Technologies CorporationInventors: Mitsugu Sato, Atsushi Takane, Takashi Iizumi, Tadashi Otaka, Hideo Todokoro, Satoru Yamaguchi, Kazutaka Nimura
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Patent number: 7030389Abstract: An electron beam apparatus having an electron analyzer is achieved which can control the illumination lens system by feedback without adversely affecting the imaging action even if a specimen is positioned within the magnetic field of the objective lens. The apparatus has an energy shift control module for controlling energy shift. On receiving instructions about setting of energy shift from the CPU, the control module issues an instruction for shifting the accelerating voltage to a specified value to an accelerating-voltage control module. The control module also sends information about the energy shift to an energy shift feedback control module, which calculates the feedback value and supplies information about corrections of lenses and deflection coils to a TEM optics control module. The feedback value is multiplied by a corrective coefficient that can be calibrated.Type: GrantFiled: January 23, 2004Date of Patent: April 18, 2006Assignee: JEOL Ltd.Inventor: Toshikatsu Kaneyama
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Patent number: 7026607Abstract: A scanning probe microscope has a scanner and a mounting unit for supporting the scanner. An identifying mark is disposed on a part of the scanner for representing preselected information corresponding to the scanner. The mounting unit has an interpreting device for interpreting the preselected information represented by the identifying mark. A setting device sets in a controller, for controlling the scanning probe microscope, parameter information corresponding to the scanner probe microscope, parameter information corresponding interpreted by the interpreting device.Type: GrantFiled: April 20, 2004Date of Patent: April 11, 2006Assignee: SII NanoTechnology Inc.Inventors: Itaru Kitajima, Masatsugu Shigeno
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Patent number: 7015482Abstract: An electron beam writing system, using discrete electron beams in which the interval of the beams is larger than the size of the beams, generates plural electron beams, on/off controls each of the electron beams according to pattern data to be written, and deflects the electron beams together, thereby performing writing on a wafer. One side of a unit writing area of the electon beams is larger than substantially twice the interval of the electron beams or substantially an integral multiple thereof.Type: GrantFiled: January 31, 2003Date of Patent: March 21, 2006Assignees: Hitachi, Ltd., Canon Kabushiki Kaisha, Advantest CorporationInventors: Yasunari Sohda, Yoshinori Nakayama, Osamu Kamimura, Masato Muraki, Masaki Takakuwa
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Patent number: 7012262Abstract: The invention is directed to a corrector for correcting energy-dependent first-order aberrations of the first degree as well as third-order spherical aberrations of electron-optical lens systems. The corrector includes at least one quadropole septuplet (S1) having seven quadrupoles (Q1 to Q7). The quadrupoles are mounted symmetrically to a center plane (ZS) so as to permit excitation along a linear axis. The corrector furthermore includes at least five octopoles (O1 to O7) which can be excited within the quadrupole septuplet. In an advantageous embodiment, two quadrupole septuplets are mounted in series one behind the other. The quadrupole fields of the two quadrupole septuplets are excited antisymmetrically to a center plane lying between the two quadrupole septuplets.Type: GrantFiled: August 27, 2004Date of Patent: March 14, 2006Assignee: LEO Elektronenmikroskopie GmbHInventor: Harald Rose
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Patent number: 7005641Abstract: An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.Type: GrantFiled: December 10, 2003Date of Patent: February 28, 2006Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Takao Kato, Nobuharu Noji, Tohru Satake, Takeshi Murakami, Kenji Watanabe
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Patent number: 7005650Abstract: An apparatus for fabricating a semiconductor device, including an ultraviolet radiation source, a lamp house body surrounding the ultraviolet radiation source, the lamp house body carrying a mirror surface, an opening provided on the lamp house body, and a vacuum chuck provided on the lamp house body so as to cover the opening, the vacuum chuck being adapted for supporting a semiconductor substrate thereon in a state that the semiconductor substrate is covered by adhesive tape, wherein the vacuum chuck is formed of a material which is substantially transparent to ultraviolet radiation produced by the ultraviolet radiation source.Type: GrantFiled: April 18, 2002Date of Patent: February 28, 2006Assignee: Fujitsu LimitedInventor: Yutaka Yamada
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Patent number: 6998608Abstract: Disclosed is a high field asymmetric waveform ion mobility spectrometer (FAIMS) with optical based detection of selectively transmitted ions. Light from a light source is directed through an optical port in an electrode of the FAIMS. A light detector is provided for receiving light that is one of transmitted and scattered by the selectively transmitted ions within the FAIMS.Type: GrantFiled: January 9, 2003Date of Patent: February 14, 2006Assignee: Ionalytics CorporationInventors: Roger Guevremont, Randy Purves, David Barnett
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Patent number: 6995365Abstract: An improved mass spectrometer is set forth. The mass spectrometer comprises an ion injector that is configured to provide a plurality of ions for analysis and an ion selection unit that is adapted to receive the plurality of ions from the ion injector and provide only those ions having a selected mass-to-charge ratio for detection/analysis. The ion selection unit includes an outer electrode and a plurality of inner electrodes. The plurality of ions provided by the ion injector are accepted into the interstitial region between the outer electrode and the plurality of inner electrodes. A power supply system is connected to the electrodes of the ion selection chamber. The power supply system is adapted to provide an oscillating voltage to at least one of the plurality of inner electrodes to facilitate separation of ions of the selected mass-to-charge ratio from ions of non-selected mass-to-charge ratios.Type: GrantFiled: November 12, 2003Date of Patent: February 7, 2006Assignee: Beckman Coulter, Inc.Inventor: Vincent R. Farnsworth
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Patent number: 6992287Abstract: A system and method for identifying an optimal landing energy of a probe current in a scanning electron microscope system. A probe current having a known landing energy is directed at a sample for producing a signal electron beam. The current of the signal electron beam is measured by directing the beam to a current detector for calculating a current yield, which is the ratio of the signal current to the probe current. The landing energy can then be changed for subsequent measurements of the signal current to identify the landing energy which produces a desired current yield. Once identified, the landing energy value can be used to produce a signal electron beam directed towards an imaging detector to generate topographic images of samples.Type: GrantFiled: November 10, 2004Date of Patent: January 31, 2006Assignee: Soluris, Inc.Inventor: Neal T. Sullivan
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Patent number: 6989543Abstract: An apparatus in one example comprises a radiation shielding container for one or more radioactive sources. One or more of the one or more radioactive sources are containable within one or more cartridges. The radiation shielding container comprises a support component that restrains movement within the radiation shielding container of one or more of the one or more cartridges. The radiation shielding container comprises one or more vents for movement of a sterilant therethrough.Type: GrantFiled: August 15, 2003Date of Patent: January 24, 2006Assignee: C.R. Bard, Inc.Inventors: Christopher D. Drobnik, Michael W. Drobnik, Breese Watson, Kevin Wineinger