Abstract: A lens system for use with a phase plate in a transmission electron microscope comprises a phase plate placed after the back-focal plane of the objective lens in an imaging system mounted downstream of the objective lens. Phase lenses image the back-focal plane of the objective lens onto the phase plate such that the position and tilt of the electron beam relative to the optical axis are made conjugate. An alignment coil may direct the electron beam going out of the phase lenses toward the phase plate. A second alignment coil may direct the electron beam going out of the phase plate toward the imaging lenses located after the phase plate.

Abstract: A charged particle beam microscope is described, which is equipped with a minicolumn. Various embodiments are disclosed, suitable for various uses. According to one embodiment the minicolumn is situated inside a mini-environment and can be introduced into and withdrawn from the main vacuum chamber. According to other embodiments, the minicolumn is situated inside the main vacuum chamber. According to further embodiments, a turntable stage is used and the minicolumn is attached to an arm movable in the radial direction of the turntable.

Abstract: An environmental sampler is configured to deliver a pre-determined volume of external environmental sample and internal standard sample to the mass spectrometer on each cycle of advancing and retracting movement of a sampler rod under control of a stepper motor. This allows the external environmental sample to be accurately analyzed for its trace contents against a known, standard sample in the same sample period, thereby providing a real-time calibration of the analysis results in each sample period. The samples arc taken in precise, pre-determined volumes through two sets of machined grooves formed on the surface of the sampler rod. The sets of machined grooves deliver the samples to the mass spectrometer through alignment with a vacuum channel to an outlet port which is scaled off from the external environment and an internal standard sample reservoir.

Abstract: The invention provides an electron impact ion source for the generation of multiply- or super-highly-chared ions including an electron gun with cathode and anode for the creation and acceleration of electrons, a device for the axial-symmetric focussing of the electron beam, a device for introducing ionisable substances into an ion trap, which may be opened and closed, in the region of the axial-symmetric focussed electron beam, a device for destroying the electrons after they have passed the ion trap, and a device for creating a vacuum around the axial-symmetrically focussed electron beam and the ion trap within said beam. The device for the axial-symmetric focussing of the electron beam comprises at least two ring structures radially magnetized in opposing directions and each of these ring structures enclosed the electron beam.

Abstract: A method of improving the signal to noise ratio of an ion beam, utilizing a tandem mass spectrometer comprising two mass filters separated by a collision cell. The first mass filter is operated in a resolving mode such that only a narrow mass-to-charge range of precursor ions are stable and accelerated towards the collision cell which contains neutral gas to promote collisional activation and subsequent fragmentation of unwanted fragile ions while minimizing fragmentation of desired analyte ions. The second mass filter is scanned synchronously with the first mass filter such that only ions that do not fragment are recorded by the ion detector. Thus, analyte ions that have fragmentation values higher than unwanted background ions are preferentially detected thereby increasing the signal-to-noise ratio of the ion beam.

Abstract: A method and apparatus for e-beam fabrication of a workpiece. A surface of the workpiece is impinged with a e-beam during a manufacturing step in the manufacture of the workpiece. Simultaneously, the workpiece is optically sensed using thermal-wave imaging and/or ultrasound imaging techniques for process control of the workpiece. The e-beam impinging the workpiece in the manufacture of the workpiece provides substantially all the energy needed to be added to the workpiece to perform the optical sensing of the workpiece.

Abstract: For delivery of ions from a higher pressure ion source to a mass analyzer operating at high vacuum, high pass ion filtration is effected within a dielectric capillary interface between the higher pressure ionization chamber and the lower pressure environment of a mass analyzer, by application of electrical potentials to end electrodes and to at least one electrode associated with the dielectric capillary between the ends, to create an end-to-end electric field generally opposing gas flow-assisted movement of ions from the upstream end to the downstream end, and to create a steeper voltage gradient along an upstream portion than along a downstream portion of the capillary. The voltage gradient along the steeper upstream portion of the capillary is sufficiently steep to cause ions having drift velocities below a lower limit to stall within the capillary. The respective potentials may be adjusted to increase the steepness of the upstream voltage gradient to increase the drift velocity lower limit.

Abstract: Neutral particles, such as atoms and molecules, transported along a path having at least one curved region are selectively conveyed or filtered according to each particle's velocity by generating an inhomogeneous magnetic field across a cross-section of the path. The neutral particles may be transported through a physical tube or simply through the region defined by the magnetic field. The path may have more than one curved region and may additionally have one or more straight regions. The magnetic field may be generated for example by homogeneously or inhomogeneously magnetized permanent magnets or by current carrying elements. The magnetic elements may additionally be used in conjunction with at least one piece of a high permeability magnetic material for focussing or containing the magnetic field.

Abstract: A material activating device (10) comprises a radioactive layer (11) of a radioactive means that generates radioactive rays for irradiating a material to be activated, and conductive metal layers (12,13) disposed on one side of the radioactive layer (11) and interposed between the radioactive layer (11) and the material to be activated. Radioactive rays emitted by the radioactive means ionizes the material, and the conductive metal layers are charged with electric charges generated when the material is ionized. The conductive metal layers create an electric field and a magnetic field. The material can very efficiently be activated by interaction between the electric and the magnetic field, and the ionized material.

Abstract: This system consists of a static device (1) provided with ultraviolet ray lamps (12), fixed permanently inside the air duct (2) near the inlet in the circuit, to disinfect the incoming air flow. The system also includes a mobile device (3) to be periodically inserted inside the duct (2) and moved inside in order to fully disinfect the duct. This device consists of an axle (31), on which ultraviolet ray lamps (34) are assembled, end discs (32 and 33) provided with wheels (35 and 36) on the edge, and traction and retention cables (38 and 39).

Abstract: To generate a magnetic resonance angiograph, a patient is injected with a contrast-enhancing agent (210). An ellipsoidal central portion of k-space (300) and a first surrounding region (310) are continuously sampled (220). A portion of each central data set (300, 310) is reconstructed (230) into a low-resolution volume and maximum-intensity-projected (240) onto a line. The maximum intensity projection (240) is processed (250) in order to detect the arrival of the contrast enhancing bolus within a volume of interest. Upon detection of the arrival of the bolus, the acquisition of a high-resolution magnetic resonance angiograph is triggered (260) in which higher phase encode portions (310, 420) of k-space are sampled. The central data set (300) along with the higher phase encode views (310, 420) are reconstructed (290) into a high-resolution magnetic resonance angiogram.

Abstract: A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.

Abstract: A method and apparatus are provided for the analysis of buried layers of an analyte material by: a) removing surface layers of said analyte material with an atomic force microscopy (AFM) stylus to expose a buried layer; and b) analyzing a buried layer, preferably for molecular structure. An apparatus is provided which encompasses both AFM and one or more additional surface analytical apparati within a controlled atmosphere under coordinated computer control.

Abstract: The ion implantation apparatus deals with an ion beam as a charged particle beam and has an accelerating tube 8 incorporating an electrostatic lens for converging/diverging it. The control of the electrostatic lens is carried out as follows. The swept ion beam 4 is received by a single Faraday cup 46 to measure the beam quantity I(n) and the beam width WD(p) of the ion beam 4. The evaluated values of the beam quantity and beam width with respect to prescribed standards are calculated. These evaluated values are assigned weights to calculate a unified evaluated value. The focusing voltage Vf applied to the electrostatic lens with the accelerating tube 8 is controlled so that the unified evaluated value is increased. A waveform shaping controller 50 and beam controller 54 constitute a device for making such control.

Abstract: A method of preparation of a map of areas on a sample that collects charge, and a method for using the map to selectively scan and modulate the intensity of the electron beam of a SEM so as to discriminate between the charging and non-charging areas of the sample. To generate the charging map, an image is first checked for saturation. The frame for the image is acquired by using digital scan control coupled with digital acquisition of the secondary electron detector signal. The next step is to perform a “fast scan” where the first frame is taken at the maximum frame rate that the system is capable of. A fast scan does not allow time for significant charge to collect on surfaces, and this provides a base level to subtract from a slower scan that allows charge to accumulate. Areas where the difference between the two is larger indicate areas of charge collection. A “slow scan” is then performed.

Abstract: An electron-beam exposure method of segmented mask-pattern transfer type wherein a prescribed pattern is segmented into a plurality of divisions so as to form a segmented pattern in every division and exposure is made through every division one after another, so that the projection of the whole of the prescribed pattern is accomplished. The method includes the steps of carrying out the exposure through every division and transcribing a segmented pattern thereon one after another. The method also includes the steps of carrying out the correction exposure for every projection region of the segmented patterns one after another with a defocused beam of the inverse pattern of the respective segmented patterns, and thereby the proximity effect caused by the pattern exposure is corrected.

Abstract: One aspect of the present invention relates to an in-line system for monitoring and optimizing an on-going CMP process in order to determine a CMP process endpoint comprising a wafer, wherein the wafer is subjected to the CMP process; a CMP process monitoring system for generating a signature related to wafer dimensions for the wafer subjected to the CMP process; and a signature library to which the generated signature is compared to determine a state of the wafer. Another aspect relates to an in-line method for monitoring and optimizing an on-going CMP process involving providing a wafer, wherein the wafer is subjected to a CMP process; generating a signature associated with the wafer; comparing the generated signature to a signature library to determine a state of the wafer; and using a closed-loop feedback control system for modifying the on-going CMP process according to the determined state of the wafer.

Abstract: A circuit pattern inspecting instrument includes an electron-optical system for irradiating an electron beam on a sample, an electron beam deflector, a detector for detecting secondary charged particles from the sample, and a mode setting unit for switching between a first mode and a second mode. An electron beam current is larger in the first mode than in the second mode, and an electron beam scanning speed is higher in the first mode than in the second mode. The circuit pattern inspecting instrument is configured so that first the sample is observed in the first mode, then a particular position on the sample is selected based on image data produced by an output of the detector in the first mode, and then the particular position on the sample is observed in the second mode.

Abstract: A charged particle beam irradiator makes it possible to observe an image at a high resolution and preferable contrast while reserving an operating distance of a sample or an area for the installation of a sample stage. The charged particle beam irradiator scans charged particle beams emitted by a charged particle source on a sample and obtains a scanned image of said sample based on charged particles obtained as a result of said scanning and is equipped with an electromagnetic lens having a magnetic pole provided between said sample and said charged particle source and at least a pair of magnetic poles provided under said sample and configured to generate a magnetic field there between. This configuration makes it possible to observe an image at a high resolution and preferable contrast while reserving an operating distance of the sample throughout a wide range of acceleration voltage.

Abstract: The invention concerns an arrangement for scanning a specimen receiving device (1) for data recording with a laser scanning microscope, preferably with a confocal laser scanning microscope (2), with which imaging of large specimen fields with sufficient speed is possible by scanning of the specimen receiving device (1), which is characterized in that the specimen receiving device (1) is alternatingly rotatable about a first axis (4) by a rotation device (3).