Patents Examined by Karia Moore
  • Air-tight vessel equipped with gas feeder uniformly supplying gaseous component around plural wafers
    Patent number: 6881295
    Abstract: A reactor of a chemical vapor deposition system is equipped with a gas feeder for blowing dopant gas to plural semiconductor wafers supported by a wafer boat at intervals, and the gas feeder has a gas passage gradually reduced in cross section and gas outlet holes equal in diameter and arranged along the wafer boat for keeping the doping gas concentration substantially constant around the semiconductor wafers, whereby the dopant is uniformly introduced in material deposited on all the semiconductor wafers.
    Type: Grant
    Filed: March 27, 2001
    Date of Patent: April 19, 2005
    Assignee: NEC Electronics Corporation
    Inventor: Yutaka Nagakura