Abstract: Methods and apparatus for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing electrorheological (ER) and magnetorheological (MR) fluids to remove contaminant residual particles from the substrate surface are provided.

Abstract: The invention relates to a process of cleaning boreholes, boring equipment and borings with an aqueous cleaning of one more lithium salts of alkyl sulfates of formula (I): R—O—SO3?Li+??(I) in which R is a saturated, unsaturated, branched or linear alkyl group containing 8 to 22 carbon atoms, preferably the lithium salts of alkyl sulfates are comprised of a mixture of those in which R is a saturated, linear alkyl groups having 8 to 14 carbon atoms.

Abstract: Semiconductor wafers are cleaned using a cleaning solution containing an alkaline ammonium component in an initial composition, wherein the semiconductor wafer is brought into contact with the cleaning solution in an individual-wafer treatment, and in the course of cleaning hydrogen fluoride is added as further component to the cleaning solution, and the cleaning solution has at the end of cleaning, a composition that differs from the initial composition.

Abstract: The invention features in-situ cleaning process for an ion source and associated extraction electrodes and similar components of the ion-beam producing system, which chemically removes carbon deposits, increasing service lifetime and performance, without the need to disassemble the system. In particular, an aspect of the invention is directed to an activating, catalytic, or reaction promoting species added to the reactive species to effectively convert the non-volatile molecular residue into a volatile species which can be removed by conventional means.

Abstract: The present disclosure is directed to a parts washer with a movable sink and a movable lid connected to a housing for facilitating replacement and maintenance of a cleaning solution reservoir. A pump is also pivotally connected to the sink to lift the pump during replacement and maintenance operations.

Abstract: A drum-type washing machine is disclosed, in which bearings are received in the bearing housing assembly. The bearing housing assembly may include a support portion coupled to a motor, and a coupling portion connected to a damper bracket.

Abstract: A bearing housing assembly and drum-type washing machine having the same are provided. Bearings are received in the bearing housing assembly. The bearing housing assembly may be formed by insert injection molding, and a damper for damping vibration of a drum may be connected to a tub by a damper bracket.

Abstract: There is provided a towel presenting, washing and drying machine, including first and second spaced-apart rollers each rotatable in a clock-wise and counter-clockwise sense; a bath having liquid inlet and outlet ports located between the rollers supporting a plurality of rod members for guiding a towel section in a meandering fashion in the bath; means for cleaning the towel section in the bath; at least one drying drum disposed outside the bath between the rollers, at least one motor and transmission means coupled to the rollers and the drying drum, and a controller for timely selectively operating each of the rollers and the drying drum. A method for automatically presenting a clean towel section for drying purposes and for washing and drying soiled towel sections in a towel presenting and washing machine, is also provided.