Patents Examined by Keit T. Nguyen
-
Patent number: 7838823Abstract: An ion mobility spectrometer does not require a physical aperture grid to prevent premature ion detector response. The last electrodes adjacent to the ion collector (typically the last four or five) have an electrode pitch that is less than the width of the ion swarm and each of the adjacent electrodes is connected to a source of free charge, thereby providing a virtual aperture grid at the end of the drift region that shields the ion collector from the mirror current of the approaching ion swarm. The virtual aperture grid is less complex in assembly and function and is less sensitive to vibrations than the physical aperture grid.Type: GrantFiled: December 16, 2008Date of Patent: November 23, 2010Assignee: Sandia CorporationInventors: Kent B. Pfeifer, Arthur N. Rumpf
-
Patent number: 7439496Abstract: A method of detecting the presence of an analyte in an ion mobility spectrometer using an amide ionization reagent is provided. This method is particularly useful for the detection of peroxide-based explosives.Type: GrantFiled: May 4, 2006Date of Patent: October 21, 2008Assignee: Smiths Detection Inc.Inventors: William Ronald Stott, Sabatino Nacson, Gabriela Iulia Eustatiu
-
Patent number: 7385207Abstract: There is provided a movable ion beam inclination-angle measuring apparatus that can measure the inclination angle of either a spot ion beam or a ribbon ion beam. The apparatus is provided in an X-axis direction from an ion supplying unit of an ion implantation device. The apparatus includes an ion current measuring unit which has an ion-beam receiving device for receiving the ion beam, and has an ion current measuring part for measuring an ion current induced by the received ion beam. The apparatus further includes an angle adjusting unit adapted to adjust a receiving angle of the ion beam receiving device about a Y-axis and/or Z-axis and a position adjusting unit adapted to move the ion-beam receiving device in a Z-axis direction. The inclination angle is calculated by an inclination-angle calculating unit using the variation of the measured ion current depending on the adjustment of the receiving angle of the ion beam.Type: GrantFiled: April 26, 2005Date of Patent: June 10, 2008Assignee: Samsung Electronics Co., Ltd.Inventor: Young-Ha Yoon
-
Patent number: 7002144Abstract: An enhanced transfer system that increases the accuracy and sensitivity of a measurement system is disclosed. In one embodiment, the transfer system includes transfer tubing that transports samples from a spray chamber to an ionizer in a mass spectrometer system. The transfer system also includes a transfer gas line that is connected to the transfer tubing. The transfer gas line supplies a gas that assists with the transferring of the samples from the spray chamber to the ionizer. In one embodiment, the transfer gas line is angled relative to a portion of the transfer tubing. In another embodiment, the transfer gas line is perpendicular relative to a portion of the transfer tubing. The injected gas increases the quantity and quality of the samples transferred to the mass spectrometry system, thereby increasing the overall accuracy and sensitivity of the measurement system.Type: GrantFiled: August 30, 1999Date of Patent: February 21, 2006Assignee: Micron Technology Inc.Inventors: David Palsulich, Eric Swanson, Larry Weston, Kevin Coyle
-
Patent number: 6825476Abstract: An improved column for a charged particle beam device is constituted by, among other things, deflectors for scanning the beam over the specimen, for aligning the beam with regard to the objective and for compensating aberrations caused by the objective. Thereby, the total number of electrode arrangements and/or coil arrangements that are used for the deflectors and that are independently controllable, is 8 or less.Type: GrantFiled: September 26, 2002Date of Patent: November 30, 2004Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventor: Pavel Adamec
-
Patent number: 6797973Abstract: An apparatus that acts as a shield for radiopharmaceuticals and protects individuals from radioactivity includes a first body with a first hollow core, a second body with a second hollow core and a third body with a third hollow core. The first hollow core, second hollow core and third hollow core collectively house an insert. The insert houses a hypodermic syringe. A first connection means releasably communicates the first body with the second body. A second connection means releasably communicates the first body with the third body. The second body comprises a piston actuator. The piston actuator can be operated to depress the piston of the hypodermic syringe while the first body is in communication with the second body, and while the third body is removed.Type: GrantFiled: March 27, 2003Date of Patent: September 28, 2004Inventor: Albert L. Zens
-
Patent number: 5986270Abstract: In an electron microscope it is sometimes important that specimens can be studied at a very low temperature (for example, that of liquid helium). In the case of known specimen holders the specimen is cooled by supplying the cooling medium via a bore in the specimen holder; this causes thermal drift of the removed specimen holder each time when a specimen is exchanged, and also an acoustic coupling (i.e. transfer of vibrations) exists with the dewar vessel connected to the specimen holder. In accordance with the invention, the specimen is arranged on the end 20 of the specimen holder 7 by means of a separate transport unit 13, 36 so that it is not necessary to remove the specimen holder 7 in order to exchange a specimen, with the result that the specimen holder is not heated. Moreover, the coupling to the cold source 22, 28 can take place via a flexible cooling conduit 30 which extends directly to the end 20 to be cooled and may be permanently connected thereto, thus avoiding the transfer of vibrations.Type: GrantFiled: December 15, 1997Date of Patent: November 16, 1999Assignee: U.S. Philips CorporationInventors: Bernardus J. M. Bormans, Alan F. De Jong, Karel D. Van Der Mast, Raymond Wagner, Peter E. S. J. Asselbergs
-
Patent number: 5977551Abstract: On simulating ion implantation on the basis of Monte Carlo method, a plurality of triangle meshes are produced to a polygonal substrate to be label serial numbers at a first step. An ion is implanted as an implanted ion to the polygonal substrate at a second step. At a third step, the triangle meshes are checked in an ascending order until one of triangle meshes is found as a specific triangle mesh in which the implanted ion is positioned. Point defect concentration is extracted from the specific triangle mesh at a fourth step. Random numbers are generated in order to calculate scattering of the implanted ion a fifth step. The point defect concentration is renewed into a renewed point defect concentration in the specific triangle mesh at a sixth step. The energy, the position, and the travelling direction is renewed in the implanted ion at a seventh step. The third to the seventh steps is repeated until the implanted ion stops in said polygonal substrate.Type: GrantFiled: October 30, 1997Date of Patent: November 2, 1999Assignee: NEC CorporationInventor: Koichi Sawahata
-
Patent number: 5834772Abstract: A mass spectrometer probe comprising a tubing having one end adapted for connection to a spectrometer and a second probe tip having a pore cut therethrough, the pore being sealed with a membrane such that the membrane eliminates water from the mass spectrometer system and admits low molecule weight gases into the system.Type: GrantFiled: October 11, 1995Date of Patent: November 10, 1998Inventors: James E. Baumgardner, Gordon R. Neufeld
-
Patent number: 5742065Abstract: A method for reducing contamination in a silicon membrane mask in a lithography system is described. The method includes: doping the top surface of the silicon membrane mask with boron to lower the electrical resistance of the mask; subsequently metalizing the surface of the mask to further lower its electrical resistance; and, finally, applying a voltage between opposite surfaces of the mask, the voltage generating an electric field that passes through the membrane mask, heating the membrane mask. The method further includes: calculating distortions in the shape of each of the patterns within the mask caused by heating the membrane mask; compensating for the proximity of other shapes positioned in the vicinity of each of the patterns; and appropriately modifying the shape of each of the patterns. The above described method can be equally applied to an e-beam system or to an ion-beam lithography system, and both, to stencil masks and to scattering masks.Type: GrantFiled: January 22, 1997Date of Patent: April 21, 1998Assignee: International Business Machines CorporationInventors: Michael Stuart Gordon, Rodney Arthur Kendall, David John Pinckney, James Louis Speidell
-
Patent number: 5729028Abstract: An ion accelerator for use in an ion beam implanter. The accelerator forms milliampere beams of heavy ions such as boron and phosphorous in a configuration in which the terminal ion source is replaced by a neutral beam injector. The neutral beam is formed at ground by the conversion of a focused beam of positive ions to neutral ions in a charge exchange canal. The neutral beam so formed is stripped of one or more electrons in a gas or vapor filled canal in the high voltage terminal. A 180.degree. analyzing magnet located in the high voltage terminal analyzes and directs a selected charge state to an acceleration tube parallel to the neutral beam injection tube where the selected positive ions are accelerated to ground potential.Type: GrantFiled: January 27, 1997Date of Patent: March 17, 1998Inventor: Peter H. Rose
-
Patent number: 5510615Abstract: The scanning probe microscope translation apparatus includes a scanning probe microscope for examining a specimen, with a specimen stage for mounting the specimen for examination by the scanning probe microscope, and a first translator mounted to the scanning probe microscope for translating the specimen stage relative to the scanning probe microscope. A support frame is dimensioned and adapted to be mounted in a specimen chamber of a scanning electron microscope, and a second translator is provided for scanning the scanning probe microscope relative to the support frame. The second translator is mounted on dual mass plates provided for isolating the scanning probe microscope from external vibrations, and suspension device are provided for suspending the mass plates from the support frame. A vacuum load lock system permits moving the scanning probe microscope, specimen stage, first translator, and mounting assembly into and out of the vacuum of the scanning electron microscope vacuum chamber.Type: GrantFiled: June 7, 1995Date of Patent: April 23, 1996Assignee: Topometrix CorporationInventors: Huddee Ho, Paul E. West
-
Patent number: 5485449Abstract: An optical disc recording device includes a motor for rotating an optical disc, a rotation speed control circuit connected to the motor for controlling a rotation speed of the optical disc, a data recording device for, during an irradiation time, irradiating a laser beam on the rotating optical disc in accordance with digital data to be recorded, wherein a pit having a length is formed on the optical disc, a recording speed setting device for designating a desired recording constant linear velocity, an irradiation time control circuit for controlling an actual irradiation time of the data recording device in accordance with a designated recording speed, wherein the actual irradiation time compared with predetermined irradiation time corresponding to a pit to be recorded is shortened in accordance with the designated recording speed, and a laser power control circuit for controlling a laser power of the laser beam to be irradiated for obtaining a predetermined pit length at the actual irradiation time.Type: GrantFiled: May 4, 1993Date of Patent: January 16, 1996Assignee: Yamaha CorporationInventor: Yukihisa Nakajo
-
Patent number: 5373491Abstract: A wavelength-multiple optical memory is provided which is capable of performing high density recording/reading at room temperature. A large number of cylindrical recording members, each of which is made up of plural portions along a central axis of the cylinder and plural sizes which vary slightly in a direction perpendicular to the central axis, are formed on a substrate. The cylindrical recording members may be of circular cylindrical or elliptical cylindrical shape. It is preferable that recording material layers of the cylindrical recording members have complex refractive indexes which are different from each other. A difference in size of the recording material layers of the circular or elliptical cylinders having sizes closest to each other is preferably in a range of 1/5000 to 1/5 of an average of the sizes, are even more preferably in a range of 1/500 to 1/10. Wavelength-multiple recording is performed by changing a wavelength of a light beam emitted from a light source within a very narrow range.Type: GrantFiled: May 29, 1992Date of Patent: December 13, 1994Assignee: Hitachi, Ltd.Inventors: Motoyasu Terao, Norio Murase, Shigenori Okamine
-
Patent number: 5317154Abstract: An electron microscope equipped with an x-ray detector whose position is made different, depending on whether the detector is in use or not. The microscope prevents the irradiated position and the image from escaping even when the detector is moved into or out of a valve. A switch is operated to move the detector. The microscope has a deflection current-correcting circuit which supplies correcting currents to the deflection coils in step with the operation of the switch.Type: GrantFiled: March 5, 1993Date of Patent: May 31, 1994Assignee: Joel Ltd.Inventor: Toshikazu Honda
-
Patent number: 4968894Abstract: An electrical field-enhanced electron image projector (10) is exposed to an electrical field source (26) to induce the emission of electrons (20) which flow across a gap (28) from a pattern (14) of mask (12) to a photoresist layer (18) of a substrate (16). A heat source (22) can be applied to increase the flow of electrons (20) from the pattern (14) to the photoresist layer (18). As the gap (28) distance decreases, the ability of electrons (20) to move from the pattern (14) to the photoresist layer (18) increases.Type: GrantFiled: June 29, 1989Date of Patent: November 6, 1990Assignee: Texas Instruments IncorporatedInventor: George R. Misium