Patents Examined by Kelly M Gambetta
  • Patent number: 11186034
    Abstract: A method is for fabricating a part by additive manufacturing while sparing certain particularly sensitive surfaces of the part, and in particular surfaces that have an influence on the aerodynamics of the final part. The method includes the following steps: providing a digital model of a part that is to be fabricated, the part that is to be fabricated including at least one surface that is to be spared, and orienting the digital model relative to a construction direction wherein the part is to be constructed in such a manner that the surface that is to be spared presents a construction angle greater than 30°, preferably greater than 50°.
    Type: Grant
    Filed: January 3, 2017
    Date of Patent: November 30, 2021
    Inventors: Matthieu Vial, Sebastien Dreano
  • Patent number: 11179886
    Abstract: Provided are method of producing a shaped fluoropolymer articles. The methods include subjecting a composition comprising a fluoropolymer to additive processing in an additive processing device. Also provided are articles obtained with the methods and 3D-printable compositions.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: November 23, 2021
    Inventors: Xuan Jiang, Jeffrey N. Bartow, Carsten Franke, Fee Zentis, Klaus Hintzer, Gabriele H. Gottschalk-Gaudig, Sebastian F. Zehentmaier
  • Patent number: 11167580
    Abstract: Embodiments relate to producing micro-image elements on a substrate for a security document, the method comprising: producing a plurality of microstructure units comprising three-dimensionally structured formations in a clear or pale relief layer on the substrate; and applying a coloured ink fluid to the relief layer, wherein the coloured ink fluid accumulates preferentially in regions of high surface curvature on each microstructure unit to provide contrasting areas of different ink density.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: November 9, 2021
    Assignee: CCL Secure Pty Ltd
    Inventors: Karlo Ivan Jolic, Gary Fairless Power
  • Patent number: 11168397
    Abstract: A method for producing a substrate that includes a protective layer made from a metal oxide protecting silicon against corrosion and an organic resin layer on a substrate surface of a silicon substrate includes the following steps in this order: step A of forming the protective layer on the substrate surface; step B of removing the protective layer from the substrate surface in a region Z1 that is a part of the region in which the protective layer has been formed; and step C of providing an organic resin layer on the substrate surface in a region Z2 including the region Z1.
    Type: Grant
    Filed: November 8, 2017
    Date of Patent: November 9, 2021
    Inventor: Atsushi Teranishi
  • Patent number: 11161295
    Abstract: According to an example, in a method for forming a three-dimensional (3D) printed object, a plurality of layers of the 3D printed object and a channel that extends through the plurality of layers may be formed, in which the plurality of layers is formed of a first material. In addition, a supporting element may be inserted into the channel such that the supporting element extends through multiple layers of the plurality of layers, in which the supporting element is formed of a second material that differs from the first material.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: November 2, 2021
    Inventors: William E. Hertling, Melanie Robertson
  • Patent number: 11142487
    Abstract: The present invention concerns a method for obtaining a finished or semi-finished zirconia-based article (1), the article having a metallic external appearance and non-zero surface electrical conductivity, characterized in that the method includes the steps consisting in: taking at least one zirconia article, pre-shaped in its finished or semi-finished form; placing said article inside a chamber (10) in which a gaseous mixture is arranged, this gaseous mixture including at least a first hydrogen and carbon based gas compound in a first concentration (C1) and a second hydrogen and nitrogen based gas compound in a second concentration (C2); heating the gaseous mixture until the molecules of the first and second compounds dissociate and keeping said article in the reactive atmosphere thereby created to obtain diffusion of the carbon and nitrogen atoms in the external surface (2) of said article and to form stoichiometric carbonitride (ZrCx—Ny) at the surface, and prior to the step of heating the process gases
    Type: Grant
    Filed: June 16, 2017
    Date of Patent: October 12, 2021
    Assignee: The Swatch Group Research and Development Ltd
    Inventors: Cedric Faure, Loic Curchod
  • Patent number: 11124008
    Abstract: A method for producing a multilayer body, with the steps: a) providing a first printed layer; b) partially applying a second printed layer to the first printed layer; c) structuring the first printed layer using the second printed layer as a mask. A multilayer body obtainable in this way and a security document with such a multilayer body.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: September 21, 2021
    Inventors: Ludwig Brehm, Klaus Pforte, Patrick Kramer, Karin Forster
  • Patent number: 11107675
    Abstract: A method of forming a molybdenum-containing material on a substrate is described, in which the substrate is contacted with molybdenum oxytetrachloride (MoOCl4) vapor under vapor deposition conditions, to deposit the molybdenum-containing material on the substrate. In various implementations, a diborane contact of the substrate may be employed to establish favorable nucleation conditions for the subsequent bulk deposition of molybdenum, e.g., by chemical vapor deposition (CVD) techniques such as pulsed CVD.
    Type: Grant
    Filed: April 26, 2018
    Date of Patent: August 31, 2021
    Assignee: ENTEGRIS, INC.
    Inventors: Thomas H. Baum, Philip S. H. Chen, Robert L. Wright, Bryan Hendrix, Shuang Meng, Richard Assion
  • Patent number: 11107673
    Abstract: Methods for depositing silicon oxycarbonitride (SiOCN) thin films on a substrate in a reaction space are provided. The methods can include at least one plasma enhanced atomic layer deposition (PEALD) cycle including alternately and sequentially contacting the substrate with a silicon precursor and a second reactant that does not include oxygen. In some embodiments the methods allow for the deposition of SiOCN films having improved acid-based wet etch resistance.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: August 31, 2021
    Assignee: ASM IP HOLDING B.V.
    Inventors: Toshiya Suzuki, Viljami J. Pore
  • Patent number: 11098406
    Abstract: A substrate support unit according to an example embodiment of the present inventive concept may include a support having an upper surface on which a substrate is disposed; a coupling ring on which an edge of the substrate is disposed, the coupling ring being having an annular shape, wherein the coupling ring is disposed on an edge of the support; and an arm part for raising and lowering the coupling ring and the substrate, wherein the arm part is disposed below the coupling ring and under a portion of the coupling ring, wherein the coupling ring has a first region disposed on the arm part and a second region disposed around the first region, wherein the first region has a thickness greater than that of the second region.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: August 24, 2021
    Inventors: Il Jun Jeon, Ji Ho Uh, Je Hak Lee, Jun Sung Lee, Ji Woon Im
  • Patent number: 11099491
    Abstract: The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate by using a mold, the apparatus comprising: a driver configured to drive the mold and the substrate relatively; a measurement device configured to measure a relative position between the mold and the substrate; and a controller configured to, in alignment between the mold and the substrate, control the driver based on a signal obtained by combining, with a first signal according to a deviation between the relative position measured by the measurement device and a target relative position, second signals with time intervals therebetween and that momentarily increase a driving force of the driver.
    Type: Grant
    Filed: July 2, 2018
    Date of Patent: August 24, 2021
    Inventor: Atsushi Kimura
  • Patent number: 11094506
    Abstract: Barrier films comprising a PECVD barrier coating with diamond-like carbon are disclosed, along with methods of manufacturing such films, and laminated packaging materials comprising such films, in particular intended for liquid food packaging are disclosed. Packaging containers comprising the laminated packaging material or being made from the laminated packaging material, in particular to a packaging container intended for liquid food packaging are also disclosed.
    Type: Grant
    Filed: June 28, 2016
    Date of Patent: August 17, 2021
    Inventors: Pierre Fayet, Jerome Larrieu
  • Patent number: 11090862
    Abstract: A strain sensor can include a resistor, a first electrical contact at a first end of the resistor, and a second electrical contact at a second end of the resistor. The resistor can be formed of a matrix of sintered elemental transition metal particles interlocked with a matrix of fused thermoplastic polymer particles.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: August 17, 2021
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Sterling Chaffins, Kevin P. DeKam, Cassady Sparks Roop
  • Patent number: 11094577
    Abstract: Described are apparatus and methods for processing a semiconductor wafer so that the wafer remains in place during processing. The wafer is subjected to a pressure differential between the top surface and bottom surface so that sufficient force prevents the wafer from moving during processing, the pressure differential generated by applying a decreased pressure to the back side of the wafer.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: August 17, 2021
    Inventors: Joseph Yudovsky, Kaushal Gangakhedkar
  • Patent number: 11072724
    Abstract: The invention relates to an adhesion promotor for improving adhesion on a substrate surface of an RMA crosslink able composition comprising one or more crosslinkable components comprising a reactive component A with at least two acidic protons C—H in activated methylene or methine groups, a reactive component B with at least two activated unsaturated C?C groups, a catalyst C for catalyzing the RMA crosslinking reaction between components A and B, said adhesion promotor P comprising a moiety comprising one or more functional groups X or precursors thereof readable with component A or component B and a moiety comprising one or more functional groups Y or precursors thereof that adsorb or react with the substrate surface not being an alkoxysilane group. The invention also relates to a RMA crosslinkable composition, also in the form of a kit of parts, to a premix for use as a part in the kit of parts.
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: July 27, 2021
    Assignee: Allnex Netherlands B.V.
    Inventors: Rien Goedegebuure, Ferry Ludovicus Thys, Elwin Aloysius Cornelius Adrianus De Wolf, Richard Hendrikus Gerrit Brinkhuis, Michael Anthony Gessner, Antonius Johannes Wilhelmus Buser
  • Patent number: 11065639
    Abstract: A method for coating a top of a substrate with a coating solution includes supplying, before a solution film of the coating solution formed on the substrate dries, a solvent for the coating solution to a peripheral portion on the solution film of the coating solution on the substrate while rotating the substrate at a predetermined rotation speed to form a mixed layer of the coating solution and the solvent at the peripheral portion. The method includes, then, controlling a film thickness of the coating solution after drying by rotating the substrate at a rotation speed higher than the predetermined rotation speed to push the mixed layer to an outer peripheral side.
    Type: Grant
    Filed: November 24, 2017
    Date of Patent: July 20, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Shogo Inaba, Kosuke Yoshihara, Shinichi Hatakeyama
  • Patent number: 11059221
    Abstract: In an example implementation, a method of operating a three-dimensional (3D) printing system includes forming a fused 3D object in the printing tray of a 3D printer and vibrating the tray to separate unfused material from the fused 3D object.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: July 13, 2021
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventor: Charles Oppenheimer
  • Patent number: 11053589
    Abstract: A multi-inlet gas distributor for a fluidized bed chemical vapor deposition reactor that may include a distributor body having an inlet surface, an exit surface opposed to the inlet surface, and a side perimeter surface. The distributor body may also include multiple-inlets evenly spaced from each other, wherein the multiple-inlets penetrate the distributor body from the inlet surface to a first depth. The distributor body may additionally include cone-shaped apertures connecting to corresponding ones of the multiple-inlets at the first depth and extend from the first depth toward the exit surface. An apex may be formed on the exit surface at the intersection of the cone-shaped apertures.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: July 6, 2021
    Assignee: X-Energy, LLC
    Inventors: Howard Kim, Peter J. Pappano
  • Patent number: 11047042
    Abstract: Processes for forming Mo and W containing thin films, such as MoS2, WS2, MoSe2, and WSe2 thin films are provided. Methods are also provided for synthesizing Mo or W beta-diketonate precursors. Additionally, methods are provided for forming 2D materials containing Mo or W.
    Type: Grant
    Filed: May 24, 2016
    Date of Patent: June 29, 2021
    Assignee: ASM IP HOLDING B.V.
    Inventors: Tiina McKee, Timo Hatanpää, Mikko Ritala, Markku Leskelä
  • Patent number: 11043386
    Abstract: Methods of depositing a film by atomic layer deposition are described. The methods comprise exposing a substrate surface to a first process condition comprising a first reactive gas and a second reactive gas and exposing the substrate surface to a second process condition comprising the second reactive gas. The first process condition comprises less than a full amount of the second reactive gas for a CVD process.
    Type: Grant
    Filed: April 23, 2018
    Date of Patent: June 22, 2021
    Inventors: Kelvin Chan, Yihong Chen, Jared Ahmad Lee, Kevin Griffin, Srinivas Gandikota, Joseph Yudovsky, Mandyam Sriram