Patents Examined by Kiet I. Nguyen
  • Patent number: 4983832
    Abstract: In a scanning electron microscope scanning a specimen by an electron beam, the electron beam is two-dimensionally deflected so that a deflection fulcrum for the electron beam is located on the principal plane of an objective lens. Further, in order that the electron beam is incident on the specimen at a predetermined angle of incidence, the electron beam is deflected in a relation in which the object point of the objective lens provides another deflection fulcrum. The angle of incidence of the electron beam incident on the specimen is changed over between +.theta. and -.theta., thereby providing a pair of stereoscopic scanned images of the specimen.
    Type: Grant
    Filed: July 18, 1989
    Date of Patent: January 8, 1991
    Assignee: Hitachi, Ltd.
    Inventor: Mitsugu Sato