Abstract: One embodiment of a dielectric material may include a metal containing cation and a polyatomic anion.

Abstract: A method for controlling a chemical solution applying apparatus is disclosed. The method includes setting at least two dummy dispense rates for dummy dispensation which is periodically carried out by the chemical solution applying apparatus, and switching the dummy dispense rates so that the amount of chemical solution dispensed during a first predetermined period is kept over a predetermined value.

Abstract: It is an object of the present invention to provide a method for producing a solid substrate used for sensors having a film with a small film thickness distribution, and a solid surface used for sensors having a film with a small film thickness distribution. The present invention provides a method for producing a solid substrate for sensors that has a coating on the surface using spin coating, wherein a substrate to be coated is rotated in an atmosphere in which the vapor pressure of coating solvent is 50% to 100% with respect to the saturation vapor pressure so as to form a thin film of a coating solution on said substrate to be coated.

Abstract: A monoclinic CeTi2O6 thin film and a sol-gel process for the deposition of CeTi2O6 thin films, which has applications as passive counter electrodes in electrochromic devices, sensors and photocatalytic agent is presented. This film can be obtained by spin coating a solution, which comprises both titanium and cerium precursors on to electrically conducting or insulating glass substrates and annealing at a temperature of 600° C. for 5 min. in air. The Ce:Ti mole ratio in the deposition sol for the preparation of the film is identified in the range of 0.4:1 and 0.6:1.

Abstract: A coating apparatus has a stage module, a temperature regulating module which adjusts a temperature of a substrate to a set temperature, a coating module which applies a coating liquid to the temperature-regulated substrate, and a heating module which heats the coating-liquid applied substrate, arranged in a process section in order from an upstream end of transfer along a transfer path of the substrate, and has a dummy stage placed between the coating module and the heating module so that when by means of a substrate transfer mechanism which has an upper arm and a lower arm, provided one on the other and advanceable and retreatable independently of each other, substrates are transferred one by one from an upstream module to a downstream module in order by alternately operating the upper arm and the lower arm, that arm which performs transfer from the temperature regulating module to the coating module differ from that arm which receives a substrate from the heating module, that numbers are sequentially assig

Abstract: A method compensates film height modulations in spin coating of a resist film layer. From a desired layout pattern, a substrate topography as a result of lithographically structuring in image fields is determined. A spin coating model is provided to determine a modeled resist film height based on the substrate topography during spin coating of a resist film. A nominal resist film height by using the spin coating model with an unperturbed substrate topography having a flat surface is determined. Next, film height modulations based on a difference are determined for test points and the desired layout pattern is optimized by implementing further structural elements in order to form an optimized mask pattern by minimizing the film height modulations.

Abstract: An apparatus and method for dispensing a solution on a substrate is described in which the solution is dispensed through a solution nozzle assembly while the substrate is rotated. As the solution is dispensed, the solution on the substrate forms a wave front that radially spreads from the substrate center to the substrate edge. The dispensing of the solution is performed in such a way that the solution is dispensed at a radial location substantially equivalent to or less than the radial location of the wave front at any instant in time.

Abstract: The present invention relates to a method for producing an optical recording medium. In the method, on the surface of a recording layer formed by spin-coating a first coating solution containing a photo-isomerizable component, a second coating solution that contains a photo-isomerizable component that can be isomerized by radiation having the same wavelength as radiation used for isomerizing the photo-isomerizable component contained in the recording layer and incapable of dissolving the recording layer is spin-coated to form an intermediate layer. Since the intermediate layer thus formed cannot be dissolved by the first coating solution, a recording layer is further laminated on this layer. Thus, it becomes possible to make the recording layer thicker and also to provide a high-density recording characteristic.

Abstract: Embodiments of the invention provide a method for spin coating a film onto a substrate. Preferred embodiments deposit a film, such as a resist, having a thickness gradient from the substrate's centrifugal center to its edge. The gradient may be linear or stepwise continuous, for example. Other embodiments of the invention provide a semiconductor fabrication method. The method comprises forming a resist layer having a predetermined thickness on a substrate. Preferably, the predetermining includes making swing curve measurements on a single test wafer that is coated according to embodiments of the invention.

Abstract: A particle arrangement apparatus of the present invention includes a tank for holding a dispersion of particles, a rotating means for rotating the substrate inside the tank to dip the substrate into the dispersion and to remove the substrate from the dispersion, and a coating means for applying a liquid different from the dispersion to the surface of the substrate when the substrate is not in contact with the dispersion.

Abstract: The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.

Abstract: A method of monitoring synthesis of PCMO precursor solutions includes preparing a PCMO precursor solution and withdrawing samples of the precursor solution at intervals during a reaction phase of the PCMO precursor solution synthesis. The samples of the PCMO precursor solution are analyzed by UV spectroscopy to determine UV transmissivity of the samples of the PCMO precursor solution and the samples used to form PCMO thin films. Electrical characteristics of the PCMO thin films formed from the samples are determined to identify PCMO thin films having optimal electrical characteristics. The UV spectral characteristics of the PCMO precursor solutions are correlated with the PCMO thin films having optimal electrical characteristics. The UV spectral characteristics are used to monitor synthesis of future batches of the PCMO precursor solutions, which will result in PCMO thin films having optimal electrical characteristics.

Abstract: There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each other, and holding the supplied solution onto the substrate to form a liquid film, wherein a distance h between the discharge port of the nozzle and the substrate is set to be not less than 2 mm and to be in a range less than 5×10?5 q? (mm) given with respect to a surface tension ? (N/m) of the solution, discharge speed q (m/sec) of the solution continuously discharged through the discharge port, and a constant of 5×10?5 (m·sec/N).

Abstract: A method is disclosed for spin coating a stent. The method comprises applying a coating substance to the stent; rotating the stent about an axis of rotation, the axis of rotation being perpendicular to a longitudinal axis of the stent; and rotating the stent about the longitudinal axis of the stent contemporaneously with rotating the stent about the axis of rotation. The axis of rotation can intersect a center of the mass of the stent.

Abstract: A polymer assisted deposition process for deposition of metal oxide films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures to yield metal oxide films and the like. Such films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

Abstract: A dispenser that dispenses fluid is controlled using a feedback control system. The control system uses a positional encoder to determine the precise position of a valve contained in an actuator in order to control the dispensing of the fluid. Various motion profiles may be used to control the position of the valve. The motion profiles of the valve enable controlled variation of the amount of fluid dispensed over time and enable several specific improvements to the dispensing of sealant in the manufacture of metal and composite cans.

Abstract: The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.

Abstract: A process and system for continuous flow-through dip-coating of a workpiece requires the introduction of the workpiece in a porous coating basket at a first side of a coating chamber and the removal of the coated workpiece in the coating basket from a second side of the coating compartment different from the first side. This enables the commingling of coated and uncoated workpieces to be avoided and allows for a higher throughput in the coating process.

Abstract: A process and relating plant for applying protective coats of paint to containers, especially plastic bottles. The process involves gripping the bottles by means of rotating gripping devices fastened to a conveyor chain, and conveying said bottles to all the different stations involved in the process: coating, drying, and curing. Centrifugation is used to remove any excess coating from the external surface of the bottles, keeping the bottles fastened to the same conveyor chain.

Abstract: A coating layer forming apparatus for minimizing the amount of the coating solution when forming a coating layer on a part and enhancing a dimensional precision of a formed surface of the coating layer. The coating layer forming apparatus has a rotation supporting device, a feeder (15), a layer former, and a coating removing device, maintains the inclined angle of a coating former for forming the coating layer at 30 to 70 degrees with respect to a tangential direction of rotation of a coating of a coating surface, and removes excess coating solution deposited on the coating former by a coating removing device.