Patents Examined by Kuo-Liangf Peng
  • Fluorocarbon-organosilicon copolymers and coatings prepared by hot-filament chemical vapor deposition
    Patent number: 6887578
    Abstract: Hot-filament chemical vapor deposition has been used to deposit copolymer thin films consisting of fluorocarbon and siloxane groups. The presence of covalent bonds between the fluorocarbon and organosilicon moieties in the thin film has been confirmed by Infrared, X-ray Photoelectron (XPS) and solid-state 29Si, 19F, and 13C Nuclear Magnetic Resonance (NMR) spectroscopy. The film structure consists of chains with linear and cyclic siloxane groups and CF2 groups as repeat units.
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: May 3, 2005
    Assignee: Massachusetts Institute of Technology
    Inventors: Karen K. Gleason, Shashi K. Murthy