Patents Examined by L. Johnson
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Patent number: 5974554Abstract: A computer system with an advanced power management which includes a PnP compatible operating system, an ISA bus, and a system BIOS for searching a read data port for all PnP ISA devices, which is used to read information from the PnP ISA devices. The computer system is able to save and restore the resource configuration information of the PnP ISA devices into/from a non-volatile storage by use of the searched read data port during a suspend/resume mode of the advanced power management.Type: GrantFiled: February 12, 1998Date of Patent: October 26, 1999Assignee: SamSung Electronics Co., Ltd.Inventor: Sang-Min Oh
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Patent number: 4915781Abstract: The present invention is directed to a hydrogen peroxide solution stabilized by ##STR1## wherein X is a linking group and Y is a metal cation or H which compound is soluble in hydrogen peroxide. In the second aspect of of the invention, a stabilized hydrogen peroxide solution contains a mineral acid which is suitable for etching a metal surface of a metal substrate such as a printed wiring board.Type: GrantFiled: July 27, 1988Date of Patent: April 10, 1990Assignee: E. I. Du Pont de Nemours and CompanyInventors: Bruce A. Bohnen, Kurt E. Heikkila, Rodney K. Williams
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Patent number: 4898604Abstract: A method of manufacturing a blank for a light-weight mirror. Graphite molding bodies are positioned at regular intervals on a base that functions as a mirror plate or backing plate. The base is surrounded up to the top of the molding bodies with a graphite wall. The interstices between the molding bodies and between the wall and the molding bodies are filled with granular quartz. The assembly is heated in an evacuated furnace to approximately 1730.degree. C. into a honeycomb-shaped supporting structure that is securely fastened to the base. The graphite molding bodies and wall are removed after cooling. Either a backing plate or a mirror plate in the form of another plate is applied to the resulting supporting structure.Type: GrantFiled: March 1, 1988Date of Patent: February 6, 1990Assignee: Heraeus Quarzschmelze GmbHInventor: Paul Sauerwein
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Patent number: 4897154Abstract: A post dry etching process for restoring wafers damaged by dry etching such as RIE, comprising the steps of removing any dry etch residue layer from the etched portions of the wafer and forming an oxide on those etched portions; rapid thermal annealing the wafer to drive the oxygen from the oxide layer down into the wafer by a small amount, to getter impurities to this oxide layer, and to restore crystallinity below the oxide layer; and removing the oxide layer via an HF bath or a low powder dry etch process.Type: GrantFiled: July 3, 1986Date of Patent: January 30, 1990Assignee: International Business Machines CorporationInventors: Satya N. Chakravarti, Stephen J. Fonash, Xiao-Chun Mu
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Patent number: 4894207Abstract: A recirculating high velocity hot air sterilization device includes a housing having a chamber therein. A corrugated, perforated jet curtain plate is disposed within the chamber and partially defines an air supply plenum positioned outwardly of the chamber, the plenum having an electric heating element operatively positioned therein. Spaced apart from the jet curtain plate within the chamber is a nonperforated deflector plate which extends parallel to the jet curtain plate and may be of a flat or corrugated configuration. A blower is connected to the housing and creates therein a recirculating flow of heated air which sequentially flows into the air supply plenum across the heating element, outwardly in a forward direction through the perforations in the jet curtain plate and into the housing chamber, back into the blower, and then into the air supply plenum.Type: GrantFiled: February 10, 1989Date of Patent: January 16, 1990Assignee: Archer Aire Industries, Inc.Inventors: Virgil L. Archer, M. Keith Cox
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Patent number: 4885053Abstract: A process for etching at least a portion of a surface of a ceramic substrate preparatory to metal-plating thereof, the process including, applying to the surface of the ceramic substrate a substantially uniform coating of a chemical precursor of an alkaline etching substance; and treating the chemical precursor to chemically transform it into the alkaline etching substance and etch the surface. Preferably the at least one chemical precursor is an organic alkali compound or an organic alkaline earth compound.Type: GrantFiled: July 7, 1986Date of Patent: December 5, 1989Assignee: Licentia Patent-Verwaltungs-GmbHInventors: August F. Bogenschutz, Josef L. Jostan, Robert Ostwald
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Patent number: 4885054Abstract: An etching method for etching a masked silicon substrate in a vessel by introducing into the vessel an etching gas containing a gaseous chloride of silicon and a nitrogen-containing gas and converting the etching gas introduced in the vessel into a plasma. Ions and radicals are formed from the etching gas under plasma conditions, the ions impinging against the substrate in a sputtering action, and the radicals acting on the substrate to produce a volatile substance. The sputtering action and the volatile substances produce even etched surfaces without surface defects and simultaneously prevent the formation of a white powder, thus avoiding unetched or insufficiently etched portions and portions appearing to be black. In addition, this method makes it possible to realize superior anisotropism in the etching, while increasing the speed and selectivity of etching.Type: GrantFiled: October 28, 1988Date of Patent: December 5, 1989Assignee: Anelva CorporationInventor: Masami Shibagaki
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Patent number: 4885254Abstract: A method for determining the extent of polymerization of a polymer system consisting of adding a fluorescent label, the label having a reactivity similar to the reactivity of the curing agent, to the polymer system and measuring the fluorescence intensity proportional to cure species concentration during polymerization. The fluorescence intensity of the label exhibits sensitive changes throughout the polymerization process, allowing one to follow cure reactions in a quantitive way by measuring fluorescence, especially in the latter stages of cure. The cure species composition, reactivity ratio, activation energy and weight-average molecular weight can also be determined by adding a label and measuring the UV-VIS spectra in addition to the fluorescence intensity.Type: GrantFiled: December 11, 1987Date of Patent: December 5, 1989Assignee: University of ConnecticutInventor: Chong S. P. Sung
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Patent number: 4883643Abstract: An electrolytic oxygen sensor in which the atmosphere is admitted to one side of the solid electrolyte through an air-permeable spacer through a dual concentric tube structure. Holes are formed in the inner tube to complete the air flow to the atmosphere. The small size of the holes prevent the entry of water and oil contaminants.Type: GrantFiled: March 28, 1989Date of Patent: November 28, 1989Assignee: NGK Spark Plug Co., Ltd.Inventors: Hisaharu Nishio, Toshio Okumura
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Patent number: 4883765Abstract: A method, device and kit for the quantitative determination of lipoprotein components, especially cholesterol and triglycerides, in body fluids, especially human serum, plasma or whole blood utilizing the selective adsorption of lipoproteins on particulate silica. This selective adsorption is also useful for the quantitative separation of lipoproteins from samples of whole blood for diagnostic purposes.Type: GrantFiled: August 28, 1987Date of Patent: November 28, 1989Assignee: I.D.L. Int'l Diagnostic Laboratories Ltd.Inventors: Ilana Tamir, Ben-Zion Kidron, Lynn Wang, Michael Inbar
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Patent number: 4882209Abstract: A method for producing a glass capillary tube, which comprises drawing under heating a multiple tube assembly comprising a plurality of glass tubes having different diameters arranged coaxially one in another and simultaneously integrating the assembly by heat fusion.Type: GrantFiled: September 1, 1987Date of Patent: November 21, 1989Assignee: Asahi Glass Company, Ltd.Inventors: Tsutomu Maruyama, Hidetoshi Matsumoto, Yoshiyuki Miyake
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Patent number: 4877484Abstract: Disclosed are flocced mineral materials which may be utilized to prepare high temperature resistant, water resistant articles. These materials are prepared by utilizing, as a starting material, a gellable layered swelled silicate that has an average charge per structural unit that ranges from about -0.4 to -1 and which contains interstitial cations which promote swelling with a source of at least one species of multi-amine derived cations.Type: GrantFiled: February 17, 1987Date of Patent: October 31, 1989Assignee: Armstrong World Industries, Inc.Inventors: Walter J. Bohrn, Richard A. Brubaker, Shelly N. Garman, Lewis K. Hosfeld, Kenneth K. Ko, Thomas M. Tymon
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Patent number: 4875972Abstract: The present invention is directed to a hydrogen peroxide solution stabilized by a substituted oxybenzene compound which is soluble in hydrogen peroxide. In a second aspect of the invention, a stabilized hydrogen peroxide solution contains a mineral acid which is suitable for etching a metal surface of a metal substrate such as a printed wiring board.Type: GrantFiled: July 27, 1988Date of Patent: October 24, 1989Assignee: E. I. Du Pont de Nemours and CompanyInventors: Rodney K. Williams, Bruce A. Bohnen, Kurt E. Heikkila
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Patent number: 4875973Abstract: The invention is directed to a hydrogen peroxide solution stabilized by a substituted aminobenzaldehyde compound which is soluble in hydrogen peroxide. The stabilized hydrogen peroxide solution contains a mineral acid which is especially useful for etching a surface of a substrate such as a printed wiring board.Type: GrantFiled: July 27, 1988Date of Patent: October 24, 1989Assignee: E. I. Du Pont De Nemours and CompanyInventors: Kurt E. Heikkila, Rodney K. Williams, Bruce A. Bohnen
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Patent number: 4875917Abstract: Layered glass products such as multilayer glass rods or fibers are formed in a preferably continuous process wherein at least two component glasses are supplied to an annular mixing zone wherein relative movement of the annular surfaces produces spiral layering of the glasses and the formation of a glass product stream having a preselected gradient in composition and glass properties across a diameter thereof.Type: GrantFiled: March 25, 1988Date of Patent: October 24, 1989Assignee: Corning IncorporatedInventor: William P. Lentz, deceased
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Patent number: 4872895Abstract: A method for forming articles which include silica-containing glass bodies, as well as the resulting articles, are disclosed. In accordance with the method, silica-containing gel particles are fused to form a glass body. In contrast to previous such methods, these particles are formed by mechanically, substantially uniformly subdividing either a substantially cohesive gel body, or an ungelled or partially gelled sol capable of yielding a substantially cohesive gel body, to form substantially uniformly sized, wet gel particles. Significantly, only substantially cohesive gel bodies which are also substantially elastic are useful in the invention, i.e., mechanical subdivision of non-elastic gel bodies results in these bodies undergoing plastic flow to yield non-particulate, pasty masses.Type: GrantFiled: December 11, 1986Date of Patent: October 10, 1989Assignee: American Telephone and Telegraph Company, AT&T Bell LaboratoriesInventors: James W. Fleming, David W. Johnson, Jr., John B. MacChesney, Sandra A. Pardenek
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Patent number: 4872945Abstract: A process for manufacturing a pressure transducer of a pressure sensor is disclosed. Initially, a capacitive pressure transducer is formed by bonding a silicon diaphragm to a glass base such that the transducer produces different capacitances in response to different diaphragm deflections provided in response to sensed pressures. The sensitivity of the capacitive pressure transducer is adjusted by etching the silicon diaphragm while it is bonded to the base substrate in accordance with capacitance values of the transducer which were previously obtained at various predetermined pressures. In this manner, the thickness of the silicon diaphragm is selectively reduced to obtain an accurate desired sensitivity for the transducer and handling of very thin silicon diaphragms prior to their assembly to associated transducer bases is eliminated.Type: GrantFiled: August 24, 1987Date of Patent: October 10, 1989Assignee: Motorola Inc.Inventors: Donald O. Myers, Ruta J. Venclovas
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Patent number: 4871419Abstract: A first metal film is formed on the major surface of a semiconductor substrate and a thin film which is at least equal in thickness to a second metal film is formed on the first metal film. These films are patterned to provide a two-layer film pattern of a prescribed configuration, and a resist film is coated on the major surface of the semiconductor substrate including the two-layer film pattern. The surface of the resist film is partially removed to expose a thin film pattern serving as an upper layer of the two-layer film pattern, and only the thin film pattern is removed. A second metal film is evaporated over the entire surface of the resist film including the first metal film pattern exposed in the preceding step and thereafter the resist film is removed with the second metal film formed on the same, to form the two-layer metal film pattern by the first metal film pattern and the second metal film pattern.Type: GrantFiled: November 24, 1987Date of Patent: October 3, 1989Assignee: Mitsubishi Denki Kabushiki KaishaInventor: Hirofumi Nakano
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Patent number: 4871422Abstract: Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of an anionic sulfate ester of alkylphenol polyglycidol ether. Preferred embodiments of the anionic sulfate esters of alkylphenol polyglycidol ethers may be represented by the formula: ##STR1## wherein R represents an alkyl group having from about 4 to about 12 carbon atoms, x is from about 3 to about 15, M represents H, an alkali metal, an alkaline earth metal, ammonium, or an amine, and y is from 0.2 to about 4. The etching solutions preferably contain hydrogen fluoride in a volume ratio of NH.sub.4 F to HF to from about 3:1 to about 50:1. The novel etching solutions of the present invention have excellent wetting characteristics and retain their wetting properties after extended periods of continuous filtration through sub-micron filters.Type: GrantFiled: May 16, 1988Date of Patent: October 3, 1989Assignee: Olin CorporationInventors: Michael Scardera, Thomas S. Roche
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Patent number: 4870031Abstract: In a method of manufacturing a semiconductor device comprising melting an amorphous or polycrystalline first semiconductor layer formed on the surface of a first dielectric layer by irradiating energy rays thereon, and converting the same into single crystals by the subsequent lowering of the temperature and forming a second dielectric layer and a second semiconductor layer on the first semiconductor layer. Energy rays are irradiated under the condition capable of melting the first semiconductor layer through the second semiconductor layer and the second dielectric layer and, after the completion of the conversion into single crystals, the second semiconductor layer and the second dielectric layer are eliminated through etching.Type: GrantFiled: September 30, 1987Date of Patent: September 26, 1989Assignee: Kozo Iizuka, Director General, Agency of Industrial Science and TechnologyInventors: Kazuyuki Sugahara, Tadashi Nishimura, Shigeru Kusunoki, Yasuo Inoue