Patents Examined by Laura Wener
  • Patent number: 5736297
    Abstract: The invention relates to a positive-working radiation-sensitive mixture containing a) a compound which forms acid when exposed to actinic radiation, b) a compound containing at least one C--O--C or C--O--Si bond which can be cleaved by said acid, and c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions, wherein the compound a) comprises the structure of the formulae I, II or III: ##STR1## The radiation-sensitive mixture according to the invention is notable for a high resolution and a high sensitivity over a wide spectral range. It also has high thermal stability and does not form any corrosive photolysis products on exposure to light.The invention furthermore relates to a radiation-sensitive recording material produced therefrom which is suitable for producing photoresists, electronic components, printed circuit boards or for chemical milling.
    Type: Grant
    Filed: July 22, 1996
    Date of Patent: April 7, 1998
    Assignee: Clariant GmbH
    Inventors: Horst Roeschert, Georg Pawloski