Patents Examined by M. Wilczcwski
  • Cleaning solution and method for selectively removing layer in a silicidation process
    Patent number: 7265040
    Abstract: A cleaning solution selectively removes a titanium nitride layer and a non-reacting metal layer. The cleaning solution includes an acid solution and an oxidation agent with iodine. The cleaning solution also effectively removes a photoresist layer and organic materials. Moreover, the cleaning solution can be employed in tungsten gate electrode technologies that have been spotlighted because of the capability to improve device operation characteristics.
    Type: Grant
    Filed: December 5, 2003
    Date of Patent: September 4, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-Yong Kim, Kun-Tack Lee