Patents Examined by Maki Angadei
  • Patent number: 7270758
    Abstract: A method is presented for fabricating a read head having a read head sensor and a hard bias/lead layer which includes depositing a strip of sensor material in a sensor material region, and depositing strips of fast-milling dielectric material in first and second fast-milling dielectric material regions adjacent to the sensor material region. A protective layer and a layer of masking material is deposited on the strip of sensor material and the strips of fast-milling dielectric material to provide masked areas and exposed areas. A shaping source, such as an ion milling source, is provided which shapes the exposed areas. Hard bias/lead material is then deposited on the regions of sensor material and fast-milling dielectric material to form first and second leads and a cap on each of these regions. The cap of hard bias/lead material and the masking material is then removed from each of these regions.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: September 18, 2007
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventors: Shawn Marie Collier Hernandez, Wipul Pemsiri Jayasekara, Timothy J. Minvielle, Benjamin Lu chen Wang, Howard Gordon Zolla