Abstract: The present invention discloses a molten salt ultrasonic cleaning machine. The molten salt ultrasonic cleaning machine includes a tank body, a molten salt heating system, an ultrasonic application system and a stirring system, wherein the tank body is configured to accommodate molten salt and a to-be-cleaned workpiece; the tank body includes a bottom wall, and a side wall arranged circumferentially in a surrounding way; the molten salt heating system is configured to heat the molten salt in the tank body; the ultrasonic application system is configured to apply ultrasonic impact to the to-be-cleaned workpiece in the tank body; and the stirring system includes a stirring rod which is rotatably arranged in the tank body. When the molten salt ultrasonic cleaning machine provided by the present invention cleans a workpiece, the stirring rod rotates to improve the flowability of the molten salt.

Abstract: Disclosed is a substrate processing apparatus including: a substrate holding member that holds a peripheral portion of a substrate; a rotating member that includes a plate provided with the substrate holding member and rotates the substrate by rotating the plate; a fluid supply unit that is disposed at a center of the rotating member and supplies a processing liquid and an inert gas to a lower surface of the substrate held by the substrate holding member; and a controller that controls to perform a liquid processing by supplying the processing liquid to the lower surface of the substrate while rotating the substrate, and, after the liquid processing, to perform a drying processing of the substrate while supplying the inert gas to the lower surface of the substrate.

Abstract: A dishwasher includes a main body, a tub provided inside the main body and configured to form a washing chamber, a machine room formed under the tub, a drain hose configured to discharge washing water stored in the washing chamber, and a hose fixer disposed on a side surface of the tub and configured to fix at least a part of the drain hose, and the drain hose further includes a first coupler coupled to one side of the machine room and a second coupler coupled to the hose fixer, and the first coupler includes an insertion part provided to extend in a longitudinal direction of the first coupler to be inserted to the one side of the machine room to couple the first coupler to the one side of the machine room.

Abstract: Proposed is a mat cleaning device. The mat cleaning device includes a casing which constitutes an exterior of the mat cleaning device, a washing water spray nozzle which is disposed on one side of the casing and sprays washing water on the mat, a drive motor which is disposed inside the casing and provides power, a plurality of rollers which is rotated by the power supplied from the drive motor and transfers and washes the mat, a vacuum pump which forms vacuum pressure, a vacuum suction means which sucks moisture and foreign matter on a surface of a washed mat by using the vacuum pressure formed by the vacuum pump, and a centrifugation chamber which provides the vacuum pressure formed by the vacuum pump to the vacuum suction means.

Abstract: A laundry treating appliance includes a cabinet defining an interior, a drum located within the interior and defining a treating chamber, and a door assembly coupled to the cabinet to selectively open and close the treating chamber and at least partially defining the treating chamber when the door assembly is in a closed condition. The door assembly includes an intermediate door defining an opening, a user interface, a door window, a door cover adjacent the front surface of the intermediate door, a rear door, and a trim element.

Abstract: A laundry treating appliance comprising a tub with a tub access opening, a rotatable drum located within the tub and partially defining a treating chamber, a drying air duct having an inlet formed in the tub and defining a cross-sectional area of the inlet, and a filter overlying the inlet and having a surface area greater than the cross-sectional area of the drying air duct.

Abstract: In an embodiment, a method includes: immersing a wafer in a bath within a cleaning chamber; removing the wafer out of the bath through a solvent and into a gas within the cleaning chamber; determining a parameter value from the gas; and performing remediation within the cleaning chamber in response to determining that the parameter value is beyond a threshold value.

Abstract: A household dishwasher includes a washing chamber, a controller apparatus configured to perform a wash program from a number of wash programs for washing items to be washed arranged in the washing chamber, an optical sensor configured to capture an optical sensor signal of the washing chamber during performance of the wash program, and an evaluating unit configured to ascertain a subsequent loading of items to be washed by a user as a function of the captured optical sensor signal of the washing chamber, to determine a point in time of the subsequent loading in the wash program, and to perform a predetermined action as a function of the ascertained subsequent loading and the determined point in time.

Abstract: The present invention relates to a method for controlling a clothes treating apparatus, the method comprising: a circulation step of circulating air by operating a fan; a heat exchange step of opening a refrigerant pipe by controlling an expansion valve, and circulating a refrigerant by operating a compressor; a circulation termination step of terminating the operation of the fan when the dryness level of clothes stored in a receiving part reaches a predetermined reference dryness level or when the elapsed time of the heat exchange step reaches a predetermined reference time; and a return step of closing the refrigerant pipe by controlling the expansion valve, and returning the refrigerant and lubricant in the refrigerant pipe to the compressor by operating the compressor.

Abstract: An apparatus for cleaning flip chip assemblies is provided. The apparatus comprises: a chuck assembly; a motor coupled to the chuck assembly by a spindle; at least one carrier for holding flip chips; at least one spray nozzle for directing DIW, a cleaning solution, a gas or a vapor. Embodiments of the invention further provide methods for cleaning flip chip assemblies. The method comprises: loading at least one flip chip to the flip chip carriers; rotating the chuck assembly at a rotation speed; flowing DIW for rinsing the flip chips; flowing a cleaning solution for removing the contaminants; applying ultrasonic/megasonic energy to the flip chips; blowing a gas or a vapor via the spray nozzles for drying the flip chips; bringing the flip chips out of the flip chip carriers.

Abstract: A retrofittable sensor unit for controlling a dosing device of a cleaning machine includes an acquisition module having at least one sensor for capturing measurement variables, at least one monitoring unit for determining a current degree of soiling of articles for cleaning on the basis of the captured measurement variables, a communication unit configured to communicate with at least one dosing device, in particular to transmit a dosing command to at least one dosing device depending on the current degree of soiling of the articles for cleaning. The retrofittable sensor unit can be arranged separately from the dosing device.

Abstract: A system for maintaining a device in a semiconductor manufacturing environment that includes a controller configured to determine a distance travelled by the device within the semiconductor manufacturing environment, where the device has a feature that selectively engages a carrier configured to carry a semiconductor wafer such that the device moves the semiconductor wafer to different processing stations within the semiconductor manufacturing environment. The system also includes an inspection component configured to inspect the device responsive to the distance travelled by the device exceeding a distance threshold, a repair component configured to repair the device responsive to a repair indication from at least one of the controller or the inspection component, and a cleaning component configured to clean the device responsive to a clean indication from at least one of the controller or the inspection component.

Abstract: A method of cleaning wafer-cleaning brushes includes passing a wafer having a first polished main side and an opposing unpolished backside between a pair of substantially cylindrical shaped wafer-cleaning brushes are rotated about an axial direction of the brushes while passing the wafer between the pair of wafer-cleaning brushes. A cleaning solution is applied to the brushes while passing the wafer between the pair of wafer-cleaning brushes. While passing between the pair of brushes, the first polished main side of the wafer faces a first direction, the first direction is an opposite direction to which a polished side of a production wafer faces during a subsequent polished wafer cleaning operation. The substantially cylindrical shaped wafer-cleaning brushes include a plurality of protrusions on an external surface of the brushes, and the brushes contact the wafer at least a portion of time the wafer is passing between the pair of brushes.

Abstract: A telescopic vehicle surface cleaning device comprising a washing unit, the washing unit comprising a nozzle carrier housing, a nozzle carrier and at least one fluid nozzle with at least one nozzle aperture, the nozzle carrier being movable relative to the nozzle carrier housing between first and second positions, the first position being a rest position and the second position being an extended position, the device further comprising a heating unit, the heating unit being configured as a heating sub assembly of the device and the heating unit comprising a heating element carrier with an electrically resistive heating element, the heating element carrier being fixed relative to the nozzle carrier housing and being configured such that the heating element is arranged in front of and adjacent to the nozzle aperture in the rest position of the nozzle carrier such that an air gap remains between a heating surface of the heating element and the nozzle aperture.

Abstract: A household dishwasher includes a dishwasher cavity defining a treatment chamber, a loading unit accommodated in the treatment chamber for holding items to be washed, a washing apparatus configured to apply washing liquid to the treatment chamber, and a fan wheel mounted in the treatment chamber above the loading unit for rotation in a blow-off operating phase such that the fan wheel draws in air from the treatment chamber, accelerates and moves the air forward and downward as an air flow in the treatment chamber. The air flow strikes a blow-off region at a top of the loading unit and blowing off washing liquid from atop the items being washed.

Abstract: A system for maintaining a device in a semiconductor manufacturing environment that includes a controller configured to determine a distance travelled by the device within the semiconductor manufacturing environment, where the device has a feature that selectively engages a carrier configured to carry a semiconductor wafer such that the device moves the semiconductor wafer to different processing stations within the semiconductor manufacturing environment. The system also includes an inspection component configured to inspect the device responsive to the distance traveled by the device exceeding a distance threshold, a repair component configured to repair the device responsive to a repair indication from at least one of the controller or the inspection component, and a cleaning component configured to clean the device responsive to a clean indication from at least one of the controller or the inspection component.

Abstract: A sample injection device is provided with a syringe for injecting a sample and an arrangement unit in which plural kinds of cleaning solvents are arranged to clean the syringe. The device is configured to be able to set a cleaning order of the syringe by the plural kinds of cleaning solvents.

Abstract: A washing machine having a bubble generator includes a bubble spray part provided at an upper side of a tub and configured to discharge bubbles from a top to a bottom inside the tub; a wash liquid jet nozzle provided inside the bubble spray part and configured to jet wash liquid; a blowing fan provided in the bubble spray part and configured to blow air in a direction in which the wash liquid jet nozzle jets the wash liquid; and a porous plate member provided at a front end of the bubble spray part and including a plurality of holes, wherein when the wash liquid jetted from the wash liquid jet nozzle collides with the porous plate member, bubbles are generated.

Abstract: A water pipe cleaning system using high-pressure nitrogen and a water pipe cleaning method using the same are provided. The water pipe cleaning system using high-pressure nitrogen includes: nitrogen pressure vessels containing high-pressure nitrogen therein; a main control unit gathering the high-pressure nitrogen from the nitrogen pressure vessels and controlling pressure of the high-pressure nitrogen; a feed piping device connected to an outlet of the main control unit and connected to an inlet of a pipe to be washed; and a discharge piping device connected to an outlet of the pipe and connected to a nitrogen discharging portion to discharge nitrogen discharged from the pipe to the outside. The main control unit is configured such that control modules are stacked on one another. Each of the control modules is configured such that the nitrogen pressure vessels are connected together in parallel, and has an individual outlet.

Abstract: A laundry treating apparatus includes a cabinet, a drum provided inside the cabinet and formed of a metal material for accommodating a treatment target, and an induction module spaced apart from an outer circumferential surface of the drum at a predetermined interval, inducing and heating the drum, where the induction module includes a base housing for accommodating a coil, a permanent magnet housing coupled with the base housing and provided with a holder in which a permanent magnet is accommodated, and a cover housing coupled with the permanent magnet housing, and the cover housing is coupled to the permanent magnet housing and therefore the permanent magnet is located between the permanent magnet housing and the cover housing. A joint force of the induction module may be enhanced to improve durability, and noise caused by vibration of a tub may be avoided.