Abstract: An improved method for producing high temperature superconductors comprising sintering ceramic superconductor material in a sealed confinement chamber made of non-reactive impervious material, thereby preventing loss of oxygen from the material during heating and eliminating the need for reoxygenation after sintering.

Abstract: A method for preparing an electrophotographic photoreceptor comprising the steps of either forming a charge transporting layer comprising aluminum oxide and then forming a charge generating layer having amorphous silicon as the principal component, or forming a charge generating layer having amorphous silicon as the principal component and then forming a charge transporting layer comprising aluminum oxide. The charge transporting layer is formed by means of an ion assisted deposition method.

Abstract: The object of the invention is a one-step deposition process of a coating of the ceramic type based on nitrides or carbonitrides of at least one metallic element selected from Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf and Ta on a metallic or ceramic substrate, massive or obtained from fibres, by deposition in the vapor phase wherein a coating is deposited on the substrate by a chemical means at a pressure lower than 10 kPa at a temperature lower than 600.degree. C. and by using a system of precursors constituted simultaneously of:an organo-metallic precursor of the said metallic element selected from the organo-metallic compounds of the sandwich type of general formula:[Ar.sup.1 M Ar.sup.2.sub.n ]L.sub.x L'.sub.ya nitrogen precursor selected from ammonia and hydrazine.

Abstract: A method for producing insulated superconductor wire including the steps of a tubular glass preform, filling it with a superconductor material, suspending the preform within an oven to heat a section of the preform to approximately its softening point, and drawing the softened preform into a superconductor wire. A plastic coating can be applied to the wire to increase its durability. The completed wire preferably includes a superconductor core having its superconductor phase aligned with the longitudinal axis of the wire, a glass coating over the superconductor core, and a plastic coating over the glass coating.

Abstract: A process is disclosed for producing superconductor films on a variety of substrates, and more particularly a patterned superconductor film on a planar substrate. The basic process includes the steps of: 1) depositing a metal film of superconductor precursor elements on a substrate; 2) patterning the metal film; and 3) oxidizing the metal film to form a superconductor film. Because the process separates the metal precursor film formation, patterning, and oxidation steps, each of the steps can be individually optimized.

Abstract: A process for forming a functional deposited film which is adapted for use in an apparatus which comprises a substantially enclosed reaction chamber, a plurality of cylindrical substrates arranged to surround a discharge space and a microwave introduction means provided at least at one end of each cylindrical substrate and wherein microwave energy is introduced so that a glow discharge plasma containing reactant gases derived from starting gases is formed in the discharge space thereby forming a deposited film on each cylindrical substrate is described. The process is characterized in that a temperature control means is provided in the inside of each of said plurality of cylindrical substrates and simultaneous with the introduction of a thermally conductive gas, the thermally conductive gas is exhausted from the one end of each cylindrical substrate in the vicinity of the microwave introduction means.

Abstract: A superconducting device operable at temperatures in excess of 30.degree. K. and a method for making the device are described. A representative device is an essentially coplanar SQUID device formed in a single layer of high T.sub.c superconducting material, the SQUID device being operable at temperatures in excess of 60.degree. K. High energy beams, for example ion beams, are used to convert selected portions of the high T.sub.c superconductor to nonsuperconductor properties so that the material now has both superconductive regions and nonsuperconductive regions. In this manner a superconducting loop having superconducting weak links can be formed to comprise the SQUID device.

Abstract: The present invention involves the use of organocalcium precursors for the chemical vapor deposition of thin CaF.sub.2 films under exceptionally mild conditions. This method is based on utilizing an organocalcium compound and a source of fluorine in a chemical vapor deposition reaction to form CaF.sub.2.

Abstract: Process for consolidating solid materials and/or articles, which exhibit at least a low cohesion degree area associated with at least one structural discontinuity, debouching or opening into the surface and/or pervious from the surface of said material and/or article, with ports or openings having sizes equal to at least 0.01 micron, which process comprises:(a) introducing into said low-cohesion area associated with a structural discontinuity vapors of at least one p-xylylene monomer and/or a monomer derivative thereof, operating under vacuum, and(b) polymerizing said monomer vapors in situ inside said low-cohesion area associated with said structural discontinuity.

Abstract: The invention comprises a process for the preservation of timber with a boron based compound, such as trimethyl borate. The timer is dried to a low moisture content, is then subjected to a vapor of the boron compound in a suitable treatment vessel, and after vapor treatment is steam conditioned to return the moisture content of the timber to a normal working level. The vapor treatment is preferably carried out under heat and reduced pressure. Timber preserved by the process is also claimed.

Abstract: The method for producing the disclosed material comprises chemical vapor depositing on the substrate a substantially columnar, intermediate layer of tungsten and chemical vapor depositing on the intermediate layer a non-columnar, substantially lamellar outer layer of a mixture of tungsten and tungsten carbide. The tungsten carbide comprises W.sub.2 C, W.sub.3 C, or a mixture of both wherein the ratio of the thickness of the tungsten intermediate layer to the thickness of the outer layer is at least: (a) 0.35 in the case of tungsten plus W.sub.2 C in the outer layer, (b) 0.6 in the case of a mixture of tungsten and W.sub.3 C in the outer layer and (c) 0.35 in the case of mixtures of tungsten and W.sub.2 C and W.sub.3 C in the outer layer. The chemical vapor deposition steps are carried out at pressures within the range of 1 Torr to 1,000 Torr and temperatures within the range of about 300.degree. to about 650.degree. C.

Abstract: An improved method for preparing high temperature Bi-Sr-Ca-Cu-O superconductive films utilizing spray pyrolysis. The method can further include an additional annealing step to improve the electrical transport properties.

Abstract: A process, based on sputtering from metal sources, is disclosed for forming a stable, reduced electrochromic layer in contact with an ionically conducting oxide. A deposited electrochromic layer is reduced by sputtering onto it an alloy or composite metallic thin film capable of injecting insertion atoms into the electrochromic layer. The metallic thin film, now partially depleted in insertion atoms, is converted into an electronically insulating but ionically conducting oxide layer in an oxidizing atmosphere. The resultant two-layer structure, consisting of the reduced electrochromic layer capped by the insulating oxide, may be used as on component in an all solid-state electrochromic device.

Abstract: In a method of manufacturing a thin film of a compound oxide, different types of materials for forming the compound oxide are evaporated in vacuum. The evaporated materials are heated and deposited on a substrate to form a thin film. An oxygen ion beam having energy of 10 to 200 eV is implanted in the thin film which is being formed on the substrate. Alignment of the constituting elements is performed on the basis of a substrate temperature and energy of the oxygen ion beam, thereby causing epitaxial growth.

Abstract: A planarization process and apparatus which employs plasma-enhanced chemical vapor deposition (PECVD) to form plarnarization films of dielectric or conductive carbonaceous material on step-like substrates.

Abstract: A high-T.sub.c superconductor contact unit having low interface resistivity is disclosed, as is a method for making the unit. An inert metal is deposited on the surface of the superconductor, which surface is preferably non-degraded, to form a unit with the surface of the superconductor, and where temperatures as high as 500.degree. C. to 700.degree. C. can be tolerated, the unit is oxygen annealed to establish a still lower surface resistivity between the surface of the high-T.sub.c superconductor and the inert metal, including a low surface resistivity of about 10.sup.-10 .OMEGA.-cm.sup.2 at high-T.sub.c superconductor operating temperatures. The superconductor is a metal-oxide superconductor, and may be rare earth, thallium, or bismuth based.

Abstract: A process and apparatus for coating conductive workpieces by ionized vapors with the assistance of a glow discharge includes providing a periodically pulsed input of energy for the discharge so that stress on the parts is reduced and a smooth coating results. Either a constant or periodic magnetic field is superimposed to influence the coating process for better results and better handling.

Abstract: A cyclotron resonance chemical vapor deposition method for coating mechanical component parts, in which the method is particularly advantageous in coating for parts having substantially flat surfaces and corners which are subject to wear. The method includes disposing the parts in a reaction chamber, inputting a reactive gas into the reaction chamber and exciting the reactive gas in the reaction chamber by applying microwave electromagnetic energy in the presence of a magnetic field. A layer is deposited on the corners and flat surfaces of the parts by chemical vapor reaction such that the layer at the corners is thicker than that on the flat surfaces due to the concentration of the electric field at the corners, thus providing more wear resistance at the corners.

Abstract: Surfaces of a structure are treated from a walkway within an enclosure suspended from the structure. The enclosure has a downwardly-converging cross section terminating in a vacuum conveyor for collecting and removing particles accumulating from the blasting process. The enclosure is preferably provided in modules. The vacuum conveyor removes the particulate material for transfer to conventional separating and re-cycling equipment. the enclosure and walkway are moveably suspended from transverse guideways secured to the structure.

Abstract: A method of painting a clay body and maintaining a durable, decorative surface finish by providing a barrier film layer between the paint coat layer and the clay body such that the oily substance contained in the clay body is blocked from permeating through the barrier film to adversely affect the paint coat layer.