Patents Examined by Margaret Moore
  • Patent number: 10676817
    Abstract: Device for processing a substrate are described herein. An apparatus for controlling deposition on a substrate can include a chamber comprising a shadow frame support, a substrate support comprising a substrate supporting surface, a shadow frame with a shadow frame body including a first support surface, a second support surface opposite the first surface, and a detachable lip connected with the shadow frame body. The detachable lip can include a support connection, a first lip surface facing the substrate, a second lip surface opposite the first lip surface, a first edge positioned over the first support surface, and a second edge opposite the first edge to contact the substrate.
    Type: Grant
    Filed: August 7, 2012
    Date of Patent: June 9, 2020
    Inventors: Qunhua Wang, Soo Young Choi, Robin L. Tiner, John M. White, Gaku Furuta, Beom Soo Park
  • Patent number: 10658222
    Abstract: A substrate processing system includes a processing chamber and a pedestal arranged in the processing chamber. An edge coupling ring is arranged adjacent to a radially outer edge of the pedestal. A first actuator is configured to selectively move the edge coupling ring to a raised position, relative to the pedestal to provide clearance between the edge coupling ring and the pedestal to allow a robot arm to remove the edge coupling ring from the processing chamber.
    Type: Grant
    Filed: May 6, 2015
    Date of Patent: May 19, 2020
    Inventors: Haoquan Yan, Robert Griffith O'Neill, Raphael Casaes, Jon McChesney, Alex Paterson
  • Patent number: 10643866
    Abstract: The present disclosure provides a wet etching machine and an etching method. The wet etching machine including an etching chamber in which at least two etching layers are disposed. The etching layers are successively overlapped with each other from up to down, and each etching layer includes a first transfer carrier for receiving and transferring a substrate to be etched and a spraying apparatus disposed right above the first transfer carrier for spraying etching solution. When the total etching time is needed to be longer than the transfer time of the substrate without stopping the substrate, the present disclosure can solve the problems in the prior art of causing the takt time decreased due to the stopping time of the substrate is required to be increased or causing the area of the facility increased due to the number of the etching chambers connected in series is required to be increased.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: May 5, 2020
    Inventors: Shengrong Li, Jaeyun Jung, Shikai Wang, Dongseob Kim, Jun Geng, Dengtao Li, Qianqian Li, Yadong Liang
  • Patent number: 10544508
    Abstract: An apparatus for plasma processing a substrate is provided. The apparatus comprises a processing chamber, a substrate support disposed in the processing chamber, and a lid assembly coupled to the processing chamber. The lid assembly comprises a conductive gas distributor such as a face plate coupled to a power source, and a heater coupled to the conductive gas distributor. A zoned blocker plate is coupled to the conductive gas distributor and a cooled gas cap is coupled to the zoned blocker plate. A tuning electrode may be disposed between the conductive gas distributor and the chamber body for adjusting a ground pathway of the plasma. A second tuning electrode may be coupled to the substrate support, and a bias electrode may also be coupled to the substrate support.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: January 28, 2020
    Inventors: Juan Carlos Rocha-Alvarez, Amit Kumar Bansal, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan
  • Patent number: 10529577
    Abstract: The present invention relates to a device of changing the gas flow pattern in the process chamber and a wafer processing method and system; a gas introduced from the gas inlet to the process chamber will process the wafer in the process chamber; a gas center ring is set in the process chamber to adjust the gas flow pattern, which includes a fixed component under the gas inlet and above the wafer, and a movable ring could locate in the first position or the second position respectively; when the movable ring is in the first position, the gas is delivered downwards to the wafer via the first opening set on the fixed component; when the movable ring is in the second position, the gas is delivered downwards to the wafer via the second opening set on the movable ring.
    Type: Grant
    Filed: November 19, 2015
    Date of Patent: January 7, 2020
    Inventors: TuQiang Ni, ZhiLin Huang
  • Patent number: 10490427
    Abstract: A substrate treating apparatus is provided which includes a treating container of which a top end is opened, a substrate support unit placed in a treating container to support a substrate, a treatment solution supply unit supplying a treatment solution to a substrate put on the support unit, and a heating unit placed in the substrate support unit to heat the substrate. The heating unit includes a heating element and a reflection element reflecting a heat from the heating element upward.
    Type: Grant
    Filed: June 23, 2015
    Date of Patent: November 26, 2019
    Assignee: SEMES CO., LTD.
    Inventors: Jung Bong Choi, Seong Soo Kim, Chan-Young Heo, Oh Jin Kwon
  • Patent number: 10325800
    Abstract: Techniques are disclosed for methods and apparatuses for increasing the breakdown voltage while substantially reducing the voltage leakage of an electrostatic chuck at temperatures exceeding about 300 degrees Celsius in a processing chamber.
    Type: Grant
    Filed: August 26, 2014
    Date of Patent: June 18, 2019
    Inventors: Prashant Kulshreshtha, Kwangduk Douglas Lee, Bok Hoen Kim, Zheng John Ye, Swayambhu Prasad Behera, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Jian J. Chen
  • Patent number: 10315233
    Abstract: A flexible substrate treatment device comprising at least one tank that accommodates treatment liquid, winding rollers including a main roller and a driven roller located above the treatment liquid, a positioning roller located in the treating liquid in each tank, a detecting unit configured to detect radius or diameter of at least one of the winding rollers, and a movable discharge member fixed to a side wall of each tank, including a movable discharge port configured to discharge the treatment liquid and a discharge port position controlling mechanism, wherein the movable discharge port can be moved in a direction X perpendicular to a bottom wall of the tank.
    Type: Grant
    Filed: December 3, 2012
    Date of Patent: June 11, 2019
    Inventor: Weifeng Zhou
  • Patent number: 10000628
    Abstract: Provided is a polyarylene sulfide resin composition which is good in strength, dimensional stability, and moldability in terms of a molded body thereof and is also capable of reducing wearing of a mold or molding machine at the time of molding of a molded body. The polyarylene sulfide resin composition contains 100 parts by mass of a polyarylene sulfide resin and 150 to 400 parts by mass of a glass bead, a sodium content of the polyarylene sulfide resin being 1,200 ppm or less, and the glass bead being surface-treated with a vinylsilane or an epoxysilane and having an average particle diameter of 30 ?m or less and a ratio between a cumulative 10% particle diameter and a cumulative 90% particle diameter {(cumulative 90% particle diameter)/(cumulative 10% particle diameter)} of 2.5 or more.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: June 19, 2018
    Inventors: Satoru Kinouchi, Naoto Okubo
  • Patent number: 9963596
    Abstract: The invention relates to an antimicrobial coating composition formed by admixing choline bitartrate or choline chloride, an aminopropyltrialkoxysilane and water. This coating composition is preferably sprayed onto a surface and allowed to dry. Preferably the surface is a stainless steel surface. The coating reduces the amount of E. Coli on the surface of the substrate.
    Type: Grant
    Filed: February 14, 2017
    Date of Patent: May 8, 2018
    Inventors: Daniel Moros, Craig Grossman, Gavri Grossman
  • Patent number: 9951185
    Abstract: Disclosed herein is a composition comprising amino-functional polysiloxanes of high purity and their preparation. Also disclosed herein is an aminoalkyl-functional polysiloxane, a process for purifying this aminoalkyl-functional polysiloxane, a process for preparing the composition, a use of the composition, a polyorganosiloxane-polyorgano block copolymer, a process for the preparation of a polyorganosiloxane-polyorgano block copolymer and a shaped, formed and/or extruded shaped article.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: April 24, 2018
    Assignee: Momentive Performance Materials Inc.
    Inventors: John M. Huggins, Hurbertus Eversheim, Gunnar Hoffmüller
  • Patent number: 9938437
    Abstract: Thermosetting resin compositions are provided that are useful for mounting onto a circuit board semiconductor devices, such as chip size or chip scale packages (“CSPs”), ball grid arrays (“BGAs”), land grid arrays (“LGAs”) and the like (collectively, “subcomponents”), or semiconductor chips. Reaction products of the compositions are controllably reworkable when subjected to appropriate conditions.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: April 10, 2018
    Assignee: Henkel IP & Holding GmbH
    Inventors: Timothy M. Champagne, Laxmisha M. Sridhar, Jonathan B. Israel, Philip T. Klemarczyk, XianMan Zhang, Benny E. Jordan
  • Patent number: 9890263
    Abstract: A composition and a method are provided for graphene reinforced polyethylene terephthalate (PET). Graphene nanoplatelets comprising a suitable initial surface area are added to a solvent for producing PET. In some embodiments, the solvent comprises ethylene glycol. The solvent and graphene nanoplatelets are sonicated to disperse the nanoplatelets within the solvent. The solvent and graphene nanoplatelets are centrifuged to remove nanoplatelet agglomerates within the solvent. A supernatant solution of dispersed graphene nanoplatelets and solvent is decanted and then used for in-situ polymerization of the graphene reinforced PET comprising a continuous matrix of PET with a dispersed graphene reinforcement phase. The graphene reinforcements comprise a minimal number of layers of two-dimensional mono-atomic carbon sheets. In some embodiments, the number of layers ranges between 1 layer and 7 layers.
    Type: Grant
    Filed: June 9, 2016
    Date of Patent: February 13, 2018
    Assignee: Niagara Bottling, LLC
    Inventors: Jay Clarke Hanan, Vahid Shabafrooz, Sudheer Bandla
  • Patent number: 9893307
    Abstract: A composition for encapsulation of an organic light emitting diode comprising a photocurable monomer, a silicon-containing monomer, and an initiator, wherein the silicon-containing monomer is represented by Formula 1, and an organic light emitting diode display are disclosed.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: February 13, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Seong Ryong Nam, Chang Soo Woo, Chang Min Lee, Sung Min Ko, Han Sung Yu, Ji Yeon Lee, Kyoung Jin Ha
  • Patent number: 9878348
    Abstract: A double-layer coating composition having improved sparkling effect, and a method of coating the same are provided. The composition includes a first coating, which reinforces the sparkling effect and contains a greater amount of Al particle; and a second coating, which reinforces chromaticity and contains a less amount of Al particle. The method includes applying a first coating on an article and applying a second coating thereon.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: January 30, 2018
    Assignee: Hyundai Motor Company
    Inventor: Sang G. Kim
  • Patent number: 9862867
    Abstract: An alkoxy-functional organopolysiloxane resin and polymer is disclosed that comprises the reaction product of a reaction of (i) an alkenyl-functional siloxane resin comprising R3SiO1/2 units and SiO4/2 units; (ii) an alkoxysilane-functional organosiloxane compound having at least one silicon-bonded hydrogen atom at a molecular terminal; (iii) an endcapper according to the formula to the formula R23Si—(R22SiO)s—SiR22H or R23Si—(R22SiO)t—(HR2SiO)—SiR23, or combinations thereof; and (iv) a polyorganosiloxane having an average, per molecule, of at least 2 aliphatically unsaturated organic groups in the presence of a (v) hydrosilylation catalyst. In this alkoxy-functional organopolysiloxane resin and polymer, each R2 is independently a hydrocarbon radical and the subscripts s and t independently have values ranging from 0 to 10.
    Type: Grant
    Filed: February 10, 2014
    Date of Patent: January 9, 2018
    Inventors: Glenn Gordon, Kristen Steinbrecher, James Tonge, Afrooz Zarisfi
  • Patent number: 9859474
    Abstract: An addition curable organopolysiloxane composition comprising (A) an organopolysiloxane having at least two alkenyl groups per molecule, (B) a silphenylene oligomer having at least two silicon-bonded hydrogen atoms per molecule, and (C) a hydrosilylation catalyst cures into a product having both a satisfactory hardness and crack resistance.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: January 2, 2018
    Inventors: Takayuki Kusunoki, Hiroyuki Iguchi
  • Patent number: 9850260
    Abstract: Specific hydroxysilanes of formula (I), a method for the production thereof, the use thereof as a constituent of moisture-curing compositions, and silane-functional compounds produced therefrom, in particular silane-functional polymers and isocyanatosilanes. The hydrosilanes can be produced in a simple process with a high degree of purity and are storage-stable after production. Production from the reaction of lactides with aminosilanes is particularly advantageous. Hydroxysilane of formula (I), where n is 1 or 2.
    Type: Grant
    Filed: July 24, 2014
    Date of Patent: December 26, 2017
    Inventors: Andreas Kramer, Urs Burckhardt, Ursula Stadelmann
  • Patent number: 9845393
    Abstract: Embodiments of invention provide a method for producing a hard coat film which has a hard coat that is formed from an active energy ray-curable resin composition on at least one surface of a film base. According to at least one embodiment, the active energy ray-curable resin composition used in this method contains (P) 100 parts by mass of a urethane (meth)acrylate compound, (Q) 0.02-5 parts by mass of organic fine particles having an average particle diameter of 10-300 nm, and (R) 0.0002-2 parts by mass of an acrylic silicone-based leveling agent. The method according to at least one embodiment includes the steps of (1) forming a wet coating film by applying the active energy ray-curable resin composition to the film base, (2) forming a dry coating film by drying the wet coating film, and (3) forming a hard coat film by curing the dry coating film by means of active energy ray irradiation at a temperature of 50-90° C.
    Type: Grant
    Filed: June 17, 2014
    Date of Patent: December 19, 2017
    Inventors: Ryoichi Tanabe, Nozomu Washio
  • Patent number: 9839602
    Abstract: The invention is directed to a personal care composition which contains an ionically-modified cross-linked silicone network which is formed by the polymerization of a silicone polymer containing hydrosilylation effective unsaturated moiety, silyl hydride moiety and ionic radicals.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: December 12, 2017
    Assignee: Momentive Performance Materials Inc.
    Inventors: Anubhav Saxena, Monjit Phukan, Tushar Navale, Sigfredo Gonzalez