Patents Examined by Marion C. McCamish
  • Patent number: 5084528
    Abstract: Ester-modified poly(alkylene carbonate) polyahls comprising the residues of at least one polyahl, polyalkyleneoxy moieties, poly(alkylene carbonate) moieties, the residues of at least one ester of a carboxylic acid, and a plurality of active hydrogen end group are disclosed. The ester-modified poly(alkylene carbonate) polyahl has a number average molecular weight higher than the number average molecular weight of any known poly(alkylene carbonate) polyahl comprising the same monomeric components. Also disclosed are isocyanate-functional prepolymers of these ester-modified poly(alkylene carbonate) polyahls formed by reactions of the ester-modified poly(alkylene carbonate) polyahls of this invention with excess organic polyisocyanates. Urethane/urea polymers formed by the reactions of the isocyanate-functional prepolymers with polyahls are also disclosed.
    Type: Grant
    Filed: November 17, 1988
    Date of Patent: January 28, 1992
    Assignee: The Dow Chemical Company
    Inventor: Robert F. Harris
  • Patent number: 5047481
    Abstract: The invention relates to compatible polymer blends comprised of a polymer component containing cyclohexyl (meth)acrylate as a monomer, and further comprised of a polymer component containing styrene as a monomer.
    Type: Grant
    Filed: May 23, 1989
    Date of Patent: September 10, 1991
    Assignee: Rohm GmbH Chemische Fabrik
    Inventors: Werner Siol, Ulrich Terbrack
  • Patent number: 5009979
    Abstract: A toner composition comprised of resin particles, colorant material and an effect change controlling amount of at least one charge enhancing additive of the formula: ##STR1## wherein R.sub.1 and R.sub.2 are lower alkyl groups having 1 to 4 carbon atoms; R.sub.3 is a straight-chain alkylene group having from 1 to about 8 carbon atoms; and R.sub.4 is an alkyl group having from about 7 to about 24 carbon atoms.The toners of the present invention are resistant to smearing after fusing onto a suitable substrate, provide good adhesion of the fused image to the substrate, and provide uniform, stable, high net electrical charge on toner particles and work over a wide range of relative humidity.
    Type: Grant
    Filed: October 23, 1989
    Date of Patent: April 23, 1991
    Assignee: Olin Hunt Specialty Products Inc.
    Inventors: Galina P. Buxton, Kuo-Chang Tang
  • Patent number: 4996132
    Abstract: The photosensitive resin composition comprises (a) a ternary copolymer of an ethylenically unsaturated amide, carboxyl-containing monomer and third monomer, (b) an esterified resin by the reaction of an unsaturated carboxylic acid and a novolactype epoxy resin, (c) a photopolymerizable monomer, (d) a photopolymerization initiator and (e) a powder such as a finely divided silica filler. The resist layer formed from the composition is capable of being developed with an alkaline aqueous solution and has excellent heat resistance in addition to other desirable properties when the patterned resist layer by the pattern-wise exposure to ultraviolet light and development is subjected to a heat treatment to effect thermal curing.
    Type: Grant
    Filed: February 23, 1988
    Date of Patent: February 26, 1991
    Assignee: Toyko Ohka Kogyo Co. Ltd.
    Inventors: Kenji Tazawa, Akira Iwata, Tomoki Horigome, Hiroyuki Tohda
  • Patent number: 4996243
    Abstract: A composition of matter comprising an acrylamido-acyl or methacrylamido-acyl oligomer derived from at least one nucleophilic oligomer having at least one amino-, hydroxyl-, or thiol-substituted polyoxyalkylene, polyalkyleneimine, polyester, polyolefin, polyacrylate, or polysiloxane oligomer, said nucleophilic oliogmer having a molecular weight in the range of 200 to 20,000 is disclosed. Also disclosed are free radially polymerizable monomer-containing compositions containing said oligomers as well as acrylamido- and methacrylamido-acylated polymers which are the thermal or photocured products of said oligomers. In addition, a process is disclosed for providing said acrylamido- and methacrylamido-acylated oligomers which are useful, for example, in coatings, films, printing inks, adhesives, and saturants.
    Type: Grant
    Filed: January 16, 1990
    Date of Patent: February 26, 1991
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Jerald K. Rasmussen, Steven M. Heilmann, Frederick J. Palensky
  • Patent number: 4996120
    Abstract: Presence of a ring opening monomer polymerizable by free radical sigma-bond cleavage in a photopolymerizable composition improves volume reflection holograms prepared from the composition.
    Type: Grant
    Filed: May 16, 1990
    Date of Patent: February 26, 1991
    Assignee: E. I. DuPont de Nemours and Company
    Inventors: Willaim K. Smothers, Bruce M. Monroe, Dominic M. Chan
  • Patent number: 4996127
    Abstract: This invention provides a toner composed of associated particles of secondary particles comprising primary particles of a polymer having an acidic or basic polar group and particles of a coloring agent and optionally a charge controlling agent and a process for producing the toner. Preferably, the contacting portions among the secondary particles are at least partly melt-adhered by film formation. The toner of the invention has excellent advantages. It has a much higher resolution than conventional products. It has excellent chargeability and causes hardly any occurrence of fogging.
    Type: Grant
    Filed: September 23, 1988
    Date of Patent: February 26, 1991
    Assignee: Nippon Carbide Kogyo Kabushiki Kaisha
    Inventors: Yukinobu Hasegawa, Hiroyoshi Shimomura, Koichi Murai, Masatoshi Maruyama, Toyokichi Tange
  • Patent number: 4996136
    Abstract: Sensitive deep ultraviolet resists are formed utilizing a material that undergoes decomposition to form an acid together with a polymer including a chain scission inducing monomer such as sulfonyl units and substituent that undergoes reaction to form an acidic moiety when subjected to the photogenerated species. An exemplary composition includes poly(t-butoxycarbonyloxystyrenesulfone) and 2,6-dinitrobenzyl-p-toluene sulfonate. The sulfonate decomposes to form sulfonic acid upon irradiation. This acid reacts with the polymer group to form an acid functionality while the sulfone moiety of the polymer induces scission. As a result, the irradiated portions of the resist material are soluble in ionic solvents while the unirradiated portions are not.
    Type: Grant
    Filed: February 24, 1989
    Date of Patent: February 26, 1991
    Assignee: AT&T Bell Laboratories
    Inventors: Francis M. Houlihan, Elsa Reichmanis, Larry F. Thompson
  • Patent number: 4996121
    Abstract: An electrophotographic lithographic printing plate precursor comprising a conductive support having provided thereon at least one photoconductive layer containing photocondutive zinc oxide and a resin binder is disclosed, wherein the resin binder comprises at least one resin (A) containing at least one functional group capable of forming at least one hydroxyl group upon decomposition and at least one member selected from the group consisting of (B) a heat- and/or photo-curable resin and a crosslinking agent. Since the hydroxyl group formed in the resin (A) enhances hydrophilic properties of nonimage areas, the printing plate obtained from the precursor is resistant to background stains. This effect is further ensured by the crosslinked structure formed between the resin (A) and the resin (B) and/or a crosslinking agent.
    Type: Grant
    Filed: January 4, 1989
    Date of Patent: February 26, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Eiichi Kato, Kazuo Ishii
  • Patent number: 4994539
    Abstract: The present invention provides a method for improving impulse destructive strength of an electrical insulating material which is characterized by employing, as said electrical insulating material, an ethylene copolymer prepared by subjecting, to a high-pressure radical polymerization, ethylene or a mixture of ethylene and another monomer in the presence of at least one selected from the group consisting of one- to three-ring aromatic compounds (except styrene and substituted styrenes each having a single ring) each having one carbon-carbon double bond in one molecule, at a polymerization pressure of 500 to 4,000 kg/cm.sup.2 at a polymerization temperature of 50.degree. to 400.degree. C., with said ethylene copolymer containing 0.005 to 1 mol % of a unit derived from said aromatic compound as a polymeric component.
    Type: Grant
    Filed: October 1, 1985
    Date of Patent: February 19, 1991
    Assignee: Nippon Petrochemicals Co., Ltd.
    Inventors: Yuichi Orikasa, Shinji Kojima, Takashi Inoue, Kaoru Yamamoto, Atsushi Sato, Shigenobu Kawakami
  • Patent number: 4994344
    Abstract: A light-sensitive recording element useful for preparing photopolymer flexographic relief printing plates, comprising at least one photopolymerizable recording layer having a thickness of from 0.1 to 7 mm and made up of:from 20 to 99.499% by weight of at least one polymeric binder which may be random ethylene-propylene-alkadiene terpolymers having an ethylene content of from 40 to 80% by weight and a double bond content of from 2 to 20 olefinic double bonds per 1,000 carbon atoms;from 0.001 to 10% by weight of at least one photopolymerization initiator,from 0.5 to 50% by weight of at least one monomer which is compatible with the binder and has at least one photopolymerizable olefinic double bond, andfrom 0.001 to 2% by weight of at least one inhibitor of thermally initiated polymerization and from 0.0001 to 5% by weight of at least one antioxidant as assistants.
    Type: Grant
    Filed: February 3, 1989
    Date of Patent: February 19, 1991
    Assignee: BASF Aktiengesellschaft
    Inventors: Karl-Rudolf Kurtz, Horst Koch, Thomas Telser, Manfred Zuerger
  • Patent number: 4992346
    Abstract: There is described a method of processing exposed holographic material to obtain holograms having a broader band replay a hologram which is of the silver halide in gelatin binder type which method comprises holographically exposing the holographic material by use of coherent light, developing the holographic image by a chemical process and then treating the material sequentially either firstly with a solution of an anionic surfactant which comprises at least one alkyl group having at least four carbon atoms and then with a solution of a quaternary ammonium compound which comprises at least one alkyl group having from 10 to 18 carbon atoms or a polymeric compound which comprises at least one quaternary ammonium group in the repeating unit or firstly with a solution of said quaternary ammonium compound or polymeric compound and then with a solution of an anionic surfactant, the material being subjected to a silver bleaching step at one stage after development.
    Type: Grant
    Filed: December 19, 1989
    Date of Patent: February 12, 1991
    Assignee: Ilford Limited
    Inventors: Neil F. Ashford, Peter M. Blum, Stephen R. Postle, Alan Hodgson
  • Patent number: 4992547
    Abstract: The photopolymerizable mixture described contains(A) at least one ethylenically unsaturated photopolymerisable compound,(B) a photoinitiator of the formula I ##STR1## and (C) a photosensitiser from the group of aromatic carbonyl compounds having a triplet energy of 225-310 kJ/mol, for example xanthones, thioxianthones, coumarins, phthalimides, phenones and the like.Ar is phenyl substituted in the 4-position by a substituted amino group, R.sup.1 and R.sup.2 are alkyl, R.sup.3 and R.sup.4 are alkyl or alkoxyalkyl, or R.sup.3 and R.sup.4 together are 3-oxapentamethylene. Said sensitisers (C) raise the activity of said photoinitiators (B) without shortening the shelf life of the mixtures. The photocurable mixtures are used especially as binders for printing inks or paints.
    Type: Grant
    Filed: June 14, 1988
    Date of Patent: February 12, 1991
    Assignee: Ciba-Geigy Corporation
    Inventors: Godwin Berner, Kurt Meier, Kurt Dietliker, Rinaldo Husler
  • Patent number: 4992355
    Abstract: A system for the preparation of dot etched lithographic films, consisting essentially of a light sensitive silver halide material for tanning development and an etching solution, in which system the light sensitive material of various layers contains at least one colorant, e.g., pigment or dye with acid groups, which is stable in the processing baths and forms with bases salts soluble in organic solvents, and the etching solution contains a base that ionizes the colorant, and a solvent for the resulting ion pair.
    Type: Grant
    Filed: June 15, 1990
    Date of Patent: February 12, 1991
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Ruger Reinhold
  • Patent number: 4990546
    Abstract: Silphenylene groups are incorporated into epoxy-functional silicones to improve the physical properties of otherwise weak and brittle UV-cured epoxy-functional silicones without adding fillers and without sacrificing fast, efficient UV cure speed. Such compositions are useful as conformal coatings, optical fiber coatings, and electrical encapsulation.
    Type: Grant
    Filed: March 23, 1990
    Date of Patent: February 5, 1991
    Assignee: General Electric Company
    Inventor: Richard P. Eckberg
  • Patent number: 4990418
    Abstract: Disclosed is an electrophotographic photoreceptor in which an organic lubricant is provided on the surface of an organic photoconductive layer or on a protective layer formed on the organic photoconductive layer. Elements of the organic lubricant are partly exposed from the surface of the organic photoconductive layer or the protective layer while the remainder portions of the elements are embedded or fixed by chemical reaction in the surface region of the photoconductive layer or the protective layer so that the exposed portions of the elements of the organic lubricant provides a lubricating surface layer. The lubricating surface layer supresses wear of the photoreceptor thereby enabling the photosensitive layer to withstand a long repeated use without impairing electrophotographic characteristics.
    Type: Grant
    Filed: June 6, 1989
    Date of Patent: February 5, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Akio Mukoh, Mitsuoshi Shoji, Shigeo Suzuki, Takayuki Nakakawaji, Yutaka Ito, Shigeki Komatsuzaki, Ryuichi Shimizu, Hiroyoshi Kokaku, Tsuneaki Kawanishi, Atsushi Kakuta
  • Patent number: 4987158
    Abstract: UV-cured compositions comprising a precrosslinked epoxy-functional silicone and an onium salt photoinitiator are provided which have improved physical properties as compared to otherwise weak and brittle UV-cured compositions comprising non-precrosslinked epoxy-functional silicones and onium salt photoinitiators without adding fillers and without sacrificing fast, efficient UV cure speed. Such compositions are useful as conformal coatings, optical fiber coatings, and electrical encapsulation.
    Type: Grant
    Filed: March 23, 1990
    Date of Patent: January 22, 1991
    Assignee: General Electric Company
    Inventor: Richard P. Eckberg
  • Patent number: 4987160
    Abstract: A radiation-curable resin useful as a hot melt adhesive is made by the Michael addition of the amino functional groups of an aminoamide thermoplastic polymer with a portion of the acrylate groups of a polyol acrylate. A photoinitiator is optionally added.
    Type: Grant
    Filed: January 31, 1989
    Date of Patent: January 22, 1991
    Assignee: Union Camp Corporation
    Inventors: Charles R. Frihart, Ronald J. Wroczynski
  • Patent number: 4987056
    Abstract: A photopolymeric composition having improved sensitivity to a visible light ray which comprises:(a) at least one ethylenic unsaturated compound which is non-gaseous at a normal temperature;(b) at least one metallic arene compound;(c) a compound selected from the group consisting of p-aminophenyl unsaturated detone compounds, pyridine derivatives or salts thereof, xanthene or thioxanthene compounds and mixtures thereof; and optionally(d) a compound selected from the group consisting of phenylglycine derivatives, cyclic diketone compounds and mixtures thereof.
    Type: Grant
    Filed: June 2, 1989
    Date of Patent: January 22, 1991
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Satoshi Imahashi, Atsushi Saito, Katuhiro Yamashita
  • Patent number: 4985504
    Abstract: Polymer blends composed of two different polymers P1 and P2, which form compatible polymer mixtures where polymer P1 is composed of at least 20 and up to 100% by weight of styrene and polymer P2 is composed of at least 20 and up to 100% by weight of monomers with Formula I ##STR1## where R.sub.1 is hydrogen, methyl or a group ##STR2## and where R.sub.2 or R.sub.2 ', are a group ##STR3## where n is 0-3, R.sub.3 is a 5-8 membered heterocyclic ring, optionally substituted, containing at least 2 hetero atoms in the ring, one heteroatom being oxygen, and R.sub.4 is hydrogen or an alkyl group with 1-6 carbon atoms.
    Type: Grant
    Filed: May 26, 1989
    Date of Patent: January 15, 1991
    Assignee: Rohm GmbH Chemische Fabrik
    Inventor: Werner Siol