Patents Examined by Marion McCamish
  • Patent number: 5877234
    Abstract: The invention features a water-based correction fluid that includes an opacifying pigment, water, and a film-forming system that provides the correction fluid with a writeover time of about 30 seconds or less.
    Type: Grant
    Filed: September 20, 1996
    Date of Patent: March 2, 1999
    Assignee: The Gillette Company
    Inventors: Yun Xu, Brian K. McHugh, Kim H. Ng
  • Patent number: 5877098
    Abstract: An abrasive sheet containing, on at least one surface thereof, a layer of a nonwoven fabric comprising not less than 80% of fibers having a fiber diameter of 10 .mu.m or less, the nonwoven fabric being selected from a group consisting of an entangled nonwoven fabric and a melt-blown nonwoven fabrics.
    Type: Grant
    Filed: January 23, 1997
    Date of Patent: March 2, 1999
    Assignee: Japan Vilene Company, Ltd
    Inventors: Hiroshi Tanaka, Masahiro Nakajima
  • Patent number: 5876840
    Abstract: Spunbond multicomponent filaments and nonwoven webs made from the filaments are disclosed. In accordance with the present invention, the multicomponent filaments contain a crimp enhancement additive. Specifically, the crimp enhancement additive is added to one of the polymeric components in order to accelerate its solidification rate. The additive enhances crimp, allows for highly crimped filaments to be made at smaller deniers, and produces low density webs with improved stretch and cloth-like properties. Specifically, the additive incorporated into the filaments is a nonionic surfactant such as an alkyl ether alkoxylate, a siloxane alkoxylate, an ester of a polyalkylene glycol, a polysaccharide derivative, a glycerol ester, or mixtures thereof.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: March 2, 1999
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Xin Ning, Samuel E. Marmon
  • Patent number: 5877252
    Abstract: This invention describes water-based microsphere adhesive formulations to be used in the sheet-to-sheet coating process. These adhesives have proven to have excellent wet-out of a difficult, high-energy surface, good shear stability to allow die-coating or gravure-coating of the adhesive onto an intermediate carrier belt, good elasticity to allow the wet adhesive to cling to the intermediate belt until it is dried (or partially dried), good integrity to allow complete transfer from the intermediate carrier belt onto the final substrate, and repositionable properties in a final product composition.
    Type: Grant
    Filed: May 19, 1997
    Date of Patent: March 2, 1999
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Kim K. Tsujimoto, Mark S. Vogel, Eric Francis Yves Baertich
  • Patent number: 5874157
    Abstract: An embossed paper laminate having two laminae is provided. The laminae are joined such that there is at least one zone of the laminate wherein the peel strength of the laminate in that zone is greater than the peel strength of the laminate in other zones of the laminated paper product. The laminate is made by two close tolerance pattern rolls juxtaposed to form a nip. Each pattern roll has radially extending protuberances which contact the periphery of the other pattern roll intermediate its protuberances. The laminae are fed through the nip in face-to-face relationship and are embossed and adhesively joined to the other lamina by the radially extending protuberances. The laminating adhesive is supplied to the various zones of the laminated paper product at a level that is appropriate for providing the requisite peel strength for that zone.
    Type: Grant
    Filed: April 2, 1996
    Date of Patent: February 23, 1999
    Assignee: The Procter & Gamble Company
    Inventors: Douglas Edgar Robinson, Michael Bernard Dugas, Barry Robert Silber
  • Patent number: 5874011
    Abstract: Techniques and apparatus for the laser induced etching of a reactive material, or of a multilayer substrate or wafer comprising layers of materials of different etching characteristics and reactivities, are disclosed. Short wavelength laser radiation and control of the process ambient equalize etch rates of the layers of a multilayer substrate or wafer and allow high-resolution etching. A suppressant gas introduced into a halogen-containing ambient suppresses explosive reactions between the ambient and reactive materials or layers. For less reactive layers or materials, reduced-pressure air is a suitable ambient. The techniques and apparatus disclosed herein are particularly useful in the manufacture of magnetic data transfer heads.
    Type: Grant
    Filed: August 1, 1996
    Date of Patent: February 23, 1999
    Assignee: Revise, Inc.
    Inventor: Daniel Ehrlich
  • Patent number: 5874161
    Abstract: This invention describes two products both with a plain, nonperforated surface visual consisting of a fiberboard substrate with or without a laminated porous nonwoven scrim and then a finished painted surface. The finish painted surface decorates or finishes the board, but most important, must remain acoustically transparent to retain the sound absorption properties of the fiberboard prior to painting. The fiberboard substrate is made to be porous or modified with hole perforations to cause it to be a good sound absorber. If the fiberboard substrate is sufficiently porous without hole perforations, then the sprayable, high solids, porous paint can be directly applied. If hole perforations are used to improve the sound absorption properties of the board substrate, then a porous, nonwoven scrim is attached and painted using the same high solids porous paint. This painted scrim must be sufficiently optically opaque to hide the hole punched board, yet sufficiently open to render it acoustically transparent.
    Type: Grant
    Filed: November 9, 1995
    Date of Patent: February 23, 1999
    Assignee: Armstrong World Industries, Inc.
    Inventors: James D. Pape, Darryl L. Sensenig
  • Patent number: 5874363
    Abstract: Metal silicide is removed at a faster rate than polysilicon in dry etching of metal silicide/polysilicon composites with an etching gas made from HCl and Cl.sub.2 at a volumetric flowrate ratio of HCl:Cl.sub.2 within the range of 3:1 to 5:1.
    Type: Grant
    Filed: May 13, 1996
    Date of Patent: February 23, 1999
    Assignees: Kabushiki Kaisha Toshiba, International Business Machines Corporation, Siemens Components, Inc.
    Inventors: Peter D. Hoh, Tokuhisa Ohiwa, Virinder Grewal, Bruno Spuler, Waldemar Kocon, Guadalupe Wiltshire
  • Patent number: 5869134
    Abstract: The present invention discloses a CVD (Chemical Vapor Deposition) process where nickel or alloys thereof, such as, Ni/Cu, Ni/Co, are deposited on metal surfaces which are capable of receiving nickel or alloys thereof, using an Iodide source, preferably an Iodide salt, such as, Copper Iodide.
    Type: Grant
    Filed: June 21, 1996
    Date of Patent: February 9, 1999
    Assignee: International Business Machines Corporation
    Inventors: Srinivasa S. N. Reddy, John U. Knickerbocker, Donald R. Wall
  • Patent number: 5866678
    Abstract: A method for the production of an absorbent resin having a very small residual monomer content either by adding to an absorbent resin powder a substance capable of reacting with the residual monomer in the absorbent resin powder thereby forming an absorbent resin composition having a water content in the range of 10 to 70% by weight and heat-treating the absorbent resin composition at a temperature in the range of 100.degree. to 200 .degree. C. while retaining the water content of the absorbent resin or by adding to an absorbent resin powder a substance capable of reacting with the residual monomer in the absorbent resin powder thereby forming an absorbent resin composition having a water content in the range of 25 to 55% by weight, heat-treating the absorbent resin composition at a temperature in the range of 120.degree. to 200 .degree. C.
    Type: Grant
    Filed: February 20, 1997
    Date of Patent: February 2, 1999
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Katsuhiro Kajikawa, Kinya Nagasuna, Yoshihiko Masuda
  • Patent number: 5866636
    Abstract: A non-asbestos friction material containing a reinforcing fiber other than asbestos, organic fillers, friction adjusting ingredients, and a thermosetting resin for binding the reinforcing fiber, the organic fillers and the friction adjusting ingredients together. The friction adjusting ingredients contain magnesia in the form of aggregated particles which are an aggregate of minute particles. The use of magnesia in the form of aggregated particles reduces low-frequency noise and squeak while keeping the attack on the mating member low and keeping high the resistance to fading and the coefficient of friction.
    Type: Grant
    Filed: February 28, 1997
    Date of Patent: February 2, 1999
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Fumiaki Nitto, Tatsuya Sano, Seigou Sakagami, Masanori Ibuki, Hiroya Kishimoto
  • Patent number: 5866628
    Abstract: The present invention provides ultraviolet curable or electron beam curable fluorescent inks and ink concentrates, which cure upon exposure to ultraviolet or electron beam radiation. The synthesis of the fluorescent ink and ink concentrates does not involve the use of volatile organic solvents, so removal of solvents is not necessary during the manufacturing process. The fluorescent inks and ink concentrates display minimal, consistent color shift when cured. The cured fluorescent inks and ink concentrates are solvent resistant, particularly to methyl ethyl ketone, methanol, nonane, and sec butyl alcohol. The fluorescent ink and ink concentrate is comprised of: from about 20 to 90%, preferably from about 30 to 70%, more preferably from about 30 to 60% by weight of an oligomer, which is either a formaldehyde oligomer or a cyclic-aliphatic oligomer; from about 0.
    Type: Grant
    Filed: August 30, 1996
    Date of Patent: February 2, 1999
    Assignee: Day-Glo Color Corp.
    Inventors: Wayne R. Likavec, Curtis Ray Bradley
  • Patent number: 5866263
    Abstract: An absorbent lid or cover for a hermetic enclosure comprises a coating applied via sputtering to at least a portion of at least one surface of the lid and consisting of at least one elemental metal selected from the group consisting of silicon, germanium and titanium. Adsorbent inserts for such enclosures that are either sputter-coated or sputter-shaped with the aforementioned elemental metals are also disclosed, as are methods for making such covers, inserts and enclosures.
    Type: Grant
    Filed: April 26, 1996
    Date of Patent: February 2, 1999
    Assignee: Semi-Alloys Company
    Inventors: Daniel Mathew Hogan, Vincent Scarnecchia
  • Patent number: 5863838
    Abstract: A method of manufacturing a semiconductor device includes providing (51) a substrate (19), providing (52) a colloid (17) having particles held in suspension, providing (53) a reagent (18), disposing (54) the substrate (19) in a processing tool (10), combining (55) the colloid (17) and the reagent (18) to form a slurry (28), decomposing (56) the reagent (18) into a surfactant and an oxidizer, using (57) the slurry (28) to process the substrate (19) in the processing tool (10), and removing (58) the substrate (19) from the processing tool (10).
    Type: Grant
    Filed: July 22, 1996
    Date of Patent: January 26, 1999
    Assignee: Motorola, Inc.
    Inventors: Janos Farkas, Melissa Freeman
  • Patent number: 5861456
    Abstract: The present invention relates to solid compositions of polymers or copolymers of unsaturated carboxylic acids partially or completely neutralized, a process for the preparation thereof and the use thereof as thickening agents.
    Type: Grant
    Filed: November 3, 1995
    Date of Patent: January 19, 1999
    Assignee: 3V Inc.
    Inventors: Ferruccio Berte', Giuseppe Raspanti
  • Patent number: 5858886
    Abstract: A low permeability fabric and airbag formed therefrom suitable for use in protection of a vehicle occupant in the event of a collision are provided. In particular, the present invention provides an uncoated fabric preferably formed from a substantially symmetrical weave construction of nonsized nylon yarn at a fabric cover factor of not greater than 0.85. The fabric is characterized by an air permeability of not greater than 0.8 cubic feet of air per minute per square foot of fabric at a pressure drop of 125 Pa (0.5 inches of water) across the fabric. a method for formation of the fabric is also provided.
    Type: Grant
    Filed: July 2, 1996
    Date of Patent: January 12, 1999
    Assignee: Milliken Research Corporation
    Inventors: Derek L. Bowen, Charles L. Bower
  • Patent number: 5859092
    Abstract: A recording liquid containing an aqueous medium, a pigment and a polymer, wherein the polymer comprises at least one polymer containing a repeating unit A having at least one of a carboxyl group and an acid anhydride group and an allylether unit B of the formula (I), ##STR1## wherein R.sub.1 and R.sub.2 are a hydrogen atom or a substituted or unsubstituted C.sub.1 -C.sub.5 alkyl group, R.sub.3 is a hydrogen atom, an alkyl group, an alkylcarbonyl group, an alkenyl group, an alkenylcarbonyl group, an aryl group, an arylcarbonyl group, an aralkyl group, an aralkylcarbonyl group, a cycloalkyl group, a cycloalkylcarbonyl group, a heterocyclic group or a carbonyl group having a heterocyclic group, and these groups other than a hydrogen atom may have a substituent, and n is from 1 to 50.
    Type: Grant
    Filed: April 18, 1997
    Date of Patent: January 12, 1999
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Takashi Hirasa, Hiroshi Takimoto, Yukichi Murata, Hiroshi Mikami, Shoji Toki
  • Patent number: 5858876
    Abstract: A method for forming a void-free and gap-filling doped silicon oxide insulator layer upon a patterned substrate layer within an integrated circuit. Formed upon a semiconductor substrate is a patterned substrate layer. Formed upon the patterned substrate layer is a doped silicon oxide insulator layer. The doped silicon oxide insulator layer is formed through a Plasma Enhanced Chemical Vapor Deposition (PECVD) deposition method undertaken simultaneously with a Reactive Ion Etch (RIE) etch-back method. The Plasma Enhanced Chemical Vapor Deposition (PECVD) deposition method and the Reactive Ion Etch (RIE) etch-back method simultaneously employ a Tetra Ethyl Ortho Silicate (TEOS) silicon source material, a dopant source material, an oxygen source material and an etching gas.
    Type: Grant
    Filed: April 1, 1996
    Date of Patent: January 12, 1999
    Assignee: Chartered Semiconductor Manufacturing, Ltd.
    Inventor: Peter Chew
  • Patent number: 5853937
    Abstract: A two-component magnetic developer of the invention for printing characters on documents for magnetic ink character recognition comprises the mixture of 20 to 80 percent by weight of a magnetic toner containing binder resin and magnetic powder and the balance being a magnetic carrier, wherein the magnetic toner has magnetic powder of 30 to 60 percent by weight, residual magnetization .sigma.r of 4 to 16 emu/g and average particle diameter of 5 to 15 um. The developer rarely causes background fogging and carrier adhesion on the developed images which is suitable for MICR.
    Type: Grant
    Filed: August 6, 1997
    Date of Patent: December 29, 1998
    Assignee: Hitachi Metals Ltd.
    Inventors: Masumi Asanae, Fumio Kimura
  • Patent number: 5851684
    Abstract: A novel aqueous sheet-impregnating composition including a composition of a styrene-ethyl acrylate-butyl acrylate copolymer and a binder. The binder is selected from polyvinyl alcohol, polyvinyl acetate, gelatin and starch, and the composition includes 5-90 parts by weight of a polyvinyl alcohol solution and 10-95 parts by weight of a styrene-ethyl acrylate-butyl acrylate copolymer dispersion. A decorative sheet for laminates may thereby be obtained.
    Type: Grant
    Filed: November 18, 1996
    Date of Patent: December 22, 1998
    Assignee: Arjo Wiggins Deutschland GmbH
    Inventors: Horst Matscheko, Stefan Zachert