Abstract: A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane, another high-index hydrocarbon, a perfluoropolyether, such as perfluoro-N-methylmorpholine and perfluoro E2, a perfluoroalkane, such as perfluorohexane, or a hydrofluoroether; and water, respectively.

Abstract: A scanner apparatus includes an exposure unit and an alignment unit, wherein the alignment unit includes an aligning/leveling apparatus for performing global aligning and leveling processes for a wafer in the alignment unit and an edge exposure apparatus, receiving light from a light source, for performing an edge exposure process for the wafer in the alignment unit.

Abstract: A projection objective for microlithography for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective has at least one polarization splitter device that is operated only once in transmission or reflection. By using this device, polarization-dependent differences in the intensity and response of the light passing through the objective, which lead to a worsening of the imaging quality of the projection objective, can largely be avoided.

Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system.

Abstract: A wavelength selecting method for selecting a wavelength of light, the light being used to detect a position of a target with a signal from an image of an alignment mark covered with resist, includes the steps of obtaining a reflectance of the resist at a position outside the alignment mark by irradiating lights having plural wavelengths to the resist at the position, and selecting one of the lights which one has a wavelength that provides the maximum value of reflectance among the reflectances measured by the measuring step or which one has a wavelength that falls within a predetermined wave range centering on the wavelength that provide the maximum reflectance.

Abstract: A processing gas is prevented from entering into a space below a placement table. A supporting surface for supporting the lower face of a placement table is provided at an inner circumferential portion of the upper end of a support column. A circumferentially extending purge gas groove is formed outside the supporting surface, in an intermediate circumferential portion of the upper end of the support column. A narrow flow path is provided outside the purge gas groove, at a position corresponding to an outer circumferential portion of the upper end of the support column. A purge gas diffuses in the circumferential direction in the purge gas groove and flows out to the outside from the narrow flow path. Such a flow of the purge gas prevents a processing gas from entering into the purge gas groove and a space below the placement table.

Abstract: A lithographic apparatus is provided with a charged object on a projection system of the lithographic apparatus, a substrate table of the lithographic apparatus, or both that is configured to have an electric charge to attract particles thereto.

Abstract: A driving apparatus which drives an object. The apparatus includes an electromagnetic actuator having a movable element and a stator, a surrounding member surrounding a heat portion of the electromagnetic actuator, a beam which provides the object with a driving force in accordance with movement of the movable element, a connecting member connecting the movable element and the beam, wherein the surrounding member has an opening allowing the movement of the movable element, the opening being arranged at a portion of the surrounding member not facing the object, and a heat recovery unit arranged at a position facing the opening.

Abstract: A reticle exchange unit for moving a reticle in a lithographic apparatus is disclosed. The surface of the reticle is protected by a pellicle attached thereto by a gas permeable pellicle frame. The reticle exchange unit includes a reticle preparation chamber, a reticle transport unit arranged to cause a plurality of exposed gas permeable parts of the pellicle frame to face an interior of the reticle preparation chamber, and a purge gas pressure and evacuating pressure supply arrangement coupled to the reticle preparation chamber and arranged to provide, alternately, a purge gas pressure and evacuating pressure that is lower than the purge gas pressure to the reticle preparation chamber when the exposed gas permeable parts of the pellicle frame are facing the interior of the reticle preparation chamber, so that gas flows through the pellicle frame, alternately, into and out of a pellicle space between the pellicle and the reticle.

Abstract: An apparatus for holding a wafer and a method for immersion lithography. The apparatus, including a wafer chuck having a central circular vacuum platen, an outer region, and a circular groove centered on the vacuum platen, a top surface of the vacuum platen recessed below a top surface of the outer region and a bottom surface of the groove recessed below the top surface of the vacuum platen; one or more suction ports in the bottom surface of the groove; and a hollow toroidal inflatable and deflatable bladder positioned within the groove.

Abstract: An exposure method includes the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.

Abstract: A system and method are used to pattern illumination to form one or more devices on a substrate using a reflecting system, a pattern generator that defines an objection plane, a projection system, and the substrate that defines an image plane. A reflecting portion of the reflecting system is substantially parallel to a reflecting portion of the pattern generator. The reflecting portion of the pattern generator patterns the illumination beam and directs the patterned illumination beam towards the substrate via the projection system. Based on the relationship of the reflecting system and the pattern generator, the illumination beam is telecentric proximate the object plane and the patterned illumination beam is telecentric proximate the image plane. Through use of a reflecting optic and not a transmissive optic to direct light between the illuminator and the projection system, illumination efficiency is increased and errors imparted on the illumination are decreased.

Abstract: A lithographic apparatus is presented that includes a controller having a series connection of at least two integrators and an integrator output circuit for deriving an output quantity of the series connection of integrators. The controller also includes an integrator saturator that is operatively coupled to the integrator output circuit and having an operating area for passing through the output quantity and a saturation area for saturating the output quantity. A saturation control mechanism for controlling saturation sets an output quantity of at least one of the series-connected integrators to a neutral value, when the integrator saturator is in the saturation area, except when the output quantity of or an input quantity of at least one of the series-connected integrators has a value such that it would tend to bring the integrator saturator from the saturation area to the operating area.

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

Abstract: An exposure apparatus includes a projection optical system for projecting a multigradation pattern onto an object, a spatial modulation element that includes plural, two-dimensionally arranged pixels, and forms an optical image by binary control over each pixel, and a superposing optical system for forming the multigradation pattern by superposing the optical images for each row and/or for each column.

Abstract: A lithographic projection apparatus includes a radiation system for providing a beam of radiation, and a substrate holder. The substrate holder includes a plurality of protrusions for providing a substantially flat plane of support for supporting a substrate in a beam path of the beam of radiation, at least one clamping electrode for generating an electric field for clamping the substrate against the substrate holder, and a peripheral supporting edge arranged to contact the substrate. The electrode extends beyond the peripheral supporting edge for providing a torsion load to level the substrate near the edges of the substrate.

Abstract: An image forming apparatus comprises an exposure department for exposing photographic paper conveyed at a first conveying speed, a development department for developing the photographic paper, conveyed at a second conveying speed lower than the first conveying speed, after being exposed in the exposure department. In the image forming apparatus, the relationship between 1) the distance along the conveying direction from a reference area to a micro area being the target of exposure correction, both the reference area and the micro area being on the photographic paper, and 2) the difference in tone between images formed at the reference area and the micro area when the reference area and the micro area are exposed to the same amount of light in the exposure department, and the relationship between the exposure of the photographic paper and the tone of the image at the reference area are stored.