Patents Examined by Marissa J Detschel
  • Patent number: 7196780
    Abstract: A first luminous flux emitted from the front end face of a LD is reflected by a mirror to be made incident on a detection point on the surface of a measuring object, and a second luminous flux emitted from the rear end face of the LD is reflected by another mirror to be made incident on the detection point. Scattered light from the first detection point is received in a photodiode. A signal processing circuit part calculates the frequency shift quantity of the scattered light based on output from the photodiode. As a result, a velocimeter is provided which detects the moving speed of a measuring object highly precisely.
    Type: Grant
    Filed: August 9, 2004
    Date of Patent: March 27, 2007
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Hideo Wada, Hisakazu Sugiyama, Takayuki Taminaga
  • Patent number: 7196798
    Abstract: A method establishing a reference point for a machine tool with X-, Y-, and Z-stages. A YZ-plane is established by reflecting a light beam off an X-stage reflector such that the light beam is sensed at an interference detector. The X-stage is moved while repositioning the head and reflector and maintaining sensing. An optical alignment module (OAM) is mounted optically perpendicular to the beam, with a bending mirror centered at the Z-axis. The Z-axis is established by setting the bending mirror to deflect the beam to the Z-axis, reflecting it off of a Z-stage reflector so it is sensed, and moving the Z-stage while repositioning the OAM relative to the X- and Y-axes to maintain sensing. An XY-plane is established by bending mirror deflecting the beam to the Y-axis, reflecting it off of a Y-stage reflector so it is sensed, and moving the Y-stage while repositioning the Y-reflector relative to the X- and Z-axes to maintain sensing.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: March 27, 2007
    Assignee: Excel Precision Corporation
    Inventor: John C. Tsai
  • Patent number: 7196797
    Abstract: An interferometer system includes a plane mirror interferometer, a turning mirror, a retardation plate assembly having a retardation plate that can be adjusted and then fixed, and a retroreflector. A light beam travels in a path comprising the plane mirror interferometer, the turning mirror, the retardation plate assembly, and the retroreflector. The retardation plate assembly may include a plurality of bearings, a ring riding on the bearings, the retardation plate mounted to the ring, and a plunger pushing the ring against the bearings. The retardation plate may be fixed by adhesive after determining an orientation that produces little polarization leakage in the system.
    Type: Grant
    Filed: May 28, 2004
    Date of Patent: March 27, 2007
    Assignee: Agilent Technologies, Inc.
    Inventors: John J. Bockman, Ludmila M. Golyanskaya, Kenneth J. Wayne, Miao Zhu
  • Patent number: 7193709
    Abstract: Use of differences in spectroscopic spectra resulting from multiple sample investigation, or sequential investigation of the same sample in evaluation of sample characterizing parameters such as ultra-thin film thickness.
    Type: Grant
    Filed: January 27, 2004
    Date of Patent: March 20, 2007
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Blaine D. Johs, Thomas E. Tiwald
  • Patent number: 7190451
    Abstract: A detection device includes a spectral splitting device located in a detection beam path for spectrally splitting detection light into individual spectral components. A deflection device is located downstream of the spectral splitting device for deflecting the individual spectral components in different deflection directions onto detectors assigned to the individual spectral components. At least one optical element is located in the detection beam path downstream of the spectral splitting device and upstream of the deflection device such that at least one of the individual spectral components incident on the deflection device is collimated.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: March 13, 2007
    Assignee: Leica Microsystems CMS GmbH
    Inventors: Volker Seyfried, Bernd Widzgowski
  • Patent number: 7187451
    Abstract: An apparatus for measuring a two-dimensional displacement is disclosed and includes a laser light source, a collimator lens, a beam splitter, a plurality of staggered conjugate optic lens and a plurality of interference optical dephasing modules. The laser light source provides a laser light incident on the collimator lens to generate collimated laser beams. Each of the collimated laser beams are incident on the beam splitter to be separated into two incident beams and incident on a two-dimensional diffraction unit to generate a plurality of first diffracted beams and a plurality of second-order diffracted beams. The staggered conjugate optic lens are used to reflect the first diffracted beams so that the first diffracted beams return to the two-dimensional diffraction unit to generate a plurality of second diffracted beams where the second diffracted beams and the second-order diffracted beams generated as a result of the first diffraction of the beams stagger.
    Type: Grant
    Filed: September 8, 2004
    Date of Patent: March 6, 2007
    Assignee: Industrial Technology Reserach Institute
    Inventors: Ching-Fen Kao, Chung-Chu Chang, Ching-Fang Lin
  • Patent number: 7184146
    Abstract: An apparatus and method for measuring the color and gas fill concentration of insulating glass units is disclosed. One apparatus includes a color measuring device and gas fill concentration measuring device coupled to a production line for manufacturing insulating glass units. One method of the invention involves measuring the color and gas fill concentration of insulating glass units after they have been filled with gas and sealed.
    Type: Grant
    Filed: June 24, 2004
    Date of Patent: February 27, 2007
    Assignee: Cardinal IG Company
    Inventor: Paul Trpkovski
  • Patent number: 7177031
    Abstract: A plurality of gratings (G1, G2) are arranged together with a wavefront sensor, actuators, and feedback system to align the gratings in such a manner, that they operate like a single, large, monolithic grating. Sub-wavelength-scale movements in the mechanical mounting, due to environmental influences, are monitored by an interferometer (28), and compensated by precision actuators (16, 18, 20) that maintain the coherently additive mode. The actuators define the grating plane, and are positioned in response to the wavefronts from the gratings and a reference flat, thus producing the interferogram that contains the alignment information. Movement of the actuators is also in response to a diffraction-limited spot on the CCD (36) to which light diffracted from the gratings is focused. The actuator geometry is implemented to take advantage of the compensating nature of the degrees of freedom between gratings, reducing the number of necessary control variables.
    Type: Grant
    Filed: April 30, 2004
    Date of Patent: February 13, 2007
    Assignee: University of Rochester
    Inventors: Terrance J. Kessler, Joachim Bunkenburg, Hu Huang
  • Patent number: 7177028
    Abstract: A spool (12), for supporting a fiber optic coil (14) and a shield (118) surrounding the spool and fiber optic coil, includes a centrally placed, bolt-receiving opening (29). The shield includes a lower shield portion (20), which supports the spool and the fiber optic coil, and an upper shield portion (118). The upper and lower shield portions are arranged to interfit with each other at an interface (121). The upper shield portion has a centrally placed fastener-receiving opening (124) which is alignable with the centrally placed, bolt-receiving opening of the spool. A bolt (156) has a head (156a), a shank (156b) and a threaded end (156c, 156d). The bolt head is engageable with the spool through intermediary structure (48). The shank is insertable through the centrally placed, bolt-receiving opening (29) and the lower shield opening (26), for radially centering the assembly and its components. The threaded end is disposed to engage a threaded opening (68) in a gyroscope assembly support (66).
    Type: Grant
    Filed: June 17, 2004
    Date of Patent: February 13, 2007
    Assignee: Litton Systems, Inc.
    Inventors: David M. Gilbreath, Richard Anderson, Devadas Dorai-Raj, Arthur D. Lang
  • Patent number: 7173711
    Abstract: Apparatus for and a method of rotating microscopic objects uses a beam of electromagnetic radiation. A microscopic, non-circularly symmetric distribution of electro-magnetic radiation is projected on to a region containing an object to be rotated so as to cause photons in the beam to refract around the objects. Rotating means then rotate that distribution and so rotate the objects. The distribution may be formed on the interference pattern between a beam having a Laguerre-Gaussian wave fronts and either a plane wave or a further Laguerre-Gaussian beam of opposite helicity.
    Type: Grant
    Filed: December 18, 2001
    Date of Patent: February 6, 2007
    Assignee: University Court of the University of St. Andrews
    Inventors: Kishan Dholakia, Michael Peter Macdonald, Jochen Arlt
  • Patent number: 7173695
    Abstract: A spectroscope is equipped with a temperature compensation mechanism that can reliably reduce a drift of a spectral image in the wavelength dispersion direction caused by a change in the environmental temperature irrespective of the form of the spectroscope. The spectroscope is provided with a first support member 17 that integrally supports an incidence member 11, a collective optical system 13 and a detection element 15, a second support member 21, made of a material different from the first support member, that supports a wavelength dispersion element 14, and a transmission member 24, 25 that transmits a contraction/expansion amount of the first support member to the second support member when environmental temperature changes.
    Type: Grant
    Filed: December 25, 2002
    Date of Patent: February 6, 2007
    Assignee: Nikon Corporation
    Inventor: Atsushi Katsunuma
  • Patent number: 7170598
    Abstract: A method for analyzing properties of a sample by measuring fluorescence parameters in multiple foci, comprises the steps of splitting a collimated primary laser beam with a splitting device into at least two collimated secondary laser beams and deflecting the secondary laser beams such that they propagate at different propagation angles with respect to an optical axis of a focussing optic, focussing the secondary laser beams with the focussing optic into at least two volume elements in the sample, detecting light emitted from the volume elements with a detecting device, and evaluating the detected light for obtaining the properties to be analyzed. Furthermore, a device for implementing this method is described. The invention is particularly suited for high-throughput screening applications.
    Type: Grant
    Filed: October 17, 2003
    Date of Patent: January 30, 2007
    Assignee: Direvo Biotech AG
    Inventors: Peter Jomo Walla, Andre Koltermann, Ulrich Kettling, Mathias Scharte
  • Patent number: 7170613
    Abstract: A surface inspecting apparatus for inspecting a shape of a surface of an object to be inspected is disclosed. The surface inspecting apparatus includes a mounting base for mounting the object, a positioning device for positioning the object to an inspecting position on the mounting base, a memory for storing position specifying information for specifying a two-dimensional position of the object when the object is positioned, an inputting device for inputting an outer shape data of the object, and edge position determining device for acquiring an edge position of the object based on the stored position specifying information and the inputted outer shape data.
    Type: Grant
    Filed: October 31, 2003
    Date of Patent: January 30, 2007
    Assignee: Nidek Co., Ltd.
    Inventor: Takahiro Miura
  • Patent number: 7161681
    Abstract: It is an exemplary object of the present invention to provide an aberration measuring apparatus capable of measuring wavefront aberration of an optical system to be analyzed at a high degree of accuracy for a long time. In order to attain this object, the aberration measuring apparatus of the present invention comprises a light source which emits light having a near-infrared wavelength, a wavelength transformer which transforms light from the light source to light having substantially the same wavelength as the wavelength used and an interferometer which causes the light from the wavelength transformer to enter the optical system to be analyzed and measures aberration of the optical system to be analyzed.
    Type: Grant
    Filed: March 4, 2004
    Date of Patent: January 9, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yoshiyuki Kuramoto
  • Patent number: 7158235
    Abstract: A system for inspecting components is provided. The system includes an image data system that generates image data of the component, such as from a position overlooking the top of a bumped wafer. An interferometry inspection system is connected to the image data system and receives the image data, and analyzes the image data to locate interference fringing that is used to determine the surface coordinates of the bump contacts.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: January 2, 2007
    Assignee: Rudolph Technologies, Inc.
    Inventors: Sanjeev Mathur, Chu-Yin Chang
  • Patent number: 7158236
    Abstract: A system for measuring a displacement along a first axis includes an apparatus movable at least along a second axis perpendicular to the first axis, a measurement mirror mounted to the apparatus at an angle greater than 0° relative to the first axis, and an interferometer with a beam-splitter. The beam-splitter splits an input beam into a measurement beam and a reference beam, directs the measurement beam in at least two passes to the measurement mirror, and combining the measurement beam after said at least two passes and the reference beam into an output beam. At least exterior to the interferometer, the measurement beam travels in paths that are not parallel to the first axis.
    Type: Grant
    Filed: May 21, 2004
    Date of Patent: January 2, 2007
    Assignee: Agilent Technologies, Inc.
    Inventor: W. Clay Schluchter
  • Patent number: 7142310
    Abstract: An interferometric measuring device for measuring the surface of an object by depth scanning, having a short-coherent light source, the emitted light of which is guided to a beam splitter for producing an object beam which is directed via an object beam path to the object and a reference beam which is directed via a reference beam path to a reference surface, having an image recorder for recording the light reflected by the object surface and by the reference surface and combined for interference, and having an evaluation device for determining the surface shape. A white light interferometer without mechanical actuating mechanisms for depth scanning is obtained by placing at least one active optical element that may be influenced by an electrical and/or magnetic field in the object beam path and/or the reference beam path, it being possible to use it to change the optical length of the object light path in relation to the optical length of the reference light path for the depth scanning.
    Type: Grant
    Filed: January 21, 2004
    Date of Patent: November 28, 2006
    Assignee: Robert Bosch GmbH
    Inventor: Jochen Straehle
  • Patent number: 7139081
    Abstract: A method including: imaging test light emerging from a test object over a range of angles to interfere with reference light on a detector, wherein the test and reference light are derived from a common source; for each of the angles, simultaneously varying an optical path length difference from the source to the detector between interfering portions of the test and reference light at a rate that depends on the angle at which the test light emerges from the test object; and determining an angle-dependence of an optical property of the test object based on the interference between the test and reference light as the optical path length difference is varied for each of the angles.
    Type: Grant
    Filed: September 9, 2003
    Date of Patent: November 21, 2006
    Assignee: Zygo Corporation
    Inventor: Peter J. De Groot
  • Patent number: 7136169
    Abstract: The present invention provides a relatively simple etalon testing system and process for measuring cavity error of etalons to high precision. It works equally well on solid and air-spaced designs. This invention should be a great aid in the manufacture of high performance etalons, separating out the geometric and reflectivity finesses. The present invention permits measurement of etalon spacings to an accuracy of better than ?/1000 (i.e., about 63 picometers [6.3×10?11 m] when using a HeNe test laser). In a preferred process an etalon under examination is mounted on a rotational stage illuminated with a collimated beam from a HeNe laser. Reflections from the etalon are imaged on a screen to produce interference fringes which are monitored by a CCD camera. The etalon is then pivoted about an axis perpendicular to the laser beam and images of the interference patterns are recorded periodically to produce a plot of intensity vs. pivot angle over a pivot range sufficient to include at least one extinction cycle.
    Type: Grant
    Filed: October 30, 2003
    Date of Patent: November 14, 2006
    Assignee: Cymer, Inc.
    Inventor: Richard L. Sandstrom
  • Patent number: 7133119
    Abstract: Reticle inspection systems are provided. One embodiment includes an optical subsystem configured to produce an aerial image of a reticle by simulating dose as a function of position that would be projected into a resist by an exposure system such that the aerial image is substantially equivalent to an image of the reticle that would be projected into the resist by the exposure system. Another embodiment includes an optical subsystem configured to alter one or more properties of light such as polarization transmitted by a reticle and to project the light onto a detector. An additional embodiment includes an optical subsystem configured to form an intermediate aerial image of a reticle at a numerical aperture approximately equal to a numerical aperture at which an exposure system projects an image of the reticle into a resist and to project the intermediate aerial image onto a detector.
    Type: Grant
    Filed: December 15, 2003
    Date of Patent: November 7, 2006
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Don Pettibone, Stan Stokowski