Abstract: Improved photographic recording materials contain silver halide grains having at least two zones differing in their halide composition and, as stabilizer, a compound corresponding to the formula ##STR1##
Type:
Grant
Filed:
February 9, 1989
Date of Patent:
March 6, 1990
Assignee:
Agfa-Gevaert Aktiengesellschaft
Inventors:
Manfred Becker, Reinhart Matejec, Hans hlschlager
Abstract: An effective bi-layer photoresist structure comprising a bottom planarization layer or PMGI and a top photoresist imaging layer which eliminates an intermixing layer between the top photoresist imaging layer and the bottom planarization layer, and provides a desired undercut profile between the two layers to insure efficient lift-off for gate fabrication, said undercut profile formed due to the solubility effect of a solvent soak on the two layers.