Patents Examined by Mark S. Huff
  • Resist collapse prevention using immersed hardening
    Patent number: 7384726
    Abstract: A method, tool, and machine for hardening a photoresist image while the photoresist image is immersed in a liquid.
    Type: Grant
    Filed: January 25, 2005
    Date of Patent: June 10, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Burn-Jeng Lin, Ching-Yu Chang