Abstract: A thin film transistor formed on an insulative substrate includes: a first semiconductor film including a channel region and first source/drain regions; a gate insulating film formed on the channel region of the first semiconductor film; a gate electrode formed on the gate insulating film; an insulating film formed on surfaces of the gate electrode; and a second semiconductor film formed on the first source/drain regions of the first semiconductor film. The second semiconductor film includes second source/drain regions which make contact with the first source/drain regions of the first semiconductor film, respectively, the second source/drain regions being separated above the gate electrode by a gap.