Abstract: Disclosed is a circuit for controlling the temperature and the bias voltage of a detector used by an X-ray analytical instrument. The circuit uses a single common reference voltage for the temperature measurement and for all the ADCs and DACs in the circuit, resulting in reduced drift and improved reproducibility of detector temperature and bias voltage. ADCs with a larger number of bits are used to produce precision values of the temperature, the bias voltage, and their respective setpoints. The setpoints are digitally varied until the precision setpoint values correspond to desired values of temperature and bias setpoints.

Abstract: For quarantine treatment of a farming and forestry product for pest control, a method and a device may irradiate logs as a phytosanitary treatment with electron beams. The method may include: spreading the logs; aligning the spread logs to be flush at one end; conveying the spread and flush logs laterally; conveying the logs longitudinally through an irradiation field formed by accelerators to provide treatment of irradiation with the electron beams; throwing the irradiated logs out; and laterally conveying the logs away. The device may include a conveying device for conveying the logs, a shielding structure surrounding the conveying device, and accelerators provided in the conveying path of the conveying device. Two or more accelerators may be provided in centrosymmetry about the conveying path.

Abstract: In one embodiment, a method for creating a pattern in a layer of an organic electronic device that includes selectively irradiating a portion of the layer is provided, and devices and sub-assemblies made by the same.

Abstract: In a multi-charged-particle-beam apparatus, when an electric field and voltage on a surface of a specimen are varied according to characteristics of the specimen, a layout of plural primary beams on the surface of the specimen and a layout of plural secondary beams on each detector vary. Then, calibration is executed to adjust the primary beams on the surface of the specimen to an ideal layout corresponding to the variation of operating conditions including inspecting conditions such as an electric field on the surface and voltage applied to the specimen. The layout of the primary beams on the surface of the specimen is acquired as images displayed on a display of reference marks on the stage. Variance with an ideal state of the reference marks is measured based upon these images and is corrected by the adjustment of a primary electron optics system and others.

Abstract: In a conventional micro-channel plate (MCP), a secondary electron (SE) detector or a semi-conductor detector the number of the electrons is amplified through its own structure. For such amplification a small voltage difference is applied externally or generated due to its own structure and material. The electric current of electrons undergoing the above-described procedure is amplified by an external amplification circuit. In the present invention electrons—resulting from the collision of the electron beam generated by a microcolumn—are detected by surrounding conductive wiring. The detected electrons are amplified using an amplification circuit on the outside similar to a conventional detection method.

Abstract: The present invention relates to a water-based fluorescent ink for the purpose of measurement or judgment of the fluorescence emission in a visible light region by an excitation wavelength in a predetermined ultraviolet range, containing water, a coloring material dissolved or dispersed in water, and an organic solvent, having a plurality of fluorescent groups in the coloring material structure of the coloring material, and using a water-soluble coloring material having a sulfonic acid group as the water-soluble group in the state of a free acid, capable of improving the water resistance and the light resistance, dramatically increasing the content of the fluorescent coloring material in the ink, which has conventionally been included only by a small amount in the ink due to the concentration quenching problem, obtaining preferable fluorescence emission and water resistance of the recorded image, and providing preferable adhesion resistance to the recording medium of the coloring material and reliability.

Abstract: A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.

Abstract: A method and apparatus for near-field focusing of an incident wave, over a range of frequencies from microwaves to optical frequencies, into a sub-wavelength spot having a peak-to-null beamwidth of ?/10. The screen may be made out of closely spaced, unequal slots cut on a metallic sheet. Nano-scale focusing capability may be achieved with a simple structure of three slots on a metallic sheet, which can be readily implemented using current nanofabrication technologies. Unlike negative-refractive-index focusing implementations, this “meta-screen” does not suffer from image degradation when losses are introduced and is easily scalable from microwave to Terahertz frequencies and beyond. The slotted geometry is designed using a theory of shifted beams to determine the necessary weighting factors for each slot element, which are then converted to appropriate slot dimensions.

Abstract: A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.

Abstract: In a mass spectrometer with an electrostatic ion trap, the electrostatic ion trap has an outer electrode with an ion-repelling electric potential applied to it and a plurality of inner electrodes with ion-attracting potentials applied to each inner electrode. The outer electrode and the inner electrodes are shaped and arranged in such a way that a harmonic electric potential is formed in one spatial direction and, perpendicular to this spatial direction, an electric potential is formed in which ions move in stable, radial trajectories.

Abstract: Methods and systems are provided for detecting analytes in a gas phase sample. An ion mobility spectrometer is provided for detecting analytes having an excess amount of dopant in its separation region. In an embodiment, the dopant is added directly to the separation region, such as with a drift gas or by diffusion, thereby providing excess dopant that dominates subsequent cluster formation and maintenance. Excess dopant in the separation region minimizes or reduces interfering signals associated with unwanted substances, such as water vapor, that are introduced to the IMS. In an aspect, the invention provides IMS systems and methods having increased sensitivity and reliability for analyte detection.

Abstract: An MS/MS spectrometric analysis method obtains throughput and mass resolving power of precursor ions. In a mass spectrometer, ions, which are introduced and accumulated in an ion trap unit, are resonance-extracted mass-selectively. A profile of precursor ions at the m/z axis of the ion trap and a profile at the mass analyzer portion, which performs mass analysis of the ions extracted from a collision induced dissociation portion, is obtained by performing a measurement when the injection energy to the collision induced dissociation portion is low, and when the injection energy to the collision induced dissociation portion is high. The profile at the m/z axis of the ion trap of the obtained two-dimensional spectrum is substituted with the profile at the m/z axis of the mass analyzer portion. In this way, the m/z of both the precursor ions and the fragment ions can be determined with high mass resolving power.

Abstract: An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.

Abstract: Using a beam current of an ion beam, and a dose amount to a substrate, and an initial value of a scan number of the substrate set to 1, a scan speed of the substrate is calculated. If the scan speed is within the range, the current scan number and the current scan speed are set as a practical scan number and a practical scan speed, respectively. If the scan speed is higher than the upper limit of the range, the calculation process is aborted. If the scan speed is lower than the lower limit of the range, the scan number is incremented by one to calculate a corrected scan number. A corrected scan speed is calculated by using the corrected scan number, etc. The above steps are repeated until the corrected scan speed is within the allowable scan speed range.

Abstract: Using a beam current of an ion beam, a dose amount to a substrate, and a reference scan speed, a scan number of the substrate is calculated as an integer value in which digits after a decimal point are truncated. If the scan number is smaller than 2, the process is aborted. If the scan number is equal to or larger than 2, it is determined whether the scan number is even or odd. If the scan number is even, the current scan number is set as a practical scan number. If the scan number is odd, an even scan number which is smaller by 1 than the odd scan number is obtained, and the obtained even scan number is set as a practical scan number. A practical scan speed of the substrate is calculated by using the practical scan number, the beam current, and the dose amount.

Abstract: A mass spectrometer includes a pulsed ion source that generates an ion beam comprising a plurality of ions. A first timed ion selector passes a first group of ions. A first ion mirror generates a reflected ion beam comprising the first group of ions that at least partially compensates for an initial kinetic energy distribution of the first group of ions. A second timed ion selector passes a second group of ions. A second ion mirror generates a reflected ion beam comprising the second group of ions that at least partially compensates for an initial kinetic energy distribution of the second group of ions. A timed ion deflector deflects the second group of ions to a detector assembly comprising at least two ion detectors which detects the deflected ion beam.

Abstract: An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12 for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.

Abstract: In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.

Abstract: An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.

Abstract: A flat UV light source has a tight packing of UV light-emitting diodes (56) that are arranged in a matrix. These light-emitting diodes are cooled by cooling air flows (66) or by cooling water flows.