Patents Examined by Mertie F. Taylor
  • Cleaning solution for removing residue
    Patent number: 6949495
    Abstract: A solution for washing away residue, comprising an aqueous solution of a water-soluble high molecular compound in which is dissolved at least one kind of dissolving agent selected from an amine and a fluoride. The washing solution is capable of effectively washing away the residue formed during the production of electronic circuits, is very lowly corrosive to the insulating films, low-dielectric interlayer insulating films and wirings, and offers an advantage of little generating foam.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: September 27, 2005
    Assignee: Tokuyama Corporation
    Inventors: Mizuki Suto, Ichiro Mikami, Tohru Nonaka, Seiji Tono