Abstract: Disclosed is a system and method for detecting the position of a wafer with respect to a calibrated reference position. In one embodiment of the invention, sensors are used to detect the edges of the wafer as the wafer is being passed over the sensors. This wafer detection information is then used to calculate the amount by which the wafer is off-centered such that corrections can be made before the wafer is placed onto a destination location.
Type:
Grant
Filed:
November 5, 1999
Date of Patent:
June 11, 2002
Assignee:
Novellus Systems, Inc.
Inventors:
William R. Johanson, Craig Stevens, Steve Kleinke, Damon Genetti
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