Abstract: Inspecting a patterned surface using photoemission of electrons includes selecting materials of the patterned surface, selecting a light source to produce a difference in yield of photoelectrons from the materials, applying the light from the light source to the patterned surface, detecting the emission of photoelectrons from the patterned surface, and inspecting the patterned surface based on the detected photoelectron emissions.

Abstract: A confocal macroscope is disclosed. According to one embodiment of the present invention an imaging system includes a specimen stage, a source of a collimated excitation beam centered on a beam axis, and a scan-head movably positioned to focus the collimated excitation beam on a focal point in an object plane above the specimen stage and to receive light emitted or reflected from the object plane. According to another embodiment of the present invention the imaging system has three orthogonal motion axes that harness the quality of a collimated infinity space to stretch in scanning a specimen.