Patents Examined by Michell Mandala
  • Simplified litho-etch-litho-etch process
    Patent number: 9425058
    Abstract: Methods of patterning a blanket layer (a target etch layer) on a substrate are described. The methods involve multiple patterning steps of a mask layer several layers above the target etch layer. The compound pattern, made from multiple patterning steps, is later transferred in one set of operations through the stack to save process steps.
    Type: Grant
    Filed: July 24, 2014
    Date of Patent: August 23, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Hun Sang Kim, Jinhan Choi, Shinichi Koseki