Patents Examined by Mike Miggins
  • Patent number: 6130379
    Abstract: A highly reliable surface covering material for a semiconductor element or a semiconductor device having a specific transparent resin layer formed of a resin containing a silane coupling agent in a state with no free material of said silane coupling agent. The element or device is free of the occurrence of layer separation, has satisfactory heat resistance, is hardly yellowed. The element semiconductor element or semiconductor device effectively maintains its characteristics without deterioration, even when repeatedly used over a long period of time under severe environmental conditions with a high temperature and a high humidity.
    Type: Grant
    Filed: July 16, 1996
    Date of Patent: October 10, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidenori Shiotsuka, Takahiro Mori, Ichiro Kataoka, Satoru Yamada, Ayako Komori
  • Patent number: 6043426
    Abstract: A thermophotovoltaic (TPV) energy conversion semiconductor device is provided which incorporates a heavily doped n-type region and which, as a consequence, has improved TPV conversion efficiency. The thermophotovoltaic energy conversion device includes an emitter layer having first and second opposed sides and a base layer in contact with the first side of the emitter layer. A highly doped n-type cap layer is formed on the second side of the emitter layer or, in another embodiment, a heavily doped n-type emitter layer takes the place of the cap layer.
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: March 28, 2000
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: David M. DePoy, Greg W. Charache, Paul F. Baldasaro
  • Patent number: 5907766
    Abstract: A silicon solar cell has increased efficiency by providing an anti-reflection and passivation layer comprising a layer of silicon dioxide thermally grown on a surface of a silicon body and a layer of titanium dioxide deposited on the layer of silicon oxide. In fabricating the composite anti-reflection passivation layer, a layer of aluminum is first deposited on a surface of the thermally grown silicon oxide. After annealing the aluminum layer, the aluminum is removed from the silicon dioxide layer, and the layer of titanium dioxide is then deposited on the surface of the silicon dioxide from which the aluminum was removed. A layer of magnesium fluoride can be deposited on the surface of the titanium dioxide.
    Type: Grant
    Filed: October 21, 1996
    Date of Patent: May 25, 1999
    Assignee: Electric Power Research Institute, Inc.
    Inventors: Richard M. Swanson, Pierre J. Verlinden, Ronald A. Sinton