Abstract: A crosslinked fluororesin-coated rotor manufacturing method is a method for manufacturing an annular outer rotor of an internal gear pump including the outer rotor, and an inner rotor, a side surfaces of the outer rotor being coated with a crosslinked fluororesin, an inner peripheral surface of the outer rotor not being coated with the crosslinked fluororesin, the method including: using an outer masking jig for covering the inner peripheral surface in a state where the side surfaces of the outer rotor are exposed; coating the outer rotor with an uncrosslinked fluororesin in a state where the outer masking jig is mounted to the outer rotor; and then irradiating the fluororesin with radiation in a state where the outer masking jig is removed from the outer rotor, to crosslink the fluororesin.

Abstract: A substrate processing method includes: forming a coating film so as to cover a front surface of the substrate, the substrate having a recess formed in the front surface and in which an organic film is formed; heating the substrate to turn the organic film into a gas, removing the gas from an interior of the recess by causing the gas to pass through the coating film, and forming in the substrate a sealed space surrounded by the recess and the coating film; supplying a processing gas into the sealed space; and irradiating the substrate with a light to activate the processing gas in the sealed space, causing a reaction product gas to pass through the coating film, and removing the reaction product gas, wherein the reaction product gas is generated by a reaction between a residue of the organic film and the activated processing gas in the sealed space.

Abstract: A system and method for improving and stabilizing an electronic property of graphite are provided. The method includes heating a graphitic carbon electrode substrate to a first temperature of at least 600° C., maintaining, via controlled heating by the heat source, the graphitic carbon electrode substrate at the first temperature for a first duration of at least 20 minutes, reducing a temperature of the graphitic carbon electrode substrate from the first temperature to a second temperature over a second duration of at least 10 minutes, wherein the second temperature falls within a second range of between 450-500° C., and further reducing the temperature of the graphitic carbon electrode substrate from the second temperature to a third temperature over a third duration of at least 5 minutes, wherein the third temperature falls within a third range of between 180-270° C.

Abstract: Provided is a method for manufacturing a hard carbon-based coating. The method includes: a step A of preparing a film-forming apparatus including a power supply device and a discharge electrode containing a carbon material, and a substrate having a surface on which a coating is to be formed; and a step B of causing the film-forming apparatus to repeatedly generate a discharge between the discharge electrode and the substrate, to form a hard carbon-based coating on the surface.

Abstract: The present disclosure relates to a metal nanoparticle sensor and fabrication method thereof. The metal nanoparticle sensor includes a SERS substrate, comprising a substrate, metal oxide nanostructures formed on the substrate, and metal nanoparticles grown on the metal oxide nanostructures. The metal oxide nanostructures include crystal facets. The metal nanoparticles substantially cover the crystal facets and the metal nanoparticles are grown in a vacuum chamber at an elevated substrate temperature.

Abstract: A film forming method of forming a film on a substrate by using a film forming apparatus including a processing container, and a stage provided in an interior of the processing container to place the substrate thereon and in which aluminum is contained, includes: forming a film continuously on one substrate or on a plurality of substrates by supplying a gas for film formation to the interior of the processing container while heating the substrate placed on the stage; cleaning the interior of the processing container with a fluorine-containing gas in a state in which the substrate is unloaded from the processing container; and performing a post-process by generating plasma of an oxygen- and hydrogen-containing-gas in the interior of the processing container, wherein the forming the film, the cleaning the interior of the processing container, and the performing the post-process are repeatedly performed.

Abstract: An apparatus for manufacturing a display apparatus includes a chamber configured to accommodate a first display substrate and a second display substrate therein, a deposition source positioned in the chamber and comprising a plurality of crucibles configured to move and supply at least two deposition materials to the first display substrate or the second display substrate, a mask assembly arranged between the first display substrate or the second display substrate and the deposition source, and a shutter portion arranged between the mask assembly and the deposition source and configured to control an amount of the at least two deposition materials supplied from the plurality of crucibles.

Abstract: A film forming method includes forming a thin film by executing a plurality of cycles each including supplying a raw material gas to a substrate, supplying a reaction gas capable of reacting with the raw material gas to the substrate, and processing the substrate with deuterium plasma.

Abstract: To provide an electronic circuit production method using 3D layer shaping capable of producing an electronic circuit having improved electrical properties and mechanical properties by utilizing characteristics of a fluid containing a metal particle by selectively using the fluid containing the metal particle. The electronic circuit production method using 3D layer shaping, the method including a wiring forming step of forming a wiring by applying a fluid containing a nano-sized metal nanoparticle on an insulating member and curing the applied fluid containing the metal nanoparticle; and a connection terminal forming step of forming a connection terminal electrically connected to the wiring by applying a fluid containing a micro-sized metal microparticle and curing the applied fluid containing the metal microparticle.

Abstract: A method for fabricating a three-dimensional (3D) electronic device. A liquid support material (e.g., an epoxy acrylate with a photoinitiator) is applied by a laser-induced forward transfer (LIFT) process to a printed circuit board (PCB) having one or more connectors and one or more electronic components thereon, and then cured to solid form by cooling and/or exposure to ultraviolet (UV) radiation. A layer of conductive material (e.g., a metal) is printed on the solidified support material by LIFT to electrically connect the one or more electronic components to respective ones of the connectors on the PCB. Subsequently, the layer of conductive material is dried by heating and metal particles in the conductive layer sintered using a laser beam. The assembly may then be encapsulated in an encapsulant.

Abstract: Provided are methods for forming polymer-infiltrated nanoparticle films by using capillary action to draw mobile molecular chains into the pores of a bed of nanoparticles. The chains can spread across the entire bed of nanoparticles. The disclosed methods also provide the formation of patterned polymer-infiltrated nanoparticle film compositions, as well as laterally graded compositions and compositions that feature a polymer gradient through the composition's thickness. Articles can be formed that include a plurality of polymer types infiltrated into the bed of nanoparticles.

Abstract: A method for forming a prelithiated, layered anode material includes contacting an ionic compound and a lithium precursor in an environment having a temperature ranging from about 200° C. to about 900° C. The ionic compound is a three-dimensional layered material represented by MX2, where M is one of calcium (Ca) and magnesium (Mg) and X is one of silicon (Si), germanium (Ge), and boron (B). The lithium precursor is selected from the group consisting of: LiH, LiC, LiOH, LiCl, and combinations thereof. The contacting of the ionic compound and the lithium precursor in the environment causes removal of cations from the ionic compound to create openings in interlayer spaces or voids in the three-dimensional layered material thereby defining a two-dimensional layered material and also causes introduction of lithium ions from the lithium precursor into the interlayer spaces or voids to form the prelithiated, layered anode material.

Abstract: Methods of manufacturing a wound monitoring and/or therapy apparatus and/or wound dressing include positioning electronic components and connections in regions of a substrate that are not configured to be perforated. The methods can also include following a set of rules for positioning the components as well as positioning and shaping the connections based on the constraints stemming from, among other things, the positioning of the perforations on the substrate and with the goal of maintaining acceptable levels of signal integrity. The methods further include manufacturing a multi-layered substrate. Wound monitoring and/or therapy apparatus manufactured using such methods are also disclosed.

Abstract: The inventive method for applying a protective graphene coating onto a surface, especially onto a two- or three dimensional artwork or colored surface, comprises the following steps: a) depositing, preferably by chemical vapor deposition (CVD), graphene onto a at least one side of a supporting substrate to produce a graphene/substrate composite including a continuous graphene membrane formed on at least one side of said substrate; b) removing the substrate, or lifting off the graphene from the substrate and c) depositing the graphene membrane onto the surface. A protective graphene coating prepared and deposited by this method provides protection for a surface, especially a two- or three-dimensional artwork or a colored surface, against color degradation, especially fading, yellowing and discoloration due to exposure to UV radiation, dirt, dust, moisture, chemical and/or oxidizing agents.

Abstract: The present invention relates to a new process for manufacturing a silicon carbide (SiC) coated body by depositing SiC in a chemical vapor deposition method using dimethyldichlorosilane (DMS) as the silane source on a graphite substrate. A further aspect of the present invention relates to the new silicon carbide coated body, which can be obtained by the new process of the present invention, and to the use thereof for manufacturing articles for high temperature applications, susceptors and reactors, semiconductor materials, and wafer.

Abstract: There are provided reactive metal powder in-flight heat treatment processes. For example, such processes comprise providing a reactive metal powder; and contacting the reactive metal powder with at least one additive gas while carrying out said in-flight heat treatment process, thereby obtaining a raw reactive metal powder.

Abstract: A pattern forming method capable of easily removing a discontinuous portion in a pattern while keeping resistance of the pattern low. A pattern forming method including at least a printing step of printing a pattern intermediate containing a conductive material on a base material 1, and a plating step of subjecting the pattern intermediate to an electroplating treatment, in which the pattern intermediate printed in the printing step has a plating target portion that is energized in the plating step and a discontinuous portion that is discontinuously formed from the plating target portion and is not energized in the plating step, and in the plating step, by performing an electric field plating treatment using a plating solution containing at least two or more types of metal salts containing different types of metals and a complexing agent, the discontinuous portion of the pattern intermediate is removed to form a pattern constituted by the plating target portion covered with a plating film.

Abstract: A method for depositing a silicon-containing film, the method comprising: placing a substrate comprising at least one surface feature into a flowable CVD reactor; introducing into the reactor at least one silicon-containing compound and at least one multifunctional organoamine compound to at least partially react the at least one silicon-containing compound to form a flowable liquid oligomer wherein the flowable liquid oligomer forms a silicon oxide coating on the substrate and at least partially fills at least a portion of the at least one surface feature. Once cured, the silicon carbonitride coating has excellent mechanical properties.

Abstract: A patterned backside stress compensation film having different stress in different sectors is formed on a backside of a substrate to reduce combination warpage of the substrate. The film can be formed by employing a radio frequency electrode assembly including plurality of conductive plates that are biased with different RF power and cause local variations in the plasma employed to deposit the backside film. Alternatively, the film may be deposited with uniform stress, and some of its sectors are irradiated with ultraviolet radiation to change the stress of these irradiated sectors. Yet alternatively, multiple backside deposition processes may be sequentially employed to deposit different backside films to provide a composite backside film having different stresses in different sectors.

Abstract: The disclosure relates to microwave cavity plasma reactor (MCPR) apparatus and associated tuning and process control methods that enable the microwave plasma assisted chemical vapor deposition (MPACVD) of a component such as diamond. Related methods enable the control of the microwave discharge position, size and shape, and enable efficient matching of the incident microwave power into the reactor prior to and during component deposition. Pre-deposition tuning processes provide a well matched reactor exhibiting a high plasma reactor coupling efficiency over a wide range of operating conditions, thus allowing operational input parameters to be modified during deposition while simultaneously maintaining the reactor in a well-matched state.